melt annealing
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2018 ◽  
Vol 86 (7) ◽  
pp. 357-372 ◽  
Author(s):  
John O Borland ◽  
Shang-Shuin Chaung ◽  
Tseung-Yuen Tseng ◽  
Abhijeet Joshi ◽  
Bulent Basol ◽  
...  


2018 ◽  
Vol 20 (1) ◽  
pp. 137-147 ◽  
Author(s):  
Xiao-Rong Sun ◽  
Tao Gong ◽  
Jun-Hong Pu ◽  
Rui-Ying Bao ◽  
Bang-Hu Xie ◽  
...  

Effect of phase coarsening on CB NP network formation and the electrical performance of double percolated PP/PS/CB composites under quiescent melt annealing.



2017 ◽  
Vol 19 (20) ◽  
pp. 12712-12719 ◽  
Author(s):  
Tao Gong ◽  
Rui-Ying Bao ◽  
Zheng-Ying Liu ◽  
Bang-Hu Xie ◽  
Ming-Bo Yang ◽  
...  

The relationship between the mobility of polymer molecular chains and the phase coarsening process of co-continuous, immiscible polymer blends under quiescent melt annealing is presented.



2017 ◽  
Vol 2017 ◽  
pp. 1-11 ◽  
Author(s):  
Aline Emplit ◽  
Fang Fang Tao ◽  
Pascale Lipnik ◽  
Guido Heunen ◽  
Christian Bailly ◽  
...  

We study the influence of melt annealing and the presence of a block copolymer compatibilizer on the electrical properties of polypropylene carbon nanotubes (CNT) nanocomposites from the DC limit to microwave frequencies and link it to the morphological details. We show that the compatibilizer concentration controls three types of morphologies: separate CNT agglomerates, a network of well dispersed but interconnected CNT, and individualized but separate nanotubes. This explains why conductivity reaches an optimum over the whole frequency range at a low compatibilizer concentration. We model the corresponding structures by a semiquantitative schematic equivalent electrical circuit. A key outcome of the work is the understanding and control of dispersion mechanisms in order to optimize the electrical performances for efficient EMI shielding depending on the targeted frequency range.



2016 ◽  
Vol 858 ◽  
pp. 565-568 ◽  
Author(s):  
Fulvio Mazzamuto ◽  
Sebastien Halty ◽  
Hideaki Tanimura ◽  
Yoshihiro Mori

In this work, we demonstrate the possibility to achieve an ohmic contact using a low thermal budget applicable to backside processing after wafer thinning. The process window for laser annealing as a function of the thinning process is investigated. By laser melt annealing, we demonstrate the possibility for different silicide phases from pure nickel deposition on thinned 4H-SiC, formation of uniform carbon nanoclusters at the metal/SiC interface and recovery of thinning-induced defects. This has been demonstrated as a function of different thinning process and surface conditions.



2016 ◽  
Vol 858 ◽  
pp. 540-543 ◽  
Author(s):  
Fulvio Mazzamuto ◽  
Sebastien Halty ◽  
Yoshihiro Mori

We have demonstrated the possibility for epitaxial regrowth of crystalline SiC by laser melt annealing. The quality of the recrystallization is analyzed by XTEM, EELS, electron diffraction and XRD. The annealing guarantees a uniform activation achieved both in melting and solid phase. Carbon graphitization on the top surface and a crystallized silicon layer below is observed as an effect of the high temperature and the melting phase.



2016 ◽  
Vol 4 (19) ◽  
pp. 4143-4149 ◽  
Author(s):  
Vasyl Skrypnychuk ◽  
Nicolas Boulanger ◽  
Victor Yu ◽  
Michael Hilke ◽  
Michael F. Toney ◽  
...  

We report on the effect of the annealing temperature on the crystallization and the electrical properties of the semiconducting polymer poly(3-hexylthiophene) (P3HT) on single layer graphene.



2014 ◽  
Vol 110 ◽  
pp. 56-64 ◽  
Author(s):  
Gennaro Gentile ◽  
Veronica Ambrogi ◽  
Pierfrancesco Cerruti ◽  
Rosa Di Maio ◽  
Giuseppe Nasti ◽  
...  


2014 ◽  
Vol 37 ◽  
pp. 834-839 ◽  
Author(s):  
D.W. Ma ◽  
C. Cheng ◽  
Y.N. Zhang ◽  
Z.S. Xu


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