High performance sub-half micron CMOS using rapid thermal processing

2002 ◽  
Author(s):  
R.A. Chapman ◽  
J.W. Kuehne ◽  
P.S.-H. Ying ◽  
W.F. Richardson ◽  
A.R. Paterson ◽  
...  
Keyword(s):  
Thermal Processing ◽  
High Performance ◽  
Rapid Thermal Processing

The Redistribution of Impurities Under RTP for Polysilicon Capped Silicon

1987 ◽  
Vol 92 ◽  
Author(s):  
R. S. Hockett
Keyword(s):  
Thermal Processing ◽  
High Performance ◽  
Rapid Thermal Processing ◽  
Bipolar Transistors ◽  
Thermal Budget ◽  
Shallow Junction ◽  
Low Level ◽  
Alternative Processing

ABSTRACTRapid Thermal Processing is being evaluated in the IC industry as a way to meet the thermal budget requirements of reduced scaling in high performance Si IC's. As scaling is reduced and alternative processing is used, the study of low level interfacial impurities is expected to become more important. An example is presented here for the redistribution of interfacial impurities under RTP for polysilicon capped silicon similar to that proposed for shallow junction bipolar transistors.

In-Situ Fabrication and Process Control Techniques in Rapid Thermal Processing

1991 ◽  
Vol 224 ◽  
Author(s):  
Mehrdad M. Moslehi ◽  
John Kuehne ◽  
Richard Yeakley ◽  
Lino Velo ◽  
Habib Najm ◽  
...  
Keyword(s):  
Process Control ◽  
Thermal Processing ◽  
Polycrystalline Silicon ◽  
High Performance ◽  
Rapid Thermal Processing ◽  
Control Techniques ◽  
In Situ Fabrication ◽  
Concurrent Use ◽  
Process Uniformity

AbstractAdvanced rapid thermal processing (RTP) equipment and sensors have been developed for in-situ fabrication of semiconductor devices. High-performance multi-zone lamp modules have been applied to various processes including rapid thermal oxidation (RTO), chemicalvapor deposition (CVD) of tungsten and amorphous/polycrystalline silicon, silicide formation, as well as high-temperature rapid thermal annealing (RTA). Concurrent use of multizone lamps and multi-point temperature sensors allows real-time wafer temperature control and process uniformity optimization. Specific experimental results will be presented on the multi-zone lamp modules, in-situ process control sensors, and single-wafer fabrication processes.

High performance scaled flash-type EEPROMs fabricated by in situ multiple rapid thermal processing

1993 ◽  
Vol 29 (25) ◽  
pp. 2178 ◽  
Author(s):  
T. Hayashi ◽  
Y. Kawazu ◽  
H. Fukuda ◽  
T. Iwabuchi
Keyword(s):  
Thermal Processing ◽  
High Performance ◽  
Rapid Thermal Processing

High-Performance Randomly Oriented Zeolite Membranes Using Brittle Seeds and Rapid Thermal Processing

2010 ◽  
Vol 49 (46) ◽  
pp. 8699-8703 ◽  
Author(s):  
Won Cheol Yoo ◽  
Jared A. Stoeger ◽  
Pyung-Soo Lee ◽  
Michael Tsapatsis ◽  
Andreas Stein
Keyword(s):  
Thermal Processing ◽  
High Performance ◽  
Rapid Thermal Processing ◽  
Zeolite Membranes

High-Performance Randomly Oriented Zeolite Membranes Using Brittle Seeds and Rapid Thermal Processing

2010 ◽  
Vol 122 (46) ◽  
pp. 8881-8885 ◽  
Author(s):  
Won Cheol Yoo ◽  
Jared A. Stoeger ◽  
Pyung-Soo Lee ◽  
Michael Tsapatsis ◽  
Andreas Stein
Keyword(s):  
Thermal Processing ◽  
High Performance ◽  
Rapid Thermal Processing ◽  
Zeolite Membranes

Point Defect Reaction in Silicon Wafers by Rapid Thermal Processing at More Than 1300°C Using an Oxidation Ambient

2019 ◽  
Vol 8 (1) ◽  
pp. P35-P40 ◽  
Author(s):  
Haruo Sudo ◽  
Kozo Nakamura ◽  
Susumu Maeda ◽  
Hideyuki Okamura ◽  
Koji Izunome ◽  
...  
Keyword(s):  
Point Defect ◽  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Silicon Wafers ◽  
Defect Reaction

Modeling, Identification, and Control of Rapid Thermal Processing Systems

1994 ◽  
Vol 141 (11) ◽  
pp. 3200-3209 ◽  
Author(s):  
Charles D. Schaper ◽  
Mehrdad M. Moslehi ◽  
Krishna C. Saraswat ◽  
Thomas Kailath
Keyword(s):  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
And Control

5 nm Gate Oxide Grown by Rapid Thermal Processing for Future MOSFETs

1990 ◽  
Vol 29 (Part 2, No. 1) ◽  
pp. L137-L140 ◽  
Author(s):  
Hisashi Fukuda ◽  
Akira Uchiyama ◽  
Takahisa Hayashi ◽  
Toshiyuki Iwabuchi ◽  
Seigo Ohno
Keyword(s):  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Gate Oxide
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