International Forum “Microelectronics – 2020”. Joung Scientists Scholarship “Microelectronics – 2020”. XIII International conference «Silicon – 2020». XII young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
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9785317064709

Author(s):  
Elsa Zaitseva ◽  
Olga Naumova

This study aims to found the conditions under which the same carrier distribution is achieved in thin-film structures with different design parameters, which is necessary for a correct comparison of the mobility in films. It was shown that the carrier distribution is controlled by a number of parameters which can be determined from the experimental dependences of the thin-film transistors.


Author(s):  
Ekaterina Ganykina ◽  
Evgeniy Gornev ◽  
Askar Rezvanov

In this paper, the formation and rupture of a conducting filament in the Hf/HfO2/TiN structure are investigated. Theoretical consideration of the thermal effects occurring during the RESET process is covered. The analysis of the formation and rupture of a filament in an amorphous HfO2 layer is carried out. The introduction of the thin Al2O3 layer into the Hf/HfO2/TiN structure is also considered.


Author(s):  
Evgeniya Okulich ◽  
Davud Guseinov ◽  
Dmitry Korolev ◽  
Alexey Belov ◽  
Victor Okulich ◽  
...  

An original model of resistive switching of metal oxide memristive devices is proposed. The efficiency and flexibility of the approach are demonstrated by the example of experimentally realized Au/oxide/TiN structures.


Author(s):  
Olga Naumova ◽  
Elsa Zaitseva ◽  
Alexandr Aseev ◽  
Vladimir Generalov ◽  
Alexandr Safatov

This study aims to development of basic elements of silicon biosensors with an analyte concentration by an alternating electric field and investigate the behavior of viruses in devices.


Author(s):  
Dmitriy Shipitsin ◽  
Aleksandr Potupchik ◽  
Aleksandr Shemyakin

A review of the main, in terms of the influence on the electrophysical behavior of the MOS transistor, topology-dependent effects (LDE) was performed. Approaches to development test structures designed for their subsequent measurement, extraction of SPICE parameters and integration the results into a compact model are proposed.


Author(s):  
Svetlana Cherkova ◽  
Vladimir Volodin ◽  
Vladimir Skuratov ◽  
Gregory Krivyakin ◽  
Gennadiy Kamaev

The optical and structural properties of silicon irradiated with swift heavy Xe ions are investigated. In the photoluminescence (PL) spectra at low temperatures, a broad peak is observed in the range 1.3 - 1.5 μm. With an increase in the irradiation dose from 5 × 1010 to 1013 cm –2, the PL peak decreases and became narrows. Annealing at a temperature of 400° C leads to multiple signal amplification (up to 35 times).


Author(s):  
Anatolievich Vladimir ◽  
Zhanna Smagina ◽  
Aigul Zinovieva ◽  
Anatoly Dvurechenskii ◽  
Aleksandr Mudryi

This work devotes to a comparative study of the photoluminescence of Ge/Si epitaxial structures with quantum dots created with using ion beam irradiation and structures with Ge nanoclusters formed as a result of the implantation of Ge ions into silicon and subsequent annealing.


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