Improvement of Surface Morphology by Solution Flow Control in Solution Growth of SiC on Off-Axis Seeds
2015 ◽
Vol 821-823
◽
pp. 31-34
◽
Keyword(s):
Set Up
◽
The solution growth of SiC on an off-axis seed is effective on the reduction of threading dislocations. We proposed a novel method to grow a SiC crystal on an off-axis seed by top-seeded solution growth (TSSG). In our previous study, a unidirectional solution flow above a seed crystal is effective to suppress surface roughness in the growth on the off-axis seed. However, it is difficult to apply the unidirectional flow in an axisymmetric TSSG set-up. In this study, the unidirectional flow could be achieved by shifting the rotational axis away from the center of the seed crystal. As a result, the smooth surface was obtained in the wider area where the solution flow direction was opposite to the step-flow direction.
2015 ◽
Vol 821-823
◽
pp. 18-21
◽
2019 ◽
Vol 963
◽
pp. 75-79
◽
Keyword(s):
2016 ◽
Vol 55
(12)
◽
pp. 125601
◽
Keyword(s):
Keyword(s):
2012 ◽
Vol 717-720
◽
pp. 61-64
◽
Keyword(s):
2013 ◽
Vol 740-742
◽
pp. 189-192
◽
Keyword(s):
1986 ◽
Vol 78
(3)
◽
pp. 567-570
◽
2010 ◽
Vol 49
(9)
◽
pp. 09MC06
◽