silicon hydride
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2021 ◽  
Vol 135 ◽  
pp. 106063
Author(s):  
Ryo Hirose ◽  
Takeshi Kadono ◽  
Ayumi Onaka-Masada ◽  
Ryosuke Okuyama ◽  
Koji Kobayashi ◽  
...  

Molecules ◽  
2021 ◽  
Vol 26 (20) ◽  
pp. 6166
Author(s):  
Serge Ismael Zida ◽  
Yue-Der Lin ◽  
Yit Lung Khung

While the sonochemical grafting of molecules on silicon hydride surface to form stable Si–C bond via hydrosilylation has been previously described, the susceptibility towards nucleophilic functional groups during the sonochemical reaction process remains unclear. In this work, a competitive study between a well-established thermal reaction and sonochemical reaction of nucleophilic molecules (cyclopropylamine and 3-Butyn-1-ol) was performed on p-type silicon hydride (111) surfaces. The nature of surface grafting from these reactions was examined through contact angle measurements, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Cyclopropylamine, being a sensitive radical clock, did not experience any ring-opening events. This suggested that either the Si–H may not have undergone homolysis as reported previously under sonochemical reaction or that the interaction to the surface hydride via a lone-pair electron coordination bond was reversible during the process. On the other hand, silicon back-bond breakage and subsequent surface roughening were observed for 3-Butyn-1-ol at high-temperature grafting (≈150 °C). Interestingly, the sonochemical reaction did not produce appreciable topographical changes to surfaces at the nano scale and the further XPS analysis may suggest Si–C formation. This indicated that while a sonochemical reaction may be indifferent towards nucleophilic groups, the surface was more reactive towards unsaturated carbons. To the best of the author’s knowledge, this is the first attempt at elucidating the underlying reactivity mechanisms of nucleophilic groups and unsaturated carbon bonds during sonochemical reaction of silicon hydride surfaces.


2020 ◽  
Vol 11 (4) ◽  
pp. 484-491
Author(s):  
P. O. Kuzema ◽  
◽  
D. L. Starokadomsky ◽  
O. O. Tkachenko ◽  
V. A. Tertykh ◽  
...  

Fumed silica (FS) is widely used in numerous fields of application, the plastics industry being one of the most significance, where FS has proved to be successful as an efficient thickening, thixotropic, and anti-settling agent, as well as reinforcing filler. Chemical modification of silica surface enlarges its functional capabilities. In particular, silica with grafted silicon hydride groups was found to be active in the processes of hydrosilylation of alkene and alkyne bonds in monomers during their polymerization, resulting in the formation of reinforced polymeric composites. Recently, specific epoxy resins have gained significance, and FS was found to be useful, particularly as rheological additive. The aim of this study was to evaluate the efficiency of hydride-silylated FS (HFS) as a potentially active reinforcing component for epoxy-based polymers. The activation energy for hydrosilylation of olefins is higher than that for ring-opening polymerization of epoxides, therefore, one may expect the latter process with participation of ≡SiH groups to proceed more readily. HFS was obtained via FS treatment with triethoxysilane. The presence of grafted silicon hydride groups was confirmed by means of IR spectroscopy, and their concentration measured by titrimetric and spectrophotometric analysis was found to be about 0.4 mmol/g. FS-epoxy and HFS-epoxy composites were prepared by the corresponding filler introduction (2 wt. % loading) into the mixture of epoxy monomer and amine hardener. The resulted materials after curing were subject to compression, bending, and adhesion tests. Compression tests revealed that filling with FS and HFS reduced the compressive strength by 10%, however, HFS-epoxy composite was found to possess an increased by 20 % Young’s modulus for compression as compared to that for the unfilled epoxy polymer. Upon this, 2 wt. % loading with silicas keeps the ductility of the polymer. Also, silica-containing epoxy polymers showed an improved bending strength and bending modulus, the former being two times higher for HFS-epoxy composite than that for the unfilled polymer. The adhesion to steel was found to increase by more than 2 times upon filling with silicas, HFS-epoxy composite being also superior as compared to the FS-epoxy one. Thus, preliminary results indicate that fumed silica with grafted silicon hydride groups shows promise as active reinforcing filler for epoxy polymers.


2020 ◽  
Vol 102 (4) ◽  
Author(s):  
Alessandra Puglisi ◽  
Patricia Selles ◽  
Nicolas Sisourat ◽  
Stéphane Carniato

2019 ◽  
Vol 44 (48) ◽  
pp. 26459-26468
Author(s):  
Li Ma ◽  
Tao Zhou ◽  
Jinyun Li ◽  
Hongshan Chen

2018 ◽  
Vol 2 (1) ◽  
pp. 46-54 ◽  
Author(s):  
Chenxi Qian ◽  
Wei Sun ◽  
Darius L. H. Hung ◽  
Chenyue Qiu ◽  
Meysam Makaremi ◽  
...  

Molecules ◽  
2018 ◽  
Vol 23 (10) ◽  
pp. 2712 ◽  
Author(s):  
Chieh-Hua Lee ◽  
Wan-Cian Chen ◽  
Yit Khung

Following on from our previous study on the resonance/inductive structures of ethynylaniline, this report examines similar effects arising from resonance structures with aromatic aminothiophenol with dual electron-donating substituents. In brief, 2- and 3-aminothiophenol were thermally grafted on silicon (111) hydride substrate at 130 °C under nonpolar aprotic mesitylene. From the examination of high resolution XPS Si2p, N1s, and S2p spectrum, it was noticed that there was a strong preference of NH2 over SH to form Si–N linkage on the silicon hydride surface for 2-aminothiophenol. However, for 3-aminothiophenol, there was a switch in reactivity of the silicon hydride toward SH group. This was attributed to the antagonistic and cooperative resonance effects for 2- and 3-aminothiophenol, respectively. The data strongly suggested that the net resonance of the benzylic-based compound could have played an important role in the net distribution of negative charge along the benzylic framework and subsequently influenced the outcome of the surface reaction. To the best of the authors’ knowledge, this correlation between dual electron-donating substituents and the outcome of the nucleophilic addition toward silicon hydride surfaces has not been described before in literature.


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