Diode Characteristics of Zinc Oxide Thin Film at Different Deposition Time for FET Applications
Keyword(s):
Zinc oxide (ZnO) is a one of the most interesting compound semiconductors that received more attention during last few years due to its unique properties. Due to that, this study has been done to manipulate those properties to be used for FET applications. The ZnO thin film has been deposited using the thermal chemical vapor deposition. This is done in a double furnace, which vapored the ZnO powder at different temperature. The growth of the ZnO thin film has been observed using SEM and the electrical properties has been analyzed by using I-V probe station. This is done to study the diode characteristics of ZnO thin film to be used in FET applications.
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