scholarly journals A Study on Structure and Magnetic Properties of Fe-N Thin Films with Different DC Magnetron Sputtering Power and Time

2017 ◽  
Vol 50 (2) ◽  
pp. 119-124
Author(s):  
Dong-Won Han ◽  
Won-Uk Park ◽  
Jong-Woo Kim ◽  
Ah-Ram Kwon
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Sputtering Power

Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

2013 ◽  
Vol 802 ◽  
pp. 47-52
Author(s):  
Chuleerat Ibuki ◽  
Rachasak Sakdanuphab
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Magnetron Sputtering ◽  
Crystalline Structure ◽  
Glass Substrate ◽  
Intrinsic Stress ◽  
Dc Magnetron Sputtering ◽  
Adhesion Properties ◽  
Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

scholarly journals Magnetic properties of ordered polycrystalline FeRh thin films

RSC Advances ◽  
2017 ◽  
Vol 7 (70) ◽  
pp. 44097-44103 ◽  
Author(s):  
Jingfan Ye ◽  
Marco Hauke ◽  
Vikram Singh ◽  
Rajeev Rawat ◽  
Mukul Gupta ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Magnetron Sputtering ◽  
Metamagnetic Transition ◽  
Dc Magnetron Sputtering

Metamagnetic transition in polycrystalline Fe-Rh film on Al2O3 (0001) deposited by DC magnetron sputtering.

Optimization in Synthesis of ITO Thin Films Fabricated by DC Magnetron Sputtering Method

2014 ◽  
Vol 575 ◽  
pp. 254-263 ◽  
Author(s):  
Hua Jing Zheng ◽  
Chi Zhang ◽  
Zheng Ruan
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Conductivity ◽  
Magnetron Sputtering ◽  
Water Pressure ◽  
Dc Magnetron Sputtering ◽  
Sputtering Power ◽  
Conductive Substrate ◽  
Ito Thin Films ◽  
Sputtering Pressure

With high optical transparency and electrical conductivity, ITO thin films were fabricated by DC magnetron sputtering. Series of research and exploration are presented on DC magnetron sputtering method for preparing ITO thin film. With substrate temperature of 60 °C, sputtering power of 200W,sputtering pressure of 1 mTorr, water pressure of 2×10-5Torr, the sheet resistance of the ITO conductive substrate is 53 Ω/□ and the transmittance is 83%.

Crystal structures and magnetic properties of Fe–N thin films deposited by dc magnetron sputtering

2004 ◽  
Vol 19 (4) ◽  
pp. 352-355 ◽  
Author(s):  
Wei Tao Zheng ◽  
Xin Wang ◽  
Xianggui Kong ◽  
Hongwei Tian ◽  
Shansheng Yu ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Magnetron Sputtering ◽  
Crystal Structures ◽  
Photoelectron Spectroscopy ◽  
Quantum Interference ◽  
Flow Ratio ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Glass Substrates

Fe–N thin films were deposited on glass substrates by dc magnetron sputtering under various Ar∕N2 discharge conditions. Crystal structures and elemental compositions of the films were characterized by X-ray diffraction and X-ray photoelectron spectroscopy. Magnetic properties of the films were measured using a superconducting quantum interference device magnetometer. Films deposited at different N2∕(Ar+N2) flow ratios were found to have different crystal structures and different nitrogen contents. When the flow ratios were 60%, 50%, and 30%, a nonmagnetic single-phase FeN was formed in the films. At the flow ratio of 10%, two crystal phases of γ′-Fe4N and ε-Fe3N were detected. When the flow ratio reduced to 5%, a mixture of α-Fe, ε-Fe3N, FeN0.056, and α″-Fe16N2 phases was obtained. The value of saturation magnetization for the mixture was found to be larger than that of pure Fe.

Tuning the magnetic properties of FeCo by pulsed DC magnetron sputtering

CrystEngComm ◽  
2014 ◽  
Vol 16 (40) ◽  
pp. 9528-9533 ◽  
Author(s):  
M. Abuín ◽  
L. Pérez ◽  
A. Mascaraque ◽  
M. Maicas
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering ◽  
20 Nm

Changes in coercivity and atomic distances (EXAFS) of 20 nm Fe53Co47 thin films grown by DC and PCD magnetron sputtering.

A Study of ITO Thin Films Fabricated by DC Magnetron Sputtering Method

2013 ◽  
Vol 834-836 ◽  
pp. 79-89
Author(s):  
Xian Ming Yang ◽  
Lin Liu ◽  
Juan Xiu Lin
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Pressure Work ◽  
Atomic Force ◽  
Work Pressure ◽  
Sputtering Power ◽  
Ito Thin Films ◽  
Test Table

With high optical transparency and electrical conductivity, ITO thin films were fabricated by DC magnetron sputtering. Based on orthogonal test table L18 (35), the effects of process parameters included water partial pressure, work pressure, substrate temperature, oxygen flow rate and sputtering power, on the optoelectronics properties of ITO thin films were investigated in detail(systematically). Calibration of sheet resistance transmittance, atomic force microscope, and X-ray diffraction were employed to characterize the ITO films.

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