Cost-effective fabrication of a phase mask by direct etching of the laser-interference grating on fused silica substrate

A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves several steps: coating of substrates with controlled thickness of photoresist, formation of a grating mask by holograph interference exposure and development, and finally transferring etching of this mask into the fused silica substrate to form a permanent phase mask. Experimental measurements have shown that the zero order diffraction efficiency is less than 4% and the plus and minus first-order diffraction efficiency is more than 35%. Theoretical analysis has shown that these phase masks can be used for fabricating UV written Fiber Bragg Gratings.

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SEM analysis of DC magnetron sputtered beryllium films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100106867 ◽

1988 ◽

Vol 46 ◽

pp. 960-961

Author(s):

E. F. Lindsey ◽

C. W. Price ◽

E. L. Pierce ◽

E. J. Hsieh

Keyword(s):

Fine Structure ◽

Electron Emission ◽

Secondary Electron ◽

Low Voltage ◽

Ion Beam ◽

Secondary Electron Emission ◽

Sem Analysis ◽

Fused Silica ◽

Grain Structure ◽

Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

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Chemical Solution Deposition of La-Substituted BiFe0.5Sc0.5O3 Perovskite Thin Films on Different Substrates

Coatings ◽

10.3390/coatings11030307 ◽

2021 ◽

Vol 11 (3) ◽

pp. 307

Author(s):

Diana Griesiute ◽

Dovydas Karoblis ◽

Lina Mikoliunaite ◽

Aleksej Zarkov ◽

Andrei N. Salak ◽

...

Keyword(s):

Thin Films ◽

Chemical Solution Deposition ◽

Cost Effective ◽

Deposition Process ◽

Stability Study ◽

Fused Silica ◽

Chemical Solution ◽

Solution Deposition ◽

Optimal Annealing Temperature ◽

Xrd Patterns

In the present work, polycrystalline Bi0.67La0.33Fe0.5Sc0.5O3 thin films were synthesized using a simple and cost-effective chemical solution deposition process employing the spin coating technique. In order to check the feasibility of the fabrication of thin films on various types of substrates, the films were deposited on Pt-coated silicon, silicon, sapphire, corundum, fused silica and glass. Based on the results of thermogravimetric analysis of precursor and thermal stability study, it was determined that the optimal annealing temperature for the formation of perovskite structure is 600 °C. It was observed that the relative intensity of the pseudocubic peaks (001)p and (011)p in the XRD patterns is influenced by the nature of substrates, suggesting that the formed crystallites have some preferred orientation. Roughness of the films was determined to be dependent on the nature of the substrate.

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Characteristics of 10–110GHz Transmission Lines on Fused Silica Substrate for Millimeter-wave Modules

10.1109/icept52650.2021.9568008 ◽

2021 ◽

Author(s):

Tian Yu ◽

Kai Xue ◽

Ke Li ◽

Yihang Liang ◽

Daquan Yu

Keyword(s):

Millimeter Wave ◽

Transmission Lines ◽

Fused Silica ◽

Silica Substrate

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Numerical simulation of all-normal dispersion visible to near-infrared supercontinuum generation in photonic crystal fibers with core filled chloroform

HUE UNIVERSITY JOURNAL OF SCIENCE NATURAL SCIENCE ◽

10.26459/hueunijns.v130i1b.6243 ◽

2021 ◽

Vol 130 (1B) ◽

pp. 43-51

Author(s):

Thi Minh Ngoc Vo ◽

Dinh Quang Ho ◽

Tung Thanh Le ◽

Thi Gai Le ◽

Canh Trung Le ◽

...

Keyword(s):

Photonic Crystal ◽

Photonic Crystal Fiber ◽

Near Infrared ◽

Cost Effective ◽

Fused Silica ◽

Fiber Structure ◽

Normal Dispersion ◽

Crystal Fiber ◽

Crystal Fibers ◽

Mode Area

This study proposes a photonic crystal fiber made of fused silica glass, with the core infiltrated with chloroform as a new source of supercontinuum (SC) spectrum. We numerically study the guiding properties of the fiber structure in terms of characteristic dispersion and mode area of the fundamental mode. Based on the results, we optimized the structural geometries of the CHCl3-core photonic crystal fiber to support the broadband SC generations. The fiber structure with a lattice constant of 1 μm, a filling factor of 0.8, and the diameter of the first-ring air holes equaling 0.5 μm operates in all-normal dispersion. The SC with a broadened spectral bandwidth of 0.64 to 1.80 μm is formed by using a pump pulse with a wavelength of 850 nm, 120 fs duration, and power of 0.833 kW. That fiber would be a good candidate for all-fiber SC sources as cost-effective alternative to glass core fibers.

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A Microfluidic Mixer of High Throughput Fabricated in Glass Using Femtosecond Laser Micromachining Combined with Glass Bonding

Micromachines ◽

10.3390/mi11020213 ◽

2020 ◽

Vol 11 (2) ◽

pp. 213 ◽

Cited By ~ 2

Author(s):

Jia Qi ◽

Wenbo Li ◽

Wei Chu ◽

Jianping Yu ◽

Miao Wu ◽

...

Keyword(s):

Femtosecond Laser ◽

Three Dimensional ◽

Fused Silica ◽

Wet Etching ◽

Mixing Efficiency ◽

Cross Sectional ◽

Microfluidic Mixer ◽

Silica Substrate ◽

Femtosecond Laser Micromachining ◽

Bonding Method

We demonstrate a microfluidic mixer of high mixing efficiency in fused silica substrate using femtosecond laser-induced wet etching and hydroxide-catalysis bonding method. The micromixer has a three-dimensional geometry, enabling efficient mixing based on Baker’s transformation principle. The cross-sectional area of the fabricated micromixer was 0.5 × 0.5 mm2, enabling significantly promotion of the throughput of the micromixer. The performance of the fabricated micromixers was evaluated by mixing up blue and yellow ink solutions with a flow rate as high as 6 mL/min.

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Multiple modes of laser-induced pattern formation in nanoscopic Co films

MRS Proceedings ◽

10.1557/proc-0960-n02-02 ◽

2006 ◽

Vol 960 ◽

Cited By ~ 1

Author(s):

Christopher Favazza ◽

Justin Trice ◽

Radhakrishna Sureshkumar ◽

Ramki Kalyanaraman

Keyword(s):

Pattern Formation ◽

Laser Intensity ◽

Effective Means ◽

Cost Effective ◽

Range Order ◽

Laser Interference ◽

Pulse Laser Irradiation ◽

Single Beam ◽

Beam Laser ◽

Selection Of

ABSTRACTDewetting instabilities in nanoscopic Co films, induced by uniform multiple ns pulse laser irradiation, leads to a system of nanoparticles with robust spatial order. On the other hand, irradiation by non-uniform laser intensity, such as with a two beam laser interference pattern generates a quasi two-dimensional pattern of nanoparticles possessing long range order (LRO) and short range order (SRO). Here we discuss the various instabilities that are responsible for the production of these dissimilar patterns and length scales on the basis of their time scales. For the case of single beam irradiation, the film progresses in a manner that can be attributed to classical spinodal dewetting. Pattern formation from interference irradiation is the result of time scale-based selection of competing processes, which can be chosen by controlling the film thickness. This approach promises a simple and cost-effective means to self-assemble various nanostructures.

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Monolithic Three-Dimensional Integration of Micro-Fluidic Channels and Optical Waveguides in Fused Silica

MRS Proceedings ◽

10.1557/proc-782-a3.2 ◽

2003 ◽

Vol 782 ◽

Cited By ~ 9

Author(s):

Yves Bellouard ◽

Ali Said ◽

Mark Dugan ◽

Philippe Bado

Keyword(s):

Optical Waveguides ◽

Single Channel ◽

Three Dimensional ◽

Fused Silica ◽

Microfluidic Channels ◽

Major Step ◽

Micro Fabrication ◽

Silica Substrate ◽

Massively Parallel Processing ◽

Integrated Device

ABSTRACTThis paper presents dramatic improvements in the micro-fabrication of three-dimensional microfluidic channels and high-aspect ratio tunnels within the bulk of a fused silica substrate. We also report the fabrication of optical waveguides within the same substrate, which is a major step towards the integration of sensing capabilities within microfluidic networks.This integrated device, which combines both fluidic channels and optical waveguides, opens new opportunities in bio- and chemical sensing. The flexibility of the improved manufacturing process offers substantial new design capabilities, especially for single channel probing and massively parallel processing and sensing.

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