Bench-grafted Fuji/M26 apple trees were fertigated with different concentrations of nitrogen by using a modified Hoagland solution for 6 weeks, resulting in a range of leaf N from 1.0 to 4.3 g·m–2. Over this range, leaf absorptance increased curvilinearly from 75% to 92.5%. Under high light conditions (1500 (mol·m–2·s–1), the amount of absorbed light in excess of that required to saturate CO2 assimilation decreased with increasing leaf N. Chlorophyll fluorescence measurements revealed that the maximum photosystem II (PSII) efficiency of dark-adapted leaves was relatively constant over the leaf N range except for a slight drop at the lower end. As leaf N increased, non-photochemical quenching under high light declined and there was a corresponding increase in the efficiency with which the absorbed photons were delivered to open PSII centers. Photochemical quenching coefficient decreased significantly at the lower end of the leaf N range. Actual PSII efficiency increased curvilinearly with increasing leaf N, and was highly correlated with light-saturated CO2 assimilation. The fraction of absorbed light potentially used for free radical formation was estimated to be about 10% regardless of the leaf N status. It was concluded that increased thermal dissipation protected leaves from photo-oxidation as leaf N declined.
