High-Performance Randomly Oriented Zeolite Membranes Using Brittle Seeds and Rapid Thermal Processing

2010 ◽  
Vol 49 (46) ◽  
pp. 8699-8703 ◽  
Author(s):  
Won Cheol Yoo ◽  
Jared A. Stoeger ◽  
Pyung-Soo Lee ◽  
Michael Tsapatsis ◽  
Andreas Stein
2010 ◽  
Vol 122 (46) ◽  
pp. 8881-8885 ◽  
Author(s):  
Won Cheol Yoo ◽  
Jared A. Stoeger ◽  
Pyung-Soo Lee ◽  
Michael Tsapatsis ◽  
Andreas Stein

1987 ◽  
Vol 92 ◽  
Author(s):  
R. S. Hockett

ABSTRACTRapid Thermal Processing is being evaluated in the IC industry as a way to meet the thermal budget requirements of reduced scaling in high performance Si IC's. As scaling is reduced and alternative processing is used, the study of low level interfacial impurities is expected to become more important. An example is presented here for the redistribution of interfacial impurities under RTP for polysilicon capped silicon similar to that proposed for shallow junction bipolar transistors.


1991 ◽  
Vol 224 ◽  
Author(s):  
Mehrdad M. Moslehi ◽  
John Kuehne ◽  
Richard Yeakley ◽  
Lino Velo ◽  
Habib Najm ◽  
...  

AbstractAdvanced rapid thermal processing (RTP) equipment and sensors have been developed for in-situ fabrication of semiconductor devices. High-performance multi-zone lamp modules have been applied to various processes including rapid thermal oxidation (RTO), chemicalvapor deposition (CVD) of tungsten and amorphous/polycrystalline silicon, silicide formation, as well as high-temperature rapid thermal annealing (RTA). Concurrent use of multizone lamps and multi-point temperature sensors allows real-time wafer temperature control and process uniformity optimization. Specific experimental results will be presented on the multi-zone lamp modules, in-situ process control sensors, and single-wafer fabrication processes.


Author(s):  
R.A. Chapman ◽  
J.W. Kuehne ◽  
P.S.-H. Ying ◽  
W.F. Richardson ◽  
A.R. Paterson ◽  
...  

Membranes ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 623
Author(s):  
Eiji Hayakawa ◽  
Shuji Himeno

The synthesis of DDR-type zeolite membranes faces the problem of cracks that occur on the zeolite membrane due to differences in the thermal expansion coefficient between zeolite and the porous substrate during the detemplating process. In this study, Al-containing ZSM-58 zeolite membranes with DDR topology were prepared by rapid thermal processing (RTP), with the aim of developing a reproducible method for preparing DDR zeolite membrane without cracks. Moreover, we verified the influence of RTP before performing conventional thermal calcination (CTC) on ZSM-58 membranes with various silica-to-aluminum (Si/Al) molar ratios. Using the developed method, an Al-containing ZSM-58 membrane without cracks was obtained, along with complete template removal by RTP, and it had higher CO2/CH4 selectivity. An all-silica ZSM-58 membrane without cracks was obtained by only using the ozone detemplating method. ZSM-58 crystals and membranes with various Si/Al molar ratios were analyzed by using Fourier-transform infrared (FTIR) spectroscopy to confirm the effects of RTP treatment. Al-containing ZSM-58 zeolites had higher silanol concentrations than all-silica zeolites, confirming many silanol condensations by RTP. The condensation of silanol forms results in the formation of siloxane bonds and stronger resistance to thermal stress; therefore, RTP caused crack suppression in Al-containing ZSM-58 membranes. The results demonstrate that Al-containing ZSM-58 zeolite membranes with high CO2 permeance and CO2/CH4 selectivity and minimal cracking can be produced by using RTP.


1993 ◽  
Vol 29 (25) ◽  
pp. 2178 ◽  
Author(s):  
T. Hayashi ◽  
Y. Kawazu ◽  
H. Fukuda ◽  
T. Iwabuchi

2018 ◽  
Vol 552 ◽  
pp. 13-21 ◽  
Author(s):  
Na Chang ◽  
Hongbo Tang ◽  
Lu Bai ◽  
Yanfeng Zhang ◽  
Gaofeng Zeng

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