Thin Film Epitaxial Growth by Laser Ablation

Author(s):  
A. Mele ◽  
A. Giardini ◽  
R. Teghil
Author(s):  
M. Grant Norton ◽  
C. Barry Carter

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.


1999 ◽  
Vol 606 ◽  
Author(s):  
Keishi Nishio ◽  
Jirawat Thongrueng ◽  
Yuichi Watanabe ◽  
Toshio Tsuchiya

AbstructWe succeeded in the preparation of strontium-barium niobate (Sr0.3Ba0.7Nb2O6 : SBN30)that have a tetragonal tungsten bronze type structure thin films on SrTiO3 (100), STO, or La doped SrTiO3 (100), LSTO, single crystal substrates by a spin coating process. LSTO substrate can be used for electrode. A homogeneous coating solution was prepared with Sr and Ba acetates and Nb(OEt)5 as raw materials, and acetic acid and diethylene glycol monomethyl ether as solvents. The coating thin films were sintered at temperature from 700 to 1000°C for 10 min in air. It was confirmed that the thin films on STO substrate sintered above 700°C were in the epitaxial growth because the 16 diffraction spots were observed on the pole figure using (121) reflection. The <130> and <310> direction of the thin film on STO were oriented with the c-axis in parallel to the substrate surface. However, the diffraction spots of thin film on LSTO substrate sintered at 700°C were corresponds to the expected pattern for (110).


2001 ◽  
Vol 90 (1) ◽  
pp. 162-166 ◽  
Author(s):  
Xiaodong Fang ◽  
Takeshi Kobayashi

2005 ◽  
Vol 44 (10) ◽  
pp. 7605-7607 ◽  
Author(s):  
Kiyohiko Kato ◽  
Yoshio Abe ◽  
Katsutaka Sasaki

1998 ◽  
Vol 66 (2) ◽  
pp. 183-187 ◽  
Author(s):  
M. Diegel ◽  
F. Falk ◽  
R. Hergt ◽  
H. Hobert ◽  
H. Stafast

2012 ◽  
Vol 14 (8) ◽  
Author(s):  
Sabri Alkis ◽  
Mustafa Alevli ◽  
Salamat Burzhuev ◽  
Hüseyin Avni Vural ◽  
Ali Kemal Okyay ◽  
...  

1999 ◽  
Vol 06 (06) ◽  
pp. 1085-1089 ◽  
Author(s):  
S. OMORI ◽  
T. KOZAKAI ◽  
Y. NIHEI

We have investigated the photoelectron diffraction (PED) from a SrF 2 epitaxial thin film on Ge(111) from the viewpoint of holographic inversion for imaging the atomic structure. The holographic interference fringes were retrieved from the PED pattern including a wide variety of diffraction features via averaging the pattern around each forward-scattering peak. Furthermore, another method for enhancing holographic fringes by subtracting one photoelectron hologram from another at slightly different kinetic energies was theoretically investigated.


Author(s):  
Xiao Tang ◽  
Kuanghui Li ◽  
Che-Hao Liao ◽  
Dongxing Zheng ◽  
chen Liu ◽  
...  

β-Ga2O3 is a wide bandgap semiconductor material promising for many fields such as gas sensors, UV detectors, and high power electronics. Until now, most epitaxial β-Ga2O3 thin films could only...


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