VO2 and V2O3 Films Fabricated on (1000) or (1010)Al2O3 by Reactive RF-Magnetron Sputter Deposition and Annealing Processes
Keyword(s):
2008 ◽
Vol 52
(4)
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pp. 1070-1076
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2009 ◽
Vol 48
(4)
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pp. 04C139
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2009 ◽
Vol 12
(4)
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pp. H109
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2019 ◽
Vol 216
(20)
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pp. 1900385
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2010 ◽
Vol 49
(4)
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pp. 04DP09
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2000 ◽
Vol 192-195
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pp. 255-258
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