scholarly journals THERMAL PROPERTIES OF TPD-BASED ORGANIC GLASSES

Author(s):  
Riccardo Dettori ◽  
Luciano Colombo

Glassy materials are condensed matter systems showing physical properties in between solids and liquids and retaining information about the thermal history they have been subjected to and the way they have been prepared. Formally, this implies that their configurational energy landscape is a complex multi-dimensional surface, showing quite a few basins with different depths, widths, and shapes: the system can be trapped in any of them, assuming very unlike physical properties. Recently, it has been demonstrated experimentally that a glassy system can be grown by physical vapor deposition of organic molecules on a substrate. The physics of such organic glasses is enriched by a new feature, namely: the anisotropic molecular structure of the basic building blocks used to assemble the film. TPD-based organic glasses have been generated by atomistic simulations that mimic vapor deposition and their thermal properties have been accordingly calculated. Simulations generate a rational phenomenology, providing robust evidence that heat transfer is not isotropic but, rather, correlated to an inherent molecular property, namely the axial structure of the TPD molecule. Furthermore, we present the first theoretical prediction of the specific heat trend versus temperature, showing in the quantum regime an intriguing anomaly with respect to crystalline systems.

2010 ◽  
Vol 22 (1) ◽  
pp. 39-42 ◽  
Author(s):  
Kenneth L. Kearns ◽  
Tim Still ◽  
George Fytas ◽  
M. D. Ediger

2019 ◽  
Vol 19 (1) ◽  
pp. 36-43 ◽  
Author(s):  
Pamela Miśkiewicz ◽  
Iwona Frydrych ◽  
Wojciech Pawlak ◽  
Agnieszka Cichocka

Abstract Basalt fibers and fabrics made of these are characterized by excellent thermal and mechanical properties. Therefore, basalt fabrics, due to a good resistance to high temperatures, are frequently applied in the personal protection equipment (PPE). In order to improve their thermal properties and, above all, the contact heat resistance, the process of physical vapor deposition was proposed. The process of Physical Vapor Deposition (PVD) involves producing a coating on a specific substrate as a result of physical deposition of molecules, ions or atoms of the selected chemical compounds. The method selected for the test is the magnetron sputtering. It involves depositing a uniform film of chromium on the surface of the basalt fabric. In order to improve the thermal properties – especially the contact heat resistance, two values of thickness of the chromium layer deposited on the basalt fabric surface were adopted for the test. Covering 1 μm and 5 μm with the chromium layer did not fulfil the expectations and the research will be continued.


2019 ◽  
Vol 116 (43) ◽  
pp. 21421-21426 ◽  
Author(s):  
Camille Bishop ◽  
Jacob L. Thelen ◽  
Eliot Gann ◽  
Michael F. Toney ◽  
Lian Yu ◽  
...  

We show that glasses with aligned smectic liquid crystal-like order can be produced by physical vapor deposition of a molecule without any equilibrium liquid crystal phases. Smectic-like order in vapor-deposited films was characterized by wide-angle X-ray scattering. A surface equilibration mechanism predicts the highly smectic-like vapor-deposited structure to be a result of significant vertical anchoring at the surface of the equilibrium liquid, and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy orientation analysis confirms this prediction. Understanding of the mechanism enables informed engineering of different levels of smectic order in vapor-deposited glasses to suit various applications. The preparation of a glass with orientational and translational order from a nonliquid crystal opens up an exciting paradigm for accessing extreme anisotropy in glassy solids.


2020 ◽  
Vol 5 (1) ◽  
pp. 110-116
Author(s):  
Kwang-Won Park ◽  
David Bilger ◽  
Trisha L. Andrew

Understanding how dipolar, non-centrosymmetric organic semiconductors self-assemble, nucleate, and crystallize is integral for designing new molecular solids with unique physical properties and light-matter interactions.


Materials ◽  
2021 ◽  
Vol 14 (19) ◽  
pp. 5658
Author(s):  
Nikolett Hegedüs ◽  
Katalin Balázsi ◽  
Csaba Balázsi

Silicon nitride (SiNx) and hydrogenated silicon nitride (SiNx:H) thin films enjoy widespread scientific interest across multiple application fields. Exceptional combination of optical, mechanical, and thermal properties allows for their utilization in several industries, from solar and semiconductor to coated glass production. The wide bandgap (~5.2 eV) of thin films allows for its optoelectronic application, while the SiNx layers could act as passivation antireflective layers or as a host matrix for silicon nano-inclusions (Si-ni) for solar cell devices. In addition, high water-impermeability of SiNx makes it a potential candidate for barrier layers of organic light emission diodes (OLEDs). This work presents a review of the state-of-the-art process techniques and applications of SiNx and SiNx:H thin films. We focus on the trends and latest achievements of various deposition processes of recent years. Historically, different kinds of chemical vapor deposition (CVD), such as plasma enhanced (PE-CVD) or hot wire (HW-CVD), as well as electron cyclotron resonance (ECR), are the most common deposition methods, while physical vapor deposition (PVD), which is primarily sputtering, is also widely used. Besides these fabrication methods, atomic layer deposition (ALD) is an emerging technology due to the fact that it is able to control the deposition at the atomic level and provide extremely thin SiNx layers. The application of these three deposition methods is compared, while special attention is paid to the effect of the fabrication method on the properties of SiNx thin films, particularly the optical, mechanical, and thermal properties.


Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.


2019 ◽  
Vol 10 (41) ◽  
pp. 5578-5583 ◽  
Author(s):  
Takumitsu Kida ◽  
Ryo Tanaka ◽  
Koh-hei Nitta ◽  
Takeshi Shiono

The increase of aggregation number in a star-shaped cyclic olefin copolymer was succeeded by using a triazine-based secondary amine, which caused a drastic change in physical properties without changing the thermal properties.


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