Potentiostatic Deposition of Zinc Oxide on Flexible Substrate

2010 ◽  
Vol 75 ◽  
pp. 43-48
Author(s):  
Ching Hong Wong ◽  
Chee Leung Mak ◽  
Kin Hung Wong
Keyword(s):  
Zinc Oxide ◽  
Optical Properties ◽  
Flexible Substrate ◽  
Bath Temperature ◽  
Zinc Nitrate ◽  
Zno Films ◽  
Deposition Technique ◽  
Structural And Optical Properties ◽  
Cathodic Deposition ◽  
Deposition Parameters

Transparent zinc oxide (ZnO) films on flexible copper-coated polyethylene terephthalate (PET) sheet have been grown by a potentiostatic cathodic deposition technique using aqueous zinc nitrate as electrolyte. ZnO films were fabricated using different deposition parameters such as applied potential, electrolyte concentration and bath temperature. Their structural and optical properties were characterized by X-ray diffractometer, scanning electron microscope, diffuse reflectance UV-VIS spectrophotometer and photoluminescence spectrometer. The effects of these deposition parameters on the structural and optical properties of the fabricated ZnO films have been investigated. On the basis of our results, we demonstrate that high quality ZnO films have been successfully grown on flexible polymeric substrates using a low temperature potentiostatic cathodic deposition technique.

EFFECT OF SPUTTERING PRESSURE ON THE STRUCTURAL AND OPTICAL PROPERTIES OF ZNO FILMS DEPOSITED ON FLEXIBLE SUBSTRATE

2015 ◽  
Vol 75 (7) ◽  
Author(s):  
Lam Mui Li ◽  
Azmizam Manie @ Mani ◽  
Farah Lyana Shain ◽  
Afishah Alias ◽  
Saafie Salleh
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Flexible Substrate ◽  
Zno Thin Films ◽  
Plastic Substrate ◽  
Visible Range ◽  
Growth Time ◽  
Zno Films ◽  
Structural And Optical Properties ◽  
Sputtering Pressure

Zinc Oxide (ZnO) has get attention because of its excellent optical transmittance approximately ~80%. A systematic study has been made of the effect of sputtering pressure on the structural and optical properties of the deposited ZnO films. ZnO thin films were deposited on plastic substrate by RF powered magnetron sputtering using ZnO disk with 99.99% purity. The RF power of 100 W and argon gas flow from 10 - 30 sccm was used to perform the sputtering process. The argon sputtering pressure was varied between 3 mTorr to 11 mTorr and the growth time is constant at 25 minute. The deposited ZnO thin films are characterized structurally and optically.  Structural analysis using X-Ray Diffraction (XRD) show that all the films exhibit a (002) preferential orientation and the estimated grain size measured was varied from 24.5 nm to 29.8 nm. Surface Profilometer was used to measure the thickness and RMS of the deposited films where the thickness decrease from 900 nm to 600 nm and the root mean square (RMS) roughness increase from 4.97 nm to 11.45 nm. The optical transparency value that achieved from UV-Vis Spectrometer is over 80% in the visible range and the band gap energy is within 3.27 eV-3.29 eV range.

Influence of deposition parameters on structural, morphological and optical properties of ZnO films using robust design approach

2015 ◽  
Vol 6 (2/3) ◽  
pp. 154 ◽  
Author(s):  
B.W. Shivaraj ◽  
H.N. Narasimha Murthy ◽  
M. Krishna ◽  
B.M. Nagabhushana ◽  
Sushanth D. Shandilya ◽  
...  
Keyword(s):  
Optical Properties ◽  
Robust Design ◽  
Design Approach ◽  
Zno Films ◽  
Deposition Parameters

scholarly journals Structural and Optical Properties of Cobalt-Doped Zinc Oxide Thin Films Prepared By Spray Pyrolysis Technique

2010 ◽  
Vol 7 (1) ◽  
pp. 69-75
Author(s):  
Baghdad Science Journal
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Optical Properties ◽  
Spray Pyrolysis ◽  
Spray Pyrolysis Technique ◽  
Texture Coefficient ◽  
Hexagonal Structure ◽  
Structural And Optical Properties ◽  
Lattice Constants ◽  
Glass Substrates

Undoped and Co-doped zinc oxide (CZO) thin films have been prepared by spray pyrolysis technique using solution of zinc acetate and cobalt chloride. The effect of Co dopants on structural and optical properties has been investigated. The films were found to exhibit maximum transmittance (~90%) and low absorbance. The structural properties of the deposited films were examined by x-ray diffraction (XRD). These films, deposited on glass substrates at (400? C), have a polycrystalline texture with a wurtzite hexagonal structure, and the grain size was decreased with increasing Co concentration, and no change was observed in lattice constants while the optical band gap decreased from (3.18-3.02) eV for direct allowed transition. Other parameters such as Texture Coefficient (Tc), dislocation density (?) and number of crystals (M) were also calculated .

scholarly journals The Effect of Working Gases Mixing Ratios on the Synthesis and Characteristics of TiO2/SiO2 Nanocomposite via Closed-Field unbalanced DC Magnetron Co-Sputtering Technique

2021 ◽  
Vol 2114 (1) ◽  
pp. 012060
Author(s):  
N. H. Mutesher
Keyword(s):  
Optical Properties ◽  
Nanocomposite Films ◽  
Closed Field ◽  
Mixing Ratio ◽  
X Ray Diffraction ◽  
Energy Band Gap ◽  
Structural And Optical Properties ◽  
Mixing Ratios ◽  
Deposition Parameters ◽  
Nanocomposite Thin Films

Abstract The objective of this research is to study the influence of deposition parameters such as gases mixing ratio O2/Ar on the structural and optical properties of the TiO2/SiO2 nanocomposite films synthesized using closed field unbalanced dc magnetron co-sputtering technique. The nanocomposite thin films were characterized using x-ray diffraction (XRD) to determine the phase structure, and Fourier transform infrared (FTIR) spectroscopy to investigate Si-O-Si, Ti-O and Si–O–Ti. functional groups. The UV-VIS. absorption spectra of the synthesized films reveal that the indirect energy band gap was found to be 2.75 eV. The mixing ratio of Oxygen and Argon (O2/Ar) gases has a pronounced controlling effect on the structural and optical properties of such nanocomposite.

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