Microstructure and Mechanical Properties of Cr1-xAlxN Coating

2012 ◽  
Vol 531 ◽  
pp. 3-6
Author(s):  
C.L. Zhong ◽  
L.E. Luo
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Lattice Parameter ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Al Content ◽  
Compound Coating ◽  
Cubic Structure

A series of Cr1-xAlxN coatings were deposited by reactive magnetron sputtering. The content, microstructure and the hardness of the thin films were characterized respectively with energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD) and nanoindentor. The effect of Al content on the microstructure and hardness was studied. It was found that Cr1-xAlxN compound coating exhibits a cubic structure with (1 1 1) preferred orientations and that the lattice parameter of Cr1-xAlxN coatings decrease with the increase of Al content. The hardness of Cr1-xAlxN compound coating is higher than that of CrN and increases with the increase of Al content.

Microstructure and Mechanical Properties of Ti1-xAlxN Thin Films

2012 ◽  
Vol 534 ◽  
pp. 93-96
Author(s):  
C.L. Zhong ◽  
P.A. Wei ◽  
L.E. Luo
Keyword(s):  
Thin Films ◽  
Lattice Parameter ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Al Content ◽  
Heat Treated ◽  
High Microhardness ◽  
Cubic Structure ◽  
Heat Treated Temperature

A series of Ti1-xAlxN thin films were deposited by reactive magnetron sputtering. The content, microstructure and the hardness of the thin films were characterized respectively with energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD) and nanoindentor. The effect of Al content on the microstructure and hardness was studied. It was found that Ti1-xAlxN compound thin films exhibits a cubic structure with (1 1 1) preferred orientations and that the lattice parameter of Ti1-xAlxN thin films decrease with the increase of Al content. The hardness of Ti1-x AlxN compound thin films is higher than that of TiN and increases with the increase of Al content. At the heat-treated temperature T = 600 °C, the Ti1-xAlxN thin films is still of high microhardness.

Study on Oxidation Resistance of Ti1-xAlxN Coating

2012 ◽  
Vol 534 ◽  
pp. 97-100
Author(s):  
C.L. Zhong ◽  
P.A. Wei ◽  
L.E. Luo
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Oxidation Resistance ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Al Content ◽  
Compound Coating ◽  
Cubic Structure ◽  
Scanning Electron

A series of Ti1-xAlxN coatings were deposited by reactive magnetron sputtering. The content, microstructure and surface morphology of the coatings were characterized by energy dispersive spectroscopy (EDS), X-ray diffraction (XRD) and scanning electron microscopy (SEM). The effect of Al content on the microstructure and the oxidation resistance was studied. It was found that Ti1-xAlxN compound coating exhibits a cubic structure with (1 1 1) preferred orientations. The oxidation resistance obviously improves with the increase of Al content.

Microstructure and Oxidation Resistance of TiN Coatings

2013 ◽  
Vol 750-752 ◽  
pp. 2092-2095 ◽  
Author(s):  
Guo Zheng Nie ◽  
Chun Liang Zhong ◽  
Lan E Luo ◽  
Ren Long Zhou ◽  
Qiang Liu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxidation Resistance ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
Tin Coating ◽  
X Ray ◽  
Tin Coatings ◽  
Cubic Structure

A series of TiN coatings were deposited by reactive magnetron sputtering with different target powers and different N2flows. The microstructure and oxidation resistance of TiN coatings were characterized by X-ray diffraction (XRD). The hardness of the thin films was characterized respectively with the nanoindentor. The effect of target powers and the N2flows on the microstructure, the hardness and oxidation resistance was studied. It was found that TiN coating deposited at different target powers and different N2flows exhibits a cubic structure with (1 1 1) preferred orientations, and the hardness of TiN coatings is 1200. The oxidation resistance of the TiN coatings is approximately 500°C.

Microstructure and Oxidation Resistance of Cr1-xAlxN Coating

2012 ◽  
Vol 531 ◽  
pp. 23-26
Author(s):  
C.L. Zhong ◽  
L.E. Luo
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Oxidation Resistance ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Al Content ◽  
Compound Coating ◽  
Cubic Structure ◽  
Scanning Electron

A series of Cr1-xAlxN coatings were deposited by reactive magnetron sputtering. The content, microstructure and surface morphology of the coatings were characterized by energy dispersive spectroscopy (EDS), X-ray diffraction (XRD) and scanning electron microscopy (SEM). The effect of Al content on the microstructure, and the oxidation resistance and hardness was studied. It was found that Cr1-xAlxN compound coating exhibits a cubic structure with (1 1 1) preferred orientations. The oxidation resistance obviously improves with the increase of Al content.

Microstructure and Mechanical Properties of Chromium Carbide Coatings Deposited by Magnetron Sputtering Technique

2019 ◽  
Vol 397 ◽  
pp. 118-124
Author(s):  
Linda Aissani ◽  
Khaoula Rahmouni ◽  
Laala Guelani ◽  
Mourad Zaabat ◽  
Akram Alhussein
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Structural Properties ◽  
Annealing Temperature ◽  
Diffusion Mechanism ◽  
X Ray Diffraction ◽  
Chromium Carbides ◽  
X Ray ◽  
Mechanical And Structural Properties

From the hard and anti-corrosions coatings, we found the chromium carbides, these components were discovered by large studies; like thin films since years ago. They were pointed a good quality for the protection of steel, because of their thermal and mechanical properties for this reason, it was used in many fields for protection. Plus: their hardness and their important function in mechanical coatings. The aim of this work joins a study of the effect of the thermal treatment on mechanical and structural properties of the Cr/steel system. Thin films were deposited by cathodic magnetron sputtering on the steel substrates of 100C6, contain 1% wt of carbon. Samples were annealing in vacuum temperature interval between 700 to 1000 °C since 45 min, it forms the chromium carbides. Then pieces are characterising by X-ray diffraction, X-ray microanalysis and scanning electron microscopy. Mechanical properties are analysing by Vickers test. The X-ray diffraction analyse point the formation of the Cr7C3, Cr23C6 carbides at 900°C; they transformed to ternary carbides in a highest temperature, but the Cr3C2 doesn’t appear. The X-ray microanalysis shows the diffusion mechanism between the chromium film and the steel sample; from the variation of: Cr, Fe, C, O elements concentration with the change of annealing temperature. The variation of annealing temperature shows a clean improvement in mechanical and structural properties, like the adhesion and the micro-hardness.

Investigation on AZO Films Deposited by Radio-Frequency Reactive Magnetron Sputtering

2013 ◽  
Vol 320 ◽  
pp. 35-39
Author(s):  
Cheng Long Kang ◽  
Jin Xiang Deng ◽  
Min Cui ◽  
Chao Man ◽  
Le Kong ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Microscope ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Rf Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Doped Zno ◽  
Scanning Electron

The Al2O3-doped ZnO(AZO) films were deposited on the glasses by means of RF magnetron sputtering technology. The films were characterized by scanning electron microscope (SEM), X-ray diffraction (XRD) and Profile-system respectively. The effect of substrate temperature on the structure of the AZO films is investigated.As a result, the properties of the AZO thin films are remarkably influenced by the substrate temperature , especially in the range of 200°C to 500 °C. The film prepared at the substrate temperature of 400°C possesses the best crystalline.

scholarly journals Experimental and predicted mechanical properties of Cr1−xAIxN thin films, at high temperatures, incorporating in situ synchrotron radiation X-ray diffraction and computational modelling

RSC Advances ◽  
2017 ◽  
Vol 7 (36) ◽  
pp. 22094-22104 ◽  
Author(s):  
Ehsan Mohammadpour ◽  
Zhong-Tao Jiang ◽  
Mohmmednoor Altarawneh ◽  
Nicholas Mondinos ◽  
M. Mahbubur Rahman ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Synchrotron Radiation ◽  
Computational Modelling ◽  
X Ray Diffraction ◽  
X Ray ◽  
Al Content ◽  
Magnetic Sputtering ◽  
Sputtering System

Cr1−xAlxN coatings, synthesised by an unbalanced magnetic sputtering system, showed improved microstructure and mechanical properties for ∼14–21% Al content.

X-ray reflectivity and diffraction investigation on TiN/SiNx nanolayered coatings deposited by magnetron sputtering

2007 ◽  
Vol 22 (4) ◽  
pp. 316-318
Author(s):  
Tao An ◽  
Hongwei Tian ◽  
Weitao Zheng
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Multilayer Coatings ◽  
Substrate Bias ◽  
Reactive Magnetron ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
Substrate Bias Voltage ◽  
X Ray ◽  
Sharp Interfaces

Polycrystalline TiN/SiNx multilayer coatings were deposited by reactive magnetron sputtering from Ti and Si targets. Interfaces, structures, and mechanical properties of the multilayers were characterized using X-ray reflectivity (XRR), X-ray diffraction (XRD), and nanoindentation analyses. Results showed that substrate bias voltage had a significant influence on the structures and mechanical properties of the multilayer coatings, in which sharp interfaces are responsible for an enhancement of mechanical properties of the multilayer coatings. The maximum hardness occurs at the −80 V coating with the sharpest interface and the strongest [200] preferred orientation.

Microstructure, Mechanical Properties and Thermal Stability of TiAlN/Si3N4 Nano-Multilayer Films Deposited by Reactive Magnetron Sputtering

2009 ◽  
Vol 79-82 ◽  
pp. 489-492
Author(s):  
Jiang Ling Yue ◽  
Yan Sheng Yin ◽  
Ge Yang Li
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Layer Thickness ◽  
Multilayer Films ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si3n4 Layer ◽  
Superlattice Structure

A series of TiAlN/Si3N4 nano-multilayer films with various Si3N4 layer thicknesses were prepared by reactive magnetron sputtering. These multilayers were then annealed at temperatures ranging from 600 to 900°C in air for 1 hour. The composition, microstructure, and mechanical properties of the films were characterized by energy dispersive x-ray spectroscopy, x-ray diffraction, scanning electron microscopy, and nanoindentation. It reveals that under the template effect of TiAlN layers in multilayers, as-deposited amorphous Si3N4 is crystallized and grows coherently with TiAlN layers when Si3N4 layer thickness is below 0.6 nm. Correspondingly, the hardness and elastic modulus of the multilayers increase significantly. With further increase in the layer thickness, Si3N4 transforms into amorphous, resulting in a decrease of hardness and modulus. The TiAlN/Si3N4 nano-multilayers could retain their superlattice structure even up to 900°C. The small decrease in the hardness of multilayers annealed below 800°C was correlated to the release of compressive stress in multilayers. However, oxidation was found on the surface of multilayers when annealed at 800°C, which resulted in a marked decrease in the hardness of multilayers. The multilayers presented higher hardness as compared with the monolithic TiAlN film.

Structure and Oxidation Behavior CrN Thin Films Deposited Using DC Reactive Magnetron Sputtering

2019 ◽  
Vol 798 ◽  
pp. 122-127
Author(s):  
Adisorn Buranawong ◽  
Nirun Witit-Anun
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxidation Behavior ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Ceramic Thin Films ◽  
Dc Reactive Magnetron Sputtering ◽  
Wafer Substrate

The CrN ceramic thin films were deposited using DC reactive magnetron sputtering system on silicon wafer substrate. Oxidation behavior was carried out in air at evaluated temperatures ranging from 500 °C up to 900 °C for 2 h. The structure and element composition of the films at different thermal annealing temperatures ranging were investigated by X-ray diffraction (XRD), Field Emission Scanning Electron Microscopy (SEM) and Energy Dispersive X-ray Spectroscopy (EDS), respectively. The oxidation activation energies of the films were calculated using Arrhenius equation. The changes in the crystal structure from CrN to Cr2O3 phase were investigated from XRD results. The accumulation of grains on surface was confirmed by FESEM micrographs. The cross-section analysis showed an apparent columnar feature with dense structure for the film annealed at low temperature, and becomes porous when increasing the annealing temperature. The thickness was increased from 1.43 to 2.67 μm. The EDS studies indicated the existence of Cr, N and O with different elements compositions on the deposited thin films. The oxidation activation energy for the CrN thin films is 124.4 kJ/mol.

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