Preparation of Hydroxyapatite Coatings on Carbon/Carbon Composites by a Hydrothermal Electrodeposition Process

2008 ◽  
Vol 368-372 ◽  
pp. 1238-1240
Author(s):  
Guang Yan Zhu ◽  
Jian Feng Huang ◽  
Li Yun Cao ◽  
Min Zhou ◽  
Jian Peng Wu

Hydroxyapatite (HAp) coatings were prepared by a hydrothermal electrodeposition method on Carbon/carbon (C/C) composites. The as-prepared HAp coatings were characterized by XRD and SEM analyses. The influence of hydrothermal temperature on the phase and surface microstructures of HAp coatings and the corresponding deposition kinetics were particularly investigated. Results show that with the increase of hydrothermal temperature, the crystallinity, density and homogenous of the prepared HAp coatings are improved. The deposition rate also increases with the increase of hydrothermal temperature. The deposition activation energy of HAp coatings by the hydrothermal electrodeposition process is calculated to be 25.89 kJ/mol.

2010 ◽  
Vol 434-435 ◽  
pp. 492-495
Author(s):  
Wen Dong Yang ◽  
Jian Feng Huang ◽  
Li Yun Cao ◽  
Xie Rong Zeng

Cristobalite aluminum phosphate (C-AlPO4) coatings were prepared by hydrothermal electrophoretic process on SiC coated C/C composites at different temperatures. The as-prepared C-AlPO4 coatings was characterized by SEM analyses. The influence of hydrothermal deposition temperature on the microstructures of the as-prepared coatings and the deposition kinetics mechanism were investigated. Results show that dense and homogeneous C-AlPO4 coatings on SiC coated C/C composites can be achieved at 373K and 220V deposition voltage; Kinetics investigations show that the deposition process of the C-AlPO4 coatings on SiC coated C/C composite is controlled by the diffusion rate of the charged C-AlPO4 particles to the cathode; the deposition rate increases with the increase of hydrothermal temperature. The diffusion equation and the kinetic expression of coating process follow the Fick’s second law and Ahrennius relationship. The deposition activation energy of the C-AlPO4 coatings fabricated by the hydrothermal electrophoretic process is calculated to be 21.88kJ/mol.


2001 ◽  
Vol 72 (5) ◽  
pp. 613-618 ◽  
Author(s):  
J.M. Fernández-Pradas ◽  
L. Clèries ◽  
P. Serra ◽  
G. Sardin ◽  
J.L. Morenza

RSC Advances ◽  
2015 ◽  
Vol 5 (22) ◽  
pp. 17076-17086 ◽  
Author(s):  
Yong Huang ◽  
Xuejiao Zhang ◽  
Huanhuan Mao ◽  
Tingting Li ◽  
Ranlin Zhao ◽  
...  

Effective physiological bone integration and absence of bacterial infection are essential for a successful orthopaedic or dental implant.


2016 ◽  
Vol 5 (5) ◽  
Author(s):  
Pham Thi Nam ◽  
Nguyen Thi Thom ◽  
Nguyen Thu Phuong ◽  
Vo Thi Hanh ◽  
Nguyen Thi Thu Trang ◽  
...  

AbstractFluoridated hydroxyapatite (FHAp) coatings were deposited on 316L stainless steel (316LSS) substrate by the electrodeposition method. Different concentrations of F


Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1166
Author(s):  
Li Yang ◽  
Zuli Mao

Carbon/carbon composites, when used as bone implant materials, do not adhere well to the bone tissues because of their non-bioactive characteristics. Therefore, we electro-deposited SiC-hydroxyapatite coatings (with an ultrasound-assisted step) on carbon/carbon composites. We analyzed how the content and size of the SiC particles affected the structure, morphology, bonding strength and dissolution of the SiC-hydroxyapatite coatings. The hydroxyapatite coating dissolution properties were assessed by the released Ca2+ and the weight loss. The SiC-hydroxyapatite coating on naked carbon/carbon composites showed a more compact microstructure in comparison to the hydroxyapatite coating on carbon/carbon composites. The reasons for the changes in the microstructure and the improvement in the adhesion of the coatings on C/C were discussed. Moreover, the addition of SiC particles increased the binding strengths of the hydroxyapatite coating on C/C composite, as well as reduced the dissolution rate of the hydroxyapatite coating.


2014 ◽  
Vol 809-810 ◽  
pp. 635-641
Author(s):  
Bo Zhang ◽  
Jian Feng Huang ◽  
Cui Yan Li ◽  
Li Yun Cao ◽  
Hai Bo Ouyang ◽  
...  

Mullite coatings were prepared on C/C-SiC composites surface by pulse arc discharge deposition using mullite powder as source materials. Phase composites and microstructures of the as-prepared mullite coatings were characterized by XRD and SEM. Deposition kinetics and influence of pulse frequency on the phase composites and microstructures were investigated. The results indicate that the outer layer is composed of mullite phase, density and homogeneity of the mullite coatings are achieved when the pulse frequency reaches 2000 Hz. The deposition amount of the mullite coatings also increases with increasing deposition temperature. The deposition mass of the coatings and the square root of the deposition time at different deposition temperatures according to linear relationship, and the deposition activation energy is calculated to be 32.24 kJ/mol.


2012 ◽  
Vol 27 (02) ◽  
pp. 1350015
Author(s):  
AHMED M. EL-NAGGAR

The influence of the deposition rate of chemically annealed vacuum-deposited a-Si : H films on its optical and electrical properties was studied. The optical parameters were studied using spectrophotometric measurements of the film transmittance in the wavelength range 200–3000 nm. It was found that with increasing the silicon deposition rate from 0.09 to 0.23 nm/s, the refractive index, n, decreases from 3.78 to 3.45 at 1.5 μm, and the optical energy gap, Eg, decreases from 1.74 to 1.66 eV, while the Urbach parameter, ΔE, increases from 77 to 99 meV. The dark conductivity was measured at temperatures descending from 480 to 170 K. It was found that the room temperature dark conductivity values decreased from 1.11 × 10-6 (Ω⋅ cm )-1 to 2.08 × 10-10 (Ω⋅ cm )-1 with increasing the deposition rate from 0.09 to 0.23 nm/s respectively, while the activation energy Ea increased from 0.53 to 0.84 eV with increasing deposition rate. As a result, a good quality a-Si : H film with optical energy gap of 1.74 eV, Urbach parameter of 77 meV, dark conductivity of 1.11 × 10-6 (Ω⋅ cm )-1, and activation energy of 0.53 eV was successfully prepared at a low deposition rate of 0.09 nm/s.


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