Nanostructure of 45# Carbon Steel by High Current Pulsed Electron Beam

2009 ◽  
Vol 79-82 ◽  
pp. 317-320
Author(s):  
Hui Zou ◽  
H.R. Jing ◽  
Sheng Zhi Hao ◽  
Chuang Dong
Keyword(s):  
Surface Layer ◽  
Electron Beam ◽  
Electron Microscope ◽  
Carbon Steel ◽  
Short Pulse ◽  
White Layer ◽  
High Current ◽  
Near Surface ◽  
Pulsed Electron Beam ◽  
Modified Surface

When high current pulsed electron beam (HCPEB) transferring its energy into a very thin surface layer within a short pulse time, super fast processes such as heating, melting, evaporation and consequent solidification, as well as dynamic stress induced may impart the surface layer with improved properties. In this paper, HCPEB modification of 45# carbon steel with working parameters of electron energy 25 kV, pulse duration 3.5µs, and energy density 4 J/cm2 was investigated. The microstructures of modified surface were analyzed by scanning electron microscope (SEM) of type JSM 5310 and transmission electron microscope (TEM) of type H-800. It is found that the modified surface layer can be divided into three zones: the white layer or melted layer of depth 3 to10µm, the heat and stress effecting zone 10 µm below and about 250 µm, then matrix, where a nanostructure and/or amorphous layer formed in the near-surface region. It is proved that the whole treatment process is not complex and cost-effective, and has a substantial potential to be applied in industries.

Surface Treatment of Materials with High Current Pulsed Electron Beam

2005 ◽  
Vol 475-479 ◽  
pp. 3959-3962 ◽  
Author(s):  
Sheng Zhi Hao ◽  
B. Gao ◽  
Ai Min Wu ◽  
Jian Xin Zou ◽  
Ying Qin ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Surface Layer ◽  
Electron Beam ◽  
Surface Treatment ◽  
Short Pulse ◽  
Research Work ◽  
High Current ◽  
Near Surface ◽  
Pulsed Electron Beam ◽  
Dynamic Stress Field

High current pulsed electron beam (HCPEB) is now becoming a promising energetic source for the surface treatment of materials. When the concentrated electron flux transferring its energy into a very thin surface layer within a short pulse time, superfast processes such as heating, melting, evaporation and consequent solidification, as well as dynamic stress field induced by an abrupt thermal distribution in the interactive zone impart surface layer with improved physicochemical and mechanical properties. The present paper reports mainly our experimental research work on this new-style technique. Investigations performed with a variety of constructional materials (aluminum, carbon and mold steel, magnesium alloys) have shown that the most pronounced changes of composition, microstructure and properties occur in the near-surface layers, while the thickness of the modified layer with improved mechanical properties (several hundreds of micrometers) is significantly greater than that of the heat-affected zone due to the propagation of stress wave. The surfaces treated with either simply several pulses of bombardment or complex techniques, such as rapid alloying by HCPEB can exhibit improved mechanical and physicochemical properties to some extent.

Influence of High Current Pulsed Electron Beam (HCPEB) Treatment on Wear Resistance of Hypereutectic Al-17.5Si and Al-20Si Alloys

2011 ◽  
Vol 675-677 ◽  
pp. 693-696 ◽  
Author(s):  
Y. Hao ◽  
Bo Gao ◽  
Gan Feng Tu ◽  
Z. Wang ◽  
Sheng Zhi Hao
Keyword(s):  
Wear Resistance ◽  
Surface Layer ◽  
Electron Beam ◽  
Supersaturated Solid Solution ◽  
High Current ◽  
Pulsed Electron Beam ◽  
Primary Si ◽  
Modified Surface ◽  
Positive Effect ◽  
Modified Surface Layer

The paper reports an analysis of the effect of high current pulsed electron beam(HCPEB) on microstructure transformations and wear resistance of hypereutectic Al-Si alloys. HCPEB treatment with 2.5 J /cm2 energy density leads to the formation of “halo” centered on primary Si, composition homogeneity, the formation of supersaturated solid solution of Al and grain refinement of top melted surface layer. The wear resistance of 15 pulse-treated Al-17.5Si and Al-20Si alloys is drastically improved by a factor of 6.5 and 2, respectively. The increase of hardness in modified surface layer has a positive effect on wear of hypereutectic Al-Si alloys.

Microstructure Analysis of HPb59-1 Brass Induced by High Current Pulsed Electron Beam

2016 ◽  
Vol 35 (7) ◽  
pp. 715-721
Author(s):  
Jike Lyu ◽  
Bo Gao ◽  
Liang Hu ◽  
Shuaidan Lu ◽  
Ganfeng Tu
Keyword(s):  
Residual Stress ◽  
Surface Layer ◽  
Electron Beam ◽  
Surface Properties ◽  
Microstructure Evolution ◽  
High Current ◽  
Pulsed Electron Beam ◽  
Β Phase ◽  
Nanocrystalline Structures ◽  
Two Phases

AbstractIn this paper, the effects of high current pulsed electron beam (HCPEB) on the microstructure evolution of casting HPb59-1 (Cu 57.1 mass%, Pb 1.7 mass% and Zn balance) alloy were investigated. The results showed a “wavy” surface which was formed with Pb element existing in the forms of stacking block and microparticles on the top surface layer after treatment. Nanocrystalline structures including Pb grains and two phases (α and β) were formed on the top remelted layer and their sizes were all less than 100 nm. The disordered β phase was generated in the surface layer after HCPEB treatment, which is beneficial for the improvement of surface properties. Meanwhile, there was a large residual stress on the alloy surface, along with the appearance of microcracks, and the preferred orientations of grains also changed.

Defects and Microstructures in the Surface Layer of Single-crystal Silicon In-duced by High-current Pulsed Electron Beam

2011 ◽  
Vol 25 (12) ◽  
pp. 1313-1317 ◽  
Author(s):  
Xue-Tao WANG ◽  
Qing-Feng GUAN ◽  
Qian-Qian GU ◽  
Dong-Jin PENG ◽  
Yan LI ◽  
...  
Keyword(s):  
Surface Layer ◽  
Electron Beam ◽  
Single Crystal ◽  
Single Crystal Silicon ◽  
High Current ◽  
Crystal Silicon ◽  
Pulsed Electron Beam

SURFACE MODIFICATION OF METALLIC MATERIALS BY HIGH CURRENT PULSED ELECTRON BEAM

2009 ◽  
Vol 23 (06n07) ◽  
pp. 1713-1718 ◽  
Author(s):  
SHENGZHI HAO ◽  
CHUANG DONG ◽  
MINCAI LI ◽  
XIANGDONG ZHANG ◽  
PINGSHENG WU
Keyword(s):  
Surface Modification ◽  
Electron Beam ◽  
Research Work ◽  
Equilibrium Temperature ◽  
Metallic Materials ◽  
High Current ◽  
Near Surface ◽  
Pulsed Electron Beam ◽  
Structure State ◽  
Working Parameters

High current pulsed electron beam (HCPEB) has been developing as a useful tool for surface modification of materials. This paper presents our research work on surface modification of metallic materials, such as mold steel, stainless steel and magnesium alloy, with a HCPEB equipment of working parameters as electron energy 27keV, pulse duration ~1µs and energy density ~5J/cm2. Investigations performed have shown that the most pronounced changes of phase-structure state and properties occurring in the near-surface layer. The formation mechanism of surface craters and their evolution regularity are discussed based on the elucidation of non-equilibrium temperature filed and different kinds of stress formed during pulsed electron beam treatment. After the HCPEB treatments, samples show significant improvements in measurements of wear and corrosion resistance.

Structure and Properties of the Surface Layer of a Wear-Resistant Coating on Martensitic Steel after Electron-Beam Processing

2017 ◽  
Vol 906 ◽  
pp. 101-106 ◽  
Author(s):  
Sergey V. Konovalov ◽  
V.E. Kormyshev ◽  
Yu.F. Ivanov ◽  
V.E. Gromov ◽  
I.A. Komissarova
Keyword(s):  
Surface Layer ◽  
Electron Beam ◽  
Layer Structure ◽  
Niobium Carbide ◽  
Young Modulus ◽  
Structural Elements ◽  
Cored Wire ◽  
Pulsed Electron Beam ◽  
Electron Beam Processing ◽  
Modified Surface

The paper reports electro-contact welding on Hardox 450 steel with С-V-Cr-Nb-W flux-cored wire. Supplementary irradiation by intense pulsed electron beam was carried out to improve mechanical properties. Micro-and nanohardness, Young modulus and tribological parameters of the modified surface were tested mechanically. It is pointed at the significant increase in the friction coefficient because the surface layer fractures and particles of the surfaced layer are involved in the process of friction. Using the methods of optical and scanning microscopy a great number of micro-pores were detected both on the irradiated surface and through the surfaced layer modified by intense pulsed electron beam. It is demonstrated that electron-beam processing of the deposited layer surface is the reason for occurrence of multi-layer structure. According to measurements it was determined that the modified (surface and transition) layers are 0.3 to 0.5 μm on overage. It was also found out that irradiation of the surfaced metal leads to significant refining of structural elements because of ultrahigh speeds of crystallization and further cooling down of the modified layer. The phase composition of the surfaced metal modified by pulsed electron beam is explored. Niobium carbide (NbC) is reported to form in the surface layer.

The Self-assembled Deposition on the Surface of Mono-crystalline Silicon Induced by High-Current Pulsed Electron Beam

2017 ◽  
Vol 36 (6) ◽  
pp. 593-597
Author(s):  
Zhang Conglin ◽  
Guan Qingfeng ◽  
Chen Jie ◽  
Yan Pengcheng ◽  
Lv Peng
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Crystalline Silicon ◽  
High Current ◽  
Pulsed Electron Beam ◽  
Atomic Force ◽  
Transmission Electron ◽  
Si Nanoparticles ◽  
Surface Microstructures ◽  
Pulsed Irradiation

AbstractHigh-current pulsed electron beam (HCPEB) technique was applied to irradiate the surface of mono-crystalline silicon wafers. Surface microstructures of the irradiated surface were investigated in detail by atomic force microscope (AFM), scanning electron microscope (SEM) and transmission electron microscope (TEM). The experimental results show that HCPEB irradiation with energy density 4 J/cm2 caused evaporation of the irradiated surface. Subsequently, the evaporation Si-droplets was deposited to form Si-nanoparticles on the surface. Meanwhile, the structures of intensive plastic deformation were also introduced within the irradiated surface layer. The dislocation configurations with rectangular and approximate hexagonal network were formed on the surface of Si wafer after 5-pulsed irradiation. The periodic self-deposited structures appear to be related to the configuration of regular dislocations arrays, which were favorable locations for the deposited Si-nanoparticles.

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