Investigation of Nano/Microcrystalline Diamond Composite Films for Thermal Applications

2009 ◽  
Vol 610-613 ◽  
pp. 563-566
Author(s):  
Yu Lan Guan ◽  
Wen Qi Dai ◽  
Lin Jun Wang ◽  
Jian Huang ◽  
Jian Ming Lai ◽  
...  
Keyword(s):  
Thermal Diffusivity ◽  
Composite Film ◽  
Composite Films ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Atomic Force Microscope Image ◽  
Diamond Composite ◽  
Grain Sizes ◽  
Atomic Force ◽  
Hot Filament

A newly developed nano/microcrystalline diamond composite film for thermal applications was prepared in this investigation. A microcrystalline diamond (MCD) film was deposited onto silicon substrate by hot filament chemical vapor deposition (HFCVD) method, and then a nanocrystalline diamond (NCD) film was grown onto this MCD film to obtain a NCD/MCD composite film. The root-mean-square (RMS) value of surface roughness for the composite film estimated from the atomic force microscope image was 42.7nm. Compared with 85.9nm for the MCD film. And it was also found that the thermal diffusivity increased from 32.61mm2/s to 37.63mm2/s by further growing a NCD film. Results indicated that the deposition of NCD film reduced the rough surface of the MCD film with grain sizes of the order of microns, and thus increased the efficiency of diamond films as thermal spreading device. It was found that the NCD/MCD composite film had a smoother surface and a higher thermal diffusivity compared with MCD film.

Study on the Deposition and Characterization of Nanocrystalline Diamond Composite Films

2012 ◽  
Vol 530 ◽  
pp. 95-100
Author(s):  
Yu Ping Ma
Keyword(s):  
Layer Structure ◽  
Composite Films ◽  
Diamond Films ◽  
Work Load ◽  
Nanocrystalline Diamond ◽  
Nucleation Density ◽  
Diamond Composite ◽  
Good Adhesive ◽  
Hot Filament ◽  
Surface Morphologies

Nanocrystalline diamond composite films were fabricated on the WC-Co substrates using a bias-enhanced hot filament CVD system. Methanol solution pretreatment method for removing the Co in surface of WC-Co substrates was put forward. The composite structure was achieved by regulating the concentration of Ar in a mixture of acetone and a hydrogen gases in different stages. The surface morphologies, nucleation density, diamond films and composition of the nanocrystalline diamond composite films were observed with different techniques. The results showed that the introduction of Ar increased the second nucleation of diamond grains which made the diamond grains finer. Nanocrystallie diamond film can be successfully grown on the microcrystalline diamond films. The two-layer structure has the advantages of good adhesive strength and low surface roughness. Because of nano effects, the hardness of composite films decreases. This is prone to be polished and reduces the work load significantly. It is of great importance for the wide application of diamond films in the precision machining fields.

Growth and characterization of diamond particles, diamond films, and CNT-diamond composite films deposited simultaneously by hot filament CVD

2014 ◽  
Vol 50 (1) ◽  
pp. 144-156 ◽  
Author(s):  
C. R. Kumaran ◽  
Maneesh Chandran ◽  
M. Krishna Surendra ◽  
S. S. Bhattacharya ◽  
M. S. Ramachandra Rao
Keyword(s):  
Composite Films ◽  
Diamond Films ◽  
Diamond Composite ◽  
Diamond Particles ◽  
Hot Filament Cvd ◽  
Hot Filament

Examination of the material properties and performance of thin-diamond film cutting tool inserts produced by arc-jet and hot filament chemical vapor deposition

1996 ◽  
Vol 11 (7) ◽  
pp. 1765-1775 ◽  
Author(s):  
James M. Olson ◽  
Michael J. Dawes
Keyword(s):  
Wear Resistance ◽  
Chemical Vapor Deposition ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Cutting Tool ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
And Performance ◽  
Hot Filament

Thin diamond film coated WC-Co cutting tool inserts were produced using arc-jet and hot-filament chemical vapor deposition. The diamond films were characterized using SEM, XRD, and Raman spectroscopy to examine crystal structure, fracture mode, thickness, crystalline orientation, diamond quality, and residual stress. The performance of the tools was evaluated by comparing the wear resistance of the materials to brazed polycrystalline diamond-tipped cutting tool inserts (PCD) while machining A390 aluminum (18% silicon). Results from the experiments carried out in this study suggest that the wear resistance of the thin diamond films is primarily related to the grain boundary strength, crystal orientation, and the density of microdefects in the diamond film.

Compact and Efficient HFCVD for Electronic Grade Diamond and Related Materials

2009 ◽  
Vol 1203 ◽  
Author(s):  
R. Vispute ◽  
Andrew Seiser ◽  
Geun Lee ◽  
Jaurette Dozier ◽  
Jeremy Feldman ◽  
...  
Keyword(s):  
Diamond Film ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Deposition Efficiency ◽  
Raman Shift ◽  
Compositional Variation ◽  
Force Microscopy ◽  
Substrate Rotation ◽  
Sample Rotation ◽  
Hot Filament

AbstractA compact and efficient hot filament chemical vapor deposition system has been designed for growing electronic-grade diamond and related materials. We report here the effect of substrate rotation on quality and uniformity of HFCVD diamond films on 2” wafers, using two to three filaments with power ranging from 500 to 600 Watt. Diamond films have been characterized using x-ray diffraction, Raman Spectroscopy, scanning electron microscopy and atomic force microscopy. Our results indicate that substrate rotation not only yields uniform films across the wafer, but crystallites grow larger than without sample rotation. Well-faceted microcrystals are observed for wafers rotated at 10 rpm. We also find that the Raman spectrum taken from various locations indicate no compositional variation in the diamond film and no significant Raman shift associated with intrinsic stresses. Results are discussed in the context of growth uniformity of diamond film to improve deposition efficiency for wafer-based electronic applications.

Mechanical properties and wear behavior of multi-layer diamond films deposited by hot-filament chemical vapor deposition

2019 ◽  
Vol 494 ◽  
pp. 401-411 ◽  
Author(s):  
Guangyu Yan ◽  
Yuhou Wu ◽  
Daniel Cristea ◽  
Lusheng Liu ◽  
Mircea Tierean ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Wear Behavior ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Hot Filament

Attempts to p-Dope Ultrananocrystalline Diamond Films in a Hot Filament Reactor

2006 ◽  
Vol 956 ◽  
Author(s):  
Paul William May ◽  
Matthew Hannaway
Keyword(s):  
Vapour Deposition ◽  
Film Growth ◽  
Substrate Surface ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Grain Sizes ◽  
Ultrananocrystalline Diamond ◽  
The Individual ◽  
P Type ◽  
Hot Filament

ABSTRACTUltrananocrystalline diamond (UNCD) films have been deposited using hot filament chemical vapour deposition using Ar/CH4/H2 gas mixtures plus additions of B2H6 in an attempt to make p-type semiconducting films. With increasing additions of B2H6 from 0 to 40,000 ppm with respect to C, the film growth rate was found to decrease substantially, whilst the individual grain sizes increased from nm to μm. With 40,000 ppm of B2H6, crystals of boric oxide were found on the substrate surface, which slowly hydrolysed to boric acid on exposure to air. These results are rationalised using a model for UNCD growth based on competition for surface radical sites between CH3 and C atoms.

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