Corrosion and mechanical behavior evaluation of in-situ synthesized Cu-TiB2 nanocomposite

2021 ◽  
Vol 1 (2) ◽  
pp. 121-126
Author(s):  
Hossein Aghajani ◽  
Seyed Ali Naziri Mehrabani ◽  
Arvin Taghizadeh Tabrizi ◽  
Falih Hussein Saddam
Keyword(s):  
Corrosion Resistance ◽  
Electrochemical Impedance ◽  
Copper Matrix ◽  
Polarization Current ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Galvanic Couples ◽  
Matrix Nanocomposite

In this paper, the synthesis of the copper matrix nanocomposite and the effect of adding TiB2 nanoparticles on the copper matrix was investigated. Three different amounts of TiB2 nanoparticles 5, 10, and 15 wt% were added and sintering was carried out at 900 oC for 4 hours under argon atmosphere. The phase formation of achieved nanocomposites was studied by X-ray diffractometer and the morphology of the synthesized samples was studied by field emission scanning electron microscopy and atomic force microscopy. The polarization and electrochemical impedance spectroscopy (EIS) at 3.5 wt% NaCl solution at room temperature was were carried out to evaluate the corrosion behavior of synthesized samples. Results show that adding the TiB2 nanoparticles decrease the corrosion resistance by the formation of galvanic couples, but the effect of amounts of porosities on the corrosion resistance is higher. It is revealed that the variation of the surface roughness is in direct relation to the value of polarization current density.

In situ X-ray Scattering Study of the Formation of Au Nano Crystals During Thermal Annealing

2007 ◽  
Vol 1027 ◽  
Author(s):  
Do Young Noh ◽  
Ki-Hyun Ryu ◽  
Hyon Chol Kang
Keyword(s):  
Thermal Annealing ◽  
Bragg Reflection ◽  
Ex Situ ◽  
X Ray ◽  
Force Microscopy ◽  
X Ray Scattering ◽  
Atomic Force ◽  
Au Thin Films ◽  
Ray Scattering

AbstractThe transformation of Au thin films grown on sapphire (0001) substrates into nano crystals during thermal annealing was investigated by in situ synchrotron x-ray scattering and ex situ atomic force microscopy (AFM). By monitoring the Au(111) Bragg reflection and the low Q reflectivity and comparing them with ex situ AFM images, we found that polygonal-shape holes were nucleated and grow initially. As the holes grow larger and contact each other, their boundary turns into Au nano crystals. The Au nano crystals have a well-defined (111) flat top surface and facets in the in-plane direction.

Large Area Supersonic Jet Epitaxy of AlN, GaN, and SiC on Silicon

1996 ◽  
Vol 449 ◽  
Author(s):  
L.J. Lauhon ◽  
S. A. Ustin ◽  
W. Ho
Keyword(s):  
Supersonic Jet ◽  
X Ray Diffraction ◽  
Large Area ◽  
Free Jets ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Supersonic Jet Epitaxy ◽  
Carrier Gases

ABSTRACTAlN, GaN, and SiC thin films were grown on 100 mm diameter Si(111) and Si(100) substrates using Supersonic Jet Epitaxy (SJE). Precursor gases were seeded in lighter mass carrier gases and free jets were formed using novel slit-jet apertures. The jet design, combined with substrate rotation, allowed for a uniform flux distribution over a large area of a 100 mm wafer at growth pressures of 1–20 mTorr. Triethylaluminum, triethylgailium, and ammonia were used for nitride growth, while disilane, acetylene, and methylsilane were used for SiC growth. The films were characterized by in situ optical reflectivity, x-ray diffraction (XRD), atomic force microscopy (AFM), and spectroscopic ellipsometry (SE).

(G03 Best Paper Award Winner) Analysis of Sn Behavior During Ni/GeSn Solid-State Reaction by Correlated X-ray Diffraction, Atomic Force Microscopy, and Ex-situ/In-situ Transmission Electron Microscopy

2020 ◽  
Vol MA2020-02 (24) ◽  
pp. 1750-1750
Author(s):  
Andrea Quintero Colmenares ◽  
Patrice Gergaud ◽  
Jean-Michel Hartmann ◽  
Vincent Delaye ◽  
Nicolas Bernier ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Ex Situ ◽  
Paper Award ◽  
X Ray Diffraction ◽  
Award Winner ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron

Annealing effects on the electrical conductivity of polymerized liquid crystalline 3,4-ethylenedioxythiophene derivatives

e-Polymers ◽  
2006 ◽  
Vol 6 (1) ◽  
Author(s):  
Noelle Wrubbel ◽  
Helmut Ritter ◽  
Knud Reuter ◽  
Alexander Karbach ◽  
Doris Drechsler
Keyword(s):  
Electrical Conductivity ◽  
Atomic Force Microscopy ◽  
Liquid Crystal ◽  
Liquid Crystalline ◽  
Electrically Conductive ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Annealing Effects

Abstract3,4-Ethylenedioxythiophene derivatives with aromatic, in most cases mesogenic, side groups were synthesized and their liquid crystal behaviour was characterized. These monomers were polymerized oxidatively to charged, electrically conductive polythiophenes. X-ray and atomic force microscopy studies were performed. Films of theses polythiophenes achieved via in situ polymerization were prone to a significant increase of the conductivity by annealing.

Effect of pH on ceria–silica interactions during chemical mechanical polishing

2005 ◽  
Vol 20 (5) ◽  
pp. 1139-1145 ◽  
Author(s):  
Jeremiah T. Abiade ◽  
Wonseop Choi ◽  
Rajiv K. Singh
Keyword(s):  
Photoelectron Spectroscopy ◽  
Chemical Mechanical Polishing ◽  
Mechanical Polishing ◽  
Force Measurements ◽  
X Ray ◽  
Force Microscopy ◽  
Substrate Interaction ◽  
Atomic Force ◽  
Silica Removal

To understand the ceria–silica chemical mechanical polishing (CMP) mechanisms, we studied the effect of ceria slurry pH on silica removal and surface morphology. Also, in situ friction force measurements were conducted. After polishing; atomic force microscopy, x-ray photoelectron spectroscopy, and scanning electron microscopy were used to quantify the extent of the particle–substrate interaction during CMP. Our results indicate the silica removal by ceria slurries is strongly pH dependent, with the maximum occurring near the isoelectric point of the ceria slurry.

SURFACTANT EFFECT OF In ON THE MOVPE GROWTH OF Al- AND N-POLAR AlN

2016 ◽  
Vol 24 (06) ◽  
pp. 1750081
Author(s):  
QINQIN ZHUANG ◽  
JUNYONG KANG ◽  
SHUPING LI ◽  
WEI LIN
Keyword(s):  
Theoretical Calculations ◽  
Growth Conditions ◽  
X Ray ◽  
Force Microscopy ◽  
Surfactant Effect ◽  
Density Of Dislocations ◽  
Atomic Force ◽  
Surface Flatness ◽  
Movpe Growth

Al- and N-polar AlN have been grown by metalorganic vapor phase epitaxy (MOVPE) with the assistance of In dopant and characterized by in situ interferometry, ellipsometry, scanning electron microscopy, atomic force microscopy, and X-ray diffractometry. The growth of Al-polar AlN is faster with smoother surfaces than the N-polar ones, which is explained by theoretical calculations. The surfactant effect of In is confirmed by improving the growth rate and surface flatness without getting into the epilayer. Additionally, In is also favorable for reducing the density of dislocations and improving the crystalline quality, especially that of Al-polar AlN. The results suggest that using In surfactant to grow the Al-polar AlN epilayer leads to a better crystal quality under proper pre-growth treatments, low- and high-temperature AlN growth conditions.

Surface Structural Characterization and Mechanical Testing by Nanoindentation Measurements of Hybrid Polymer/clay Nanostructured Multilayer Films

2002 ◽  
Vol 17 (7) ◽  
pp. 1622-1633 ◽  
Author(s):  
Xiaowu Fan ◽  
Mi-Kyoung Park ◽  
Chuanjun Xia ◽  
Rigoberto Advincula
Keyword(s):  
Thin Films ◽  
Quartz Crystal ◽  
Ex Situ ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Diallyldimethylammonium Chloride

Nanostructured montmorillonite/poly(diallyldimethylammonium chloride) multilayer thin films were fabricated up to 100 layers thick by stepwise alternating polyelectrolyte and clay deposition from solution. The structure and morphology of the films were characterized by x-ray diffraction, ellipsometry, atomic force microscopy, and quartz crystal microbalance ex situ and in situ measurements. The mechanical properties were tested by nanoindentation. The hardness of the multilayer thin film was 0.46 GPa. The thin film's modulus was correlated to its ordering and anisotropic structure. Both hardness and modulus of this composite film were higher than those of several other types of polymer thin films.

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