Reduction of residual stress in SiO2
-matrix silicon nano-crystal thin films by a combination of rapid thermal annealing and tube-furnace annealing
2012 ◽
Vol 210
(3)
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pp. 528-532
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Keyword(s):
1998 ◽
Vol 64
(1)
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pp. 109-115
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2013 ◽
Vol 51
(9)
◽
pp. 691-699
Keyword(s):
2003 ◽
Vol 27
(11)
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pp. 1083-1086
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Keyword(s):
1996 ◽
Vol 35
(Part 1, No. 8)
◽
pp. 4220-4224
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1990 ◽
Vol 164-165
◽
pp. 359-365
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