Effect of Surface Imperfections in Channel Region of an n-MOSFET on Its Vital Characteristics: A Simulation Study

2021 ◽  
pp. 747-753
Author(s):  
Shailendra Baraniya ◽  
S. Zahid Nabi Dar
Keyword(s):  
Simulation Study ◽  
Surface Imperfections ◽  
Channel Region ◽  
Effect Of Surface

EFFECT OF CHLORINATION ON PHOTOLUMINESCENCE PROPERTIES OF POROUS SILICON

2007 ◽  
Vol 06 (01) ◽  
pp. 17-22
Author(s):  
B. NATARAJAN ◽  
V. RAMAKRISHNAN ◽  
V. VASU ◽  
S. RAMAMURTHY
Keyword(s):  
Porous Silicon ◽  
Analytical Solution ◽  
Significant Role ◽  
Simulation Study ◽  
Surface Passivation ◽  
Photoluminescence Properties ◽  
Emission Efficiency ◽  
Capacitance Method ◽  
P Type ◽  
Effect Of Surface

The surface passivation of porous silicon plays a significant role in emission efficiency of the material. Photoluminescence (PL) studies were carried out for p-type porous silicon and chlorinated porous silicon to understand the effect of surface passivation on porous silicon. Visible photoluminescence was observed at 625 nm for both porous silicon and chlorinated porous silicon. The whole sample exhibits a PL band at red region and intensity decreased in chlorinated porous silicon. This paper presents an analytical solution that covers contributions from the components of silicon tetra chloride interface, silicon backbone, and voids using a serial–parallel capacitance method. Simulation study indicates that there is a good correlation between theory and observed PL.

Effect of surface imperfections on the ductility of pure chromium

1995 ◽  
Vol 30 (4) ◽  
pp. 1105-1110 ◽  
Author(s):  
M. Morinaga ◽  
T. Nambu ◽  
J. Fukumori ◽  
M. Kato ◽  
T. Sakaki ◽  
...  
Keyword(s):  
Surface Imperfections ◽  
Pure Chromium ◽  
Effect Of Surface

Nucleation and Growth Mechanisms in Hetero-Epitaxial Films

1990 ◽  
Vol 198 ◽  
Author(s):  
J.A. Venables ◽  
J.S. Drucker ◽  
M. Krishnamurthy ◽  
G. Raynerd ◽  
T. Doust
Keyword(s):  
Nucleation And Growth ◽  
Epitaxial Films ◽  
Rate Equations ◽  
Number Density ◽  
Growth Mechanisms ◽  
Surface Imperfections ◽  
Surface Steps ◽  
Nucleation And Growth Mechanisms ◽  
Microscopic Techniques ◽  
Effect Of Surface

ABSTRACTNucleation and growth mechanisms in the formation of heteroepitaxial films are reviewed. The various processes can be incorporated into rate equations to model the number density and size distribution of clusters.Recent work on extensions of this approach to include the effect of surface steps and other surface imperfections is highlighted.The most important processes are being studied experimentally using a combination of surface-analytic and -microscopic techniques, based on SEM and STEM instrumentation. Recent examples are given in which nucleation densities, surface diffusion lengths and the effects of steps have been studied in the systems Ag/Si(lll) and Ge/Si(100).

Effect of surface coverage and chemistry on self-assembly of monolayer protected gold nanoparticles: a molecular dynamics simulation study

2018 ◽  
Vol 20 (40) ◽  
pp. 25883-25891 ◽  
Author(s):  
Dwadasi Balarama Sridhar ◽  
Rakesh Gupta ◽  
Beena Rai
Keyword(s):  
Molecular Dynamics ◽  
Gold Nanoparticles ◽  
Molecular Dynamics Simulation ◽  
Simulation Study ◽  
Self Assembly ◽  
Surface Coverage ◽  
Dynamics Simulation ◽  
Effect Of Surface

The PMF between two nanoparticles (of any chemistry and coverage) can be used as a measure to predict their stability.

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