Effect of RF Plasma Treatment of Plastic Substrates on the Properties of ZnO Thin Films

2010 ◽  
Vol 56 (1(2)) ◽  
pp. 388-392 ◽  
Author(s):  
Eui-Jung Yun ◽  
Jin-Woo Jung ◽  
Young-Wook Song ◽  
Hyoung G Nam ◽  
Nam-Ihn Cho
Keyword(s):  
Thin Films ◽  
Plasma Treatment ◽  
Zno Thin Films ◽  
Rf Plasma ◽  
Plastic Substrates

Hydrogen Plasma Treatment of ZnO Thin Films Grown by Using PulsedLaser Deposition

2008 ◽  
Vol 53 (9(5)) ◽  
pp. 2540-2543 ◽  
Author(s):  
Hooyoung Song ◽  
Jae-Hoon Kim ◽  
EunKyu Kim ◽  
Jaehwan Ha ◽  
JinPyo Hong ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Treatment ◽  
Hydrogen Plasma ◽  
Zno Thin Films

Growth of a-plane ZnO Thin Films on r-plane Sapphire by Plasma-assisted MBE

2005 ◽  
Vol 891 ◽  
Author(s):  
Junqing Q. Xie ◽  
J. W. Dong ◽  
A. Osinsky ◽  
P. P. Chow ◽  
Y. W. Heo ◽  
...  
Keyword(s):  
Thin Films ◽  
Lattice Mismatch ◽  
Defect Density ◽  
Zno Thin Films ◽  
Rf Plasma ◽  
Misfit Dislocations ◽  
Epitaxial Relationship ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Small Lattice

ABSTRACTZnO thin films have been epitaxially grown on r-plane sapphire by RF-plasma-assisted molecular beam epitaxy. X-ray diffraction (XRD) and transmission electron microscopy (TEM) studies indicate that the epitaxial relationship between ZnO and r-plane sapphire is (1120)ZnO // (1102)sapphire and [0001]ZnO // [1101]sapphire. Atomic force microscopy measurements reveal islands extended along the sapphire [1101] direction. XRD omega rocking curves for the ZnO (1120) reflection measured either parallel or perpendicular to the island direction suggest the defect density anisotropy along these directions. Due to the small lattice mismatch along the ZnO [0001] direction, few misfit dislocations were observed at the ZnO/Al2O3 interface in the high-resolution cross-sectional TEM image with the zone axis along the ZnO [1100] direction.

Effect of rf plasma nitriding time on electrical and optical properties of ZnO thin films

2006 ◽  
Vol 67 (11) ◽  
pp. 2351-2357 ◽  
Author(s):  
S.H. Mohamed ◽  
A.M. Abd El-Rahman ◽  
A.M. Salem ◽  
L. Pichon ◽  
F.M. El-Hossary
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Plasma Nitriding ◽  
Zno Thin Films ◽  
Rf Plasma ◽  
Electrical And Optical Properties ◽  
Nitriding Time

Room-temperature crystallization of amorphous thin films by RF plasma treatment

2004 ◽  
Author(s):  
Hisashi Ohsaki ◽  
Y. Shibayama ◽  
A. Kinbara ◽  
T. Watanabe ◽  
K. Fukuhisa ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Treatment ◽  
Room Temperature ◽  
Rf Plasma ◽  
Amorphous Thin Films ◽  
Temperature Crystallization

Ga doped ZnO thin films prepared by RF plasma assisted DC magnetron sputtering under reductive atmosphere without heating substrates

2010 ◽  
Vol 7 (6) ◽  
pp. 1559-1561 ◽  
Author(s):  
Toshio Hinoki ◽  
Kenji Yazawa ◽  
Kentaro Kinoshita ◽  
Koutoku Ohmi ◽  
Satoru Kishida
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Rf Plasma ◽  
Dc Magnetron Sputtering ◽  
Doped Zno ◽  
Reductive Atmosphere

Work Function Effects of Nano Structured ZnO Thin Film on the Acetone Gas Sensitivity

2009 ◽  
Vol 1174 ◽  
Author(s):  
Seung Hyun Jee ◽  
Nitul Kakati ◽  
Soo Ho Kim ◽  
Dong-Joo Kim ◽  
Young Soo Yoon
Keyword(s):  
Thin Films ◽  
Plasma Treatment ◽  
Work Function ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Gas Sensitivity ◽  
Nano Structures ◽  
Acetone Detection ◽  
Deposition Conditions

AbstractWe deposited various nano structured ZnO thin films with plasma treatment on an alumina substrate and fabricate ZnO sensors for acetone detection. The ZnO sensors with various nano structures and the plasma treatment were deposited by radio frequency (RF) magnetron sputtering method with RuO2 micro heater and Ru electrode. In order to control a work function intentionally, the various deposition conditions and the plasma treatment were used. Sensitivities of the ZnO sensor were measured in acetone vapor and air at 250 degree C. In conclusion, we suggested that the sensitivity of ZnO sensors for acetone strongly depends on the work function of the as-deposited or plasma treated nano structured ZnO thin films.

Adhesion Study in Aluminum/Polyimide System

1998 ◽  
Vol 511 ◽  
Author(s):  
S. H. Yoo ◽  
S. J. Heo ◽  
Y.-H. Kim ◽  
B. J. Han ◽  
J. H. Yoon
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Plasma Treatment ◽  
Peel Strength ◽  
Rf Plasma ◽  
Dc Magnetron Sputtering ◽  
Curing Conditions ◽  
Curing Condition ◽  
Pi System

ABSTRACTThe effects of RF plasma precleaning and polyimide curing conditions on the peel strength have been studied. polyimide precursors of BG-2480 (Toray) and PI-2611 (Du Pont) were spincoated and cured under the various conditions. Cured polyimide substrates were in-situ Ar+ RF plasma cleaned prior to metal deposition. Al-2%Si or Al-0.5%Cu-1%Si thin films were deposited onto polyimide substrates using DC magnetron sputtering.The peel strength was enhanced by RF plasma treatment. The Al/modified PI specimen failed cohesively in the polyimide. The polyimide curing condition strongly affects the peel strength in the Al/modified PI system.

Improved properties of Ti-doped ZnO thin films by hydrogen plasma treatment

2011 ◽  
Vol 519 (15) ◽  
pp. 5178-5182 ◽  
Author(s):  
F.H. Wang ◽  
H.P. Chang ◽  
J.C. Chao
Keyword(s):  
Thin Films ◽  
Plasma Treatment ◽  
Hydrogen Plasma ◽  
Zno Thin Films ◽  
Doped Zno
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