Preparation of (Pb0.88La0.12)TiO3 thin films for dynamic random access memory by low pressure-metalorganic chemical vapor deposition

Vapor Deposition ◽

Random Access ◽

Chemical Vapor ◽

Random Access Memory ◽

Access Memory ◽

Electrical Properties for Capacitors of Dynamic Random Access Memory on(Pb,La)(Zr,Ti)O3Thin Films by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.5139 ◽

1994 ◽

Vol 33 (Part 1, No. 9B) ◽

pp. 5139-5142 ◽

Cited By ~ 17

Author(s):

Hiroshi Nakasima ◽

Sigeki Hazumi ◽

Tadashi Kamiya ◽

Kouji Tominaga ◽

Masaru Okada

Keyword(s):

Electrical Properties ◽

Vapor Deposition ◽

Random Access ◽

Chemical Vapor ◽

Random Access Memory ◽

Access Memory ◽

Integration of Ferroelectric Random Access Memory Devices with Ir/IrO2/Pb(ZrxTi1-x)\barO3/Ir Capacitors Formed by Metalorganic Chemical Vapor Deposition-Grown Pb(ZrxTi1-x)O3

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.6709 ◽

2002 ◽

Vol 41 (Part 1, No. 11B) ◽

pp. 6709-6713 ◽

Cited By ~ 8

Author(s):

Moon-Sook Lee ◽

Kun-Sang Park ◽

Sang-Don Nam ◽

Kyu-Mann Lee ◽

Jung-Suk Seo ◽

...

Keyword(s):

Vapor Deposition ◽

Random Access ◽

Chemical Vapor ◽

Random Access Memory ◽

Memory Devices ◽

Access Memory ◽

Ferroelectric Random Access Memory ◽

Hot wire chemical vapor deposition of germanium selenide thin films for nonvolatile random access memory applications

Applied Physics Letters ◽

10.1063/1.3579192 ◽

2011 ◽

Vol 98 (15) ◽

pp. 151901 ◽

Cited By ~ 4

Author(s):

D. Reso ◽

M. Silinskas ◽

M. Lisker ◽

A. Schubert ◽

E. P. Burte

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Random Access ◽

Chemical Vapor ◽

Random Access Memory ◽

Hot Wire ◽

Access Memory ◽

Germanium Selenide ◽

Memory Applications

Mechanism of hemispherical-grained Si formation for dynamic random access memory cells by rapid thermal chemical vapor deposition

Journal of Electronic Materials ◽

10.1007/s11664-001-0170-4 ◽

2001 ◽

Vol 30 (12) ◽

pp. 1532-1536 ◽

Cited By ~ 1

Author(s):

S. Berger ◽

A. Captain ◽

H. Spiellberg ◽

E. Iskevitch ◽

S. Levi

Keyword(s):

Vapor Deposition ◽

Random Access ◽

Chemical Vapor ◽

Random Access Memory ◽

Memory Cells ◽

Access Memory ◽

Thermal Chemical Vapor Deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Chemical vapor deposition–physical vapor deposition aluminum plug process for dynamic random-access memory applications

10.1116/1.1775005 ◽

2004 ◽

Vol 22 (4) ◽

pp. 1931

Author(s):

Won-Jun Lee ◽

Sa-Kyun Rha

Keyword(s):

Vapor Deposition ◽

Physical Vapor Deposition ◽

Random Access ◽

Chemical Vapor ◽

Random Access Memory ◽

Access Memory ◽

Memory Applications

Low Temperature Chemical Vapor Deposition of (Ba, Sr)TiO3 Thin Films for High Density Dynamic Random Access Memory Capacitors

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.l195 ◽

1999 ◽

Vol 38 (Part 2, No. 2B) ◽

pp. L195-L198 ◽

Cited By ~ 4

Author(s):

Jae-Hyun Joo ◽

Jong-Bum Park ◽

Younsoo Kim ◽

Kong-Soo Lee ◽

Jun-Sik Lee ◽

...

Keyword(s):

Thin Films ◽

Low Temperature ◽

Vapor Deposition ◽

Random Access ◽

Chemical Vapor ◽

Random Access Memory ◽

High Density ◽

Access Memory ◽

Density Dynamic

Effect of Substrates and Thermal Treatments on Metalorganic Chemical Vapor Deposition-Grown Sb2Te3 Thin Films

Crystal Growth & Design ◽

10.1021/acs.cgd.1c00508 ◽

2021 ◽

Author(s):

Martino Rimoldi ◽

Raimondo Cecchini ◽

Claudia Wiemer ◽

Emanuele Longo ◽

Stefano Cecchi ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thermal Treatments ◽

Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Cited By ~ 34

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Thin Films ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

Superconductivity and Applications ◽

10.1007/978-1-4684-7565-4_11 ◽

1990 ◽

pp. 127-138

Author(s):

P. Zawadzki ◽

G. S. Tompa ◽

P. Norris ◽

D. W. Noh ◽

B. Gallois ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Epitaxial thin films of YBa2Cu3O7−xon LaAlO3substrates deposited by plasma‐enhanced metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.104973 ◽

1991 ◽

Vol 58 (2) ◽

pp. 185-187 ◽

Cited By ~ 36

Author(s):

C. S. Chern ◽

J. Zhao ◽

Y. Q. Li ◽

P. Norris ◽

B. Kear ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Epitaxial Thin Films ◽