Chromium-Nickel Alloy for the Synthesis of Carbon Nanoparticles

2020 ◽  
Vol 28 ◽  
pp. 123-129
Author(s):  
Zalim Mukhamedovich Khamdokhov ◽  
Zamir Khamidbieich Kalazhokov ◽  
Ruslan Shahbanovich Teshev ◽  
Khamidbi Hazhismelovich Kalazhokov
Keyword(s):  
Raman Scattering ◽  
Nickel Alloy ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Carbon Nanoparticles ◽  
Carbon Film ◽  
Alloy Film ◽  
Electric Arc ◽  
Amorphous Carbon Film ◽  
X Ray

The methods of Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS) and Raman scattering (RS) phase transformations in an amorphous carbon film deposited by electric arc method on a chromium-nickel alloy film were investigated. The formation of nanoparticles with a linear size of ~ 6 nm in a carbon film also was presented here.

Orientation of graphitic planes during annealing of “dip deposited” amorphous carbon film: A carbon K-edge X-ray absorption near-edge study

Carbon ◽  
2006 ◽  
Vol 44 (10) ◽  
pp. 1982-1985 ◽  
Author(s):  
S.C. Ray ◽  
C.W. Pao ◽  
H.M. Tsai ◽  
B. Bose ◽  
J.W. Chiou ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Film ◽  
Amorphous Carbon Film ◽  
X Ray ◽  
X Ray Absorption

scholarly journals Picosecond time-resolved x-ray refectivity of a laser-heated amorphous carbon film

2011 ◽  
Vol 98 (10) ◽  
pp. 101909 ◽  
Author(s):  
R. Nüske ◽  
A. Jurgilaitis ◽  
H. Enquist ◽  
S. Dastjani Farahani ◽  
J. Gaudin ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Film ◽  
Amorphous Carbon Film ◽  
Time Resolved ◽  
X Ray ◽  
Laser Heated

Observation of Atom Rows in Thorium Pyromellitate Using a Field Emission STEM

1977 ◽  
Vol 35 ◽  
pp. 80-81
Author(s):  
H. Todokoro ◽  
S. Nomura ◽  
T. Komoda
Keyword(s):  
Field Emission ◽  
Amorphous Carbon ◽  
Carbon Film ◽  
Dark Field Image ◽  
Dark Field ◽  
Amorphous Carbon Film ◽  
Atomic Size ◽  
Wide Range ◽  
A Chain

It is interesting to observe polymers at atomic size resolution. Some works have been reported for thorium pyromellitate by using a STEM (1), or a CTEM (2,3). The results showed that this polymer forms a chain in which thorium atoms are arranged. However, the distance between adjacent thorium atoms varies over a wide range (0.4-1.3nm) according to the different authors.The present authors have also observed thorium pyromellitate specimens by means of a field emission STEM, described in reference 4. The specimen was prepared by placing a drop of thorium pyromellitate in 10-3 CH3OH solution onto an amorphous carbon film about 2nm thick. The dark field image is shown in Fig. 1A. Thorium atoms are clearly observed as regular atom rows having a spacing of 0.85nm. This lattice gradually deteriorated by successive observations. The image changed to granular structures, as shown in Fig. 1B, which was taken after four scanning frames.

Deposition of Hydrophilic Amorphous Carbon Film with Ether as a Source Molecule and Analysis of its Deposition Reaction

2018 ◽  
Vol 138 (11) ◽  
pp. 538-543
Author(s):  
Masanori Shinohara ◽  
Taisuke Tominaga ◽  
Hayato Shimomura ◽  
Takeshi Ihara ◽  
Yoshihito Yagyu ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Film ◽  
Amorphous Carbon Film

X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES ON THE BONDING PROPERTIES OF AMORPHOUS CARBON NITRIDE FILMS SYNTHESIZED BY PULSED LASER DEPOSITION WITH DIFFERENT SUBSTRATE TEMPERATURES

2005 ◽  
Vol 12 (02) ◽  
pp. 185-195
Author(s):  
M. RUSOP ◽  
T. SOGA ◽  
T. JIMBO
Keyword(s):  
Pulsed Laser Deposition ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Measurement Techniques ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray ◽  
Amorphous Carbon Nitride ◽  
Substrate Temperatures

Amorphous carbon nitride films ( a-CN x) were deposited by pulsed laser deposition of camphoric carbon target with different substrate temperatures (ST). The influence of ST on the synthesis of a-CN x films was investigated. The nitrogen-to-carbon (N/C) and oxygen-to-carbon (O/C) atomic ratios, bonding state, and microstructure of the deposited a-CN x films were characterized by X-ray photoelectron spectroscopy and were confirmed by other standard measurement techniques. The bonding states between C and N , and C and O in the deposited films were found to be significantly influenced by ST during the deposition process. The N/C and O/C atomic ratios of the a-CN x films reached the maximum value at 400°C. ST of 400°C was proposed to promote the desired sp 3-hybridized C and the C 3 N 4 phase. The C–N bonding of C–N , C=N and C≡N were observed in the films.

Effect of gas pressure on current-voltage characteristics of amorphous carbon film/silicon heterojunction

2007 ◽  
Vol 91 (9) ◽  
pp. 092104 ◽  
Author(s):  
Xili Gao ◽  
Qingzhong Xue ◽  
Lanzhong Hao ◽  
Qun Li ◽  
Qingbin Zheng ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Film ◽  
Gas Pressure ◽  
Amorphous Carbon Film ◽  
Current Voltage ◽  
Current Voltage Characteristics
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