The Optimal Design of the Plasma Discharge Structure of the Far Zone of the Hollow Cathode

2013 ◽  
Vol 819 ◽  
pp. 344-349
Author(s):  
Yi Fang Wen ◽  
Yan Nian Rui ◽  
Chuang Chen ◽  
Hong Wei Wang
Keyword(s):  
Hollow Cathode ◽  
Plasma Discharge ◽  
Simulation Software ◽  
Particle Simulation ◽  
Ion Concentration ◽  
Large Area ◽  
Cathode Plasma ◽  
Plasma Surface ◽  
Discharge Structure ◽  
Nozzle Structure

The discharge of RF hollow cathode far zone plasma has advantages of high ion concentration, easy to implement the processing of a large area, given more and more attention. The characteristics of hollow cathode plasma flow have a great relationship with the hollow cathode nozzle structure. How to design the hollow cathode nozzle discharge structure accurately and conveniently is the key problem of the hollow cathode far plasma surface treatment. This article builds a hollow cathode plasma discharge self-consistent model; derive the relationship between the discharge current of the hollow cathode plasma and the hollow cathode nozzle structure. Optimize the design of the hollow cathode discharge structure using discharge particle simulation software, to achieve a fast and accurate design and the purpose of efficient plasma surface modification.

Design of Plasma Discharge Structure for Surface Treatment of PP Film

2016 ◽  
Vol 693 ◽  
pp. 77-83 ◽  
Author(s):  
Yi Fang Wen ◽  
Tai Yong Wang ◽  
Hong Wei Wang
Keyword(s):  
Low Temperature ◽  
Hollow Cathode ◽  
Plasma Discharge ◽  
High Energy ◽  
Environment Pollution ◽  
Low Temperature Plasma ◽  
Cathode Plasma ◽  
Temperature Plasma ◽  
Discharge Structure ◽  
Before And After

Low temperature plasma, compared to liquid phase treatment, can effectively overcome the environment pollution, high energy loss and high cost as its high activity. The low temperature plasma, which is not only fairly friendly to the environment but also of less resource consumption, also can realize the cleaning, activating and grafting treatment for materials surface. Based on the numerical model of CRFHCP (Capacitive Radio Frequency Hollow Cathode Plasma) hollow cathode plasma discharge, the key point to affect plasma discharge was analyzed and the morphology of PP film before and after hollow cathode plasma discharge was analyzed. The results showed that the structure of plasma hollow cathode discharge can effectively improved the chemical behaviors of PP film.

Finite Element Simulation on the Distribution of Discharge Gas in Hollow Cathode Plasma

2016 ◽  
Vol 693 ◽  
pp. 1054-1060
Author(s):  
Yi Fang Wen ◽  
Yan Nian Rui ◽  
Hong Wei Wang
Keyword(s):  
Thin Film ◽  
Finite Element ◽  
Surface Modification ◽  
Hollow Cathode ◽  
Fluid Distribution ◽  
Large Area ◽  
Cathode Plasma ◽  
Plasma Surface Modification ◽  
Plasma Surface ◽  
Discharge Gas

The graft polymerization in radio frequency hollow cathode plasma (RFHCP) is suitable for the surface modification of large-area thin film materials. The homogeneity of plasma surface modification of large-area thin film materials has always been paid close attention, and it is also the key factor affecting the industrialized applications of the technique. However, the homogeneity of plasma surface modification is thought to depend greatly on the distribution of discharge gas. In this paper, a finite element model is proposed to discuss the flow of discharge gas in hollow cathode plasma. The concentration distribution of the discharge gas has been discussed by the combination of numerical simulation of fluid distribution and pipe flow theory based on the investigation of the transport property of gas under vacuum. Comparisons between available experiments have also been performed to validate the applicability and practicability of the proposed model.

The Homogeneous Design of Large Area Film Hollow Cathode Plasma Graft Polymerization

2013 ◽  
Vol 567 ◽  
pp. 45-51
Author(s):  
Yi Fang Wen ◽  
Chuang Chen ◽  
Xin Chen ◽  
Yan Nian Rui ◽  
Ning Ding
Keyword(s):  
Thin Film ◽  
Hollow Cathode ◽  
Graft Polymerization ◽  
Technical Difficulty ◽  
Simulation Software ◽  
Material Surface ◽  
Optimized Design ◽  
Film Material ◽  
Large Area ◽  
Cathode Plasma

CRFHCP RF hollow cathode plasma graft polymerization has characteristics of discharge density, high discharging efficiency, good surface modification effect, discharge area and regional separation, applies to modify large area thin film material surface. The uniformity modifying large area plasma material surface is the technical difficulty related technical personnel has been concerned with, the key point restricting HCRFCP technology industrialization application too. This paper analyzes influence factors of the large area thin film materials plasma graft polymerization uniformity; applies simulation software and mathematical models; makes optimized design to the hollow cathode discharge electrodes and graft polymerization distributing pipe. The experiment proved, the uniformity processing large area battery diaphragm is better to apply the hollow cathode plasma graft polymerization, and is suitable for industrial application.

Features of Workpiece and Orificed Cathodes in Triple-Cathode Plasma Surface Alloying System

2012 ◽  
Vol 217-219 ◽  
pp. 1261-1264
Author(s):  
Xing Fu Rong ◽  
Shuo Rong ◽  
Zhi Yu Qin
Keyword(s):  
Hollow Cathode ◽  
Plasma Plume ◽  
Surface Alloying ◽  
Cathode Plasma ◽  
Plasma Surface ◽  
Alloying System ◽  
Current Densities ◽  
Plume Flow ◽  
Plasma Surface Alloying

The performing features of workpiece cathode (W electrode) and the orificed hollow cathode (P electrode) in the triple-cathode plasma surface alloying system are studied. Current densities of the W cathode and the P cathode are obtained under the conditions of the different voltages and the different chamber pressures, based on which current transmitting densities of the orifice of the P cathode are obtained and the conditions of plasma plume flow occurrences are, combined with the observe records of experiments, discussed and analyzed.

High density large area hydrogen plasma by hollow cathode plasma array

2010 ◽  
Vol 205 (5) ◽  
pp. 1532-1535 ◽  
Author(s):  
Jeonghee Cho ◽  
Jack Yang ◽  
Haejung Park ◽  
Se-Geun Park
Keyword(s):  
Hollow Cathode ◽  
Hydrogen Plasma ◽  
High Density ◽  
Large Area ◽  
Cathode Plasma
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