scholarly journals A Strategic Review on Growth of InP on Silicon Substrate for Applications in High Frequency RF Devices

Author(s):  
Umesh.P. Gomes ◽  
Mr. Kuldeep ◽  
S. Rathi ◽  
Dhrubes Biswas

A review is presented on the advances in InAlAs/InGaAs High Electron Mobility transistors (HEMT) on silicon substrates for high frequency and low noise applications. Although InAlAs/InGaAs HEMTs on InP and GaAs substrates have been much appreciated due to their superior performance, their widespread applications have been hindered due to higher cost of the substrates. Silicon has been used as an alternative substrate considering the benefits of low cost, technological maturity and integration of III-V and silicon technology inspite of the constraints like lattice mismatch and large difference in thermal expansion coefficient.


2011 ◽  
Vol 50 (9R) ◽  
pp. 096503 ◽  
Author(s):  
Chin-Te Wang ◽  
Chien-I Kuo ◽  
Heng-Tung Hsu ◽  
Edward Yi Chang ◽  
Li-Han Hsu ◽  
...  


2011 ◽  
Vol 50 (9) ◽  
pp. 096503 ◽  
Author(s):  
Chin-Te Wang ◽  
Chien-I Kuo ◽  
Heng-Tung Hsu ◽  
Edward Yi Chang ◽  
Li-Han Hsu ◽  
...  


ETRI Journal ◽  
1996 ◽  
Vol 18 (3) ◽  
pp. 171-179 ◽  
Author(s):  
Jin-Hee Lee Lee ◽  
Hyung-Sup Yoon Yoon ◽  
Byung-Sun Park Park ◽  
Chul Soon Park Park ◽  
Sang-Soo Choi Choi ◽  
...  


1985 ◽  
Vol 6 (10) ◽  
pp. 531-533 ◽  
Author(s):  
P.C. Chao ◽  
S.C. Palmateer ◽  
P.M. Smith ◽  
U.K. Mishra ◽  
K.H.G. Duh ◽  
...  


2011 ◽  
Vol 1324 ◽  
Author(s):  
Takuma Nanjo ◽  
Misaichi Takeuchi ◽  
Akifumi Imai ◽  
Yousuke Suzuki ◽  
Muneyoshi Suita ◽  
...  

ABSTRACTA channel layer substitution of a wider bandgap AlGaN for a conventional GaN in high electron mobility transistors (HEMTs) is an effective method of enhancing the breakdown voltage. Wider bandgap AlGaN, however, should also increase the ohmic contact resistance. Si ion implantation doping technique was utilized to achieve sufficiently low resistive source/drain contacts. The fabricated AlGaN channel HEMTs with the field plate structure demonstrated good pinch-off operation with sufficiently high drain current density of 0.5 A/mm without noticeable current collapse. The obtained maximum breakdown voltages was 1700 V in the AlGaN channel HEMT with the gate-drain distance of 10 μm. These remarkable results indicate that AlGaN channel HEMTs could become future strong candidates for not only high-frequency devices such as low noise amplifiers but also high-power devices such as switching applications.





AIP Advances ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 085004 ◽  
Author(s):  
Isabel Harrysson Rodrigues ◽  
David Niepce ◽  
Arsalan Pourkabirian ◽  
Giuseppe Moschetti ◽  
Joel Schleeh ◽  
...  






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