Large area deposition of Pb(Zr,Ti)O3 thin films for piezoelectric MEMS devices

Doped lead–zirconate–titanate (PZT) thin films are preferred for the development of micro–electro–mechanical systems (MEMS)-based acoustic sensors because of their inherent higher dielectric and piezoelectric coefficients. Patterning process is used to develop such MEMS devices which is highly complex even for undoped PZT thin films; therefore, the problem is further cumbersome for doped PZT thin films due to the presence of added dopant elements and their associated chemistry. This paper presents patterning of strontium (Sr) and lanthanum (La) co-doped PZT thin film (PSLZT) deposited on platinized silicon substrate using wet and dry etching processes for fabricating a diaphragm structure with thickness of 15–25[Formula: see text][Formula: see text]m and diameter of 1.4–2[Formula: see text]mm, suitable for acoustic sensing applications. The effects of various etching conditions have been studied and the results are reported. It is found that the dry etching is the most suited process for realizing the piezoelectric MEMS structure due to its higher etching resolution. An appreciable etching rate of 260–270[Formula: see text]nm/min with smooth vertical sidewalls is achieved. The silicon diaphragm with patterned PSLZT thin film is found to retain more than 80% of its dielectric and piezoelectric coefficients and has a resonance of 1.43[Formula: see text]MHz.

Download Full-text

Electrochromic Performance of V2O5 Thin Films Grown by Spray Pyrolysis

Materials ◽

10.3390/ma13173859 ◽

2020 ◽

Vol 13 (17) ◽

pp. 3859 ◽

Cited By ~ 3

Author(s):

Kyriakos Mouratis ◽

Valentin Tudose ◽

Cosmin Romanitan ◽

Cristina Pachiu ◽

Oana Tutunaru ◽

...

Keyword(s):

Thin Films ◽

Spray Deposition ◽

Cost Effective ◽

Active Surface ◽

X Ray Diffraction ◽

Large Area ◽

New Approach ◽

X Ray ◽

Area Deposition ◽

Scanning Electron

A new approach regarding the development of nanostructured V2O5 electrochromic thin films at low temperature (250 °C), using air-carrier spray deposition and ammonium metavanadate in water as precursor is presented. The obtained V2O5 films were characterized by X-ray diffraction, scanning electron microscopy and Raman spectroscopy, while their electrochromic response was studied using UV-vis absorption spectroscopy and cyclic voltammetry. The study showed that this simple, cost effective, suitable for large area deposition method can lead to V2O5 films with large active surface for electrochromic applications.

Download Full-text

Annealing Effect on the Properties of Electrochromic V2O5 Thin Films Grown by Spray Deposition Technique

Nanomaterials ◽

10.3390/nano10122397 ◽

2020 ◽

Vol 10 (12) ◽

pp. 2397

Author(s):

Kyriakos Mouratis ◽

Ioan Valentin Tudose ◽

Andrianna Bouranta ◽

Cristina Pachiu ◽

Cosmin Romanitan ◽

...

Keyword(s):

Thin Films ◽

Spray Deposition ◽

Spray Pyrolysis Technique ◽

Cost Effective ◽

Active Surface ◽

X Ray Diffraction ◽

Large Area ◽

Growth Optimization ◽

V2o5 Thin Films ◽

Area Deposition

Nanostructured electrochromic V2O5 thin films were prepared using spray pyrolysis technique growth at a temperature of 250 °C using air-carrier spray deposition, starting from ammonium metavanadate precursor in water, followed by annealing at 400 °C in O2 atmosphere for 2 h. The V2O5 films were characterized by X-ray diffraction, scanning electron microscopy, and Raman spectroscopy, and their electrochromic behavior was studied using optical spectroscopy and cyclic voltammetry in both the as-deposited and postannealing case. The studies showed that the simple, cost -effective, suitable for large area deposition method used can lead to an interesting surface structuring with large active surface properties suitable for electrochromic applications. Further studies for growth optimization and improvements of films properties and stability are to be performed.

Download Full-text

Optimization of co-sputtered CrxAl1−xN thin films for piezoelectric MEMS devices

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-020-03260-7 ◽

2020 ◽

Vol 31 (11) ◽

pp. 8136-8143

Author(s):

Saeedeh Soleimani ◽

Benjamin Kalas ◽

Zsolt.E. Horváth ◽

Zsolt Zolnai ◽

Zsolt Czigány ◽

...

Keyword(s):

Thin Films ◽

Mems Devices ◽

Piezoelectric Mems

Download Full-text

20302 An approach to large area deposition of copper thin films using supercritical carbon dioxide

The Proceedings of Conference of Kanto Branch ◽

10.1299/jsmekanto.2010.16.101 ◽

2010 ◽

Vol 2010.16 (0) ◽

pp. 101-102

Author(s):

Naoki Fukasawa ◽

Yuuto Takeuchi ◽

Yuuki Shimura ◽

Masahiro Matsubara ◽

Eiichi Kondoh

Keyword(s):

Thin Films ◽

Carbon Dioxide ◽

Supercritical Carbon Dioxide ◽

Large Area ◽

Area Deposition ◽

Supercritical Carbon

Download Full-text

Microcrystalline Silicon Thin Films and Triple-Junction Solar Cells

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.468-471.1912 ◽

2012 ◽

Vol 468-471 ◽

pp. 1912-1915

Author(s):

Hui Zhi Ren ◽

Ying Zhao ◽

Xiao Dan Zhang ◽

Hong Ge ◽

Zong Pan Wang

Keyword(s):

Thin Films ◽

Solar Cells ◽

Triple Junction ◽

Microcrystalline Silicon ◽

Large Area ◽

High Quality ◽

Area Efficiency ◽

Silicon Thin Films ◽

Deposition Parameters ◽

Area Deposition

We report on microcrystalline silicon thin films and a-Si:H/a-SiGe:H/μc-Si:H triple-junction p-i-n solar cells deposited on large-area glass substrate. Microcrystalline silicon (μc-Si:H) bottom cells were deposited at a VHF-PECVD deposition system with 40.68MHz. It is necessary to develop the uniformity of μc-Si:H thin films for large-area deposition of high-quality triple-junction solar cells. By optimizing the deposition parameters, μc-Si:H thin films have been obtained with good thickness and very good crystalline volume fractions uniformity over the whole substrates area. The triple-junction module have been successful fabricated. The best module on 0.79 m2 size substrates has an initial total-area efficiency of 8.35%.

Download Full-text

Large area deposition of Al2O3 thin films with molecular beams in high vacuum

Thin Solid Films ◽

10.1016/j.tsf.2006.11.163 ◽

2007 ◽

Vol 515 (19) ◽

pp. 7542-7545 ◽

Cited By ~ 5

Author(s):

X. Multone ◽

C.N. Borca ◽

P. Hoffmann

Keyword(s):

Thin Films ◽

High Vacuum ◽

Molecular Beams ◽

Large Area ◽

Area Deposition

Download Full-text

Sputtered A1N Thin Films for Piezoelectric MEMS Devices

2006 5th IEEE Conference on Sensors ◽

10.1109/icsens.2007.355705 ◽

2006 ◽

Cited By ~ 2

Author(s):

Li-Peng Wang ◽

E. Ginsburg ◽

F. Gerfers ◽

D. Samara-Rubio ◽

B. Weinfeld ◽

...

Keyword(s):

Thin Films ◽

Mems Devices ◽

Piezoelectric Mems

Download Full-text

Synthesis, Microstructure and Properties of Magnetron Sputtered Lead Zirconate Titanate (PZT) Thin Film Coatings

Coatings ◽

10.3390/coatings11080944 ◽

2021 ◽

Vol 11 (8) ◽

pp. 944

Author(s):

Youcao Ma ◽

Jian Song ◽

Xubo Wang ◽

Yue Liu ◽

Jia Zhou

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Lead Zirconate Titanate ◽

Lead Zirconate ◽

Influential Factors ◽

Mems Devices ◽

Large Area ◽

Pzt Thin Films ◽

Synthesis Parameters ◽

Zirconate Titanate

Compared to aluminum nitride (AlN) with simple stoichiometry, lead zirconate titanate thin films (PZT) are the other promising candidate in advanced micro-electro-mechanical system (MEMS) devices due to their excellent piezoelectric and dielectric properties. The fabrication of PZT thin films with a large area is challenging but in urgent demand. Therefore, it is necessary to establish the relationships between synthesis parameters and specific properties. Compared to sol-gel and pulsed laser deposition techniques, this review highlights a magnetron sputtering technique owing to its high feasibility and controllability. In this review, we survey the microstructural characteristics of PZT thin films, as well as synthesis parameters (such as substrate, deposition temperature, gas atmosphere, and annealing temperature, etc.) and functional proper-ties (such as dielectric, piezoelectric, and ferroelectric, etc). The dependence of these influential factors is particularly emphasized in this review, which could provide experimental guidance for researchers to acquire PZT thin films with expected properties by a magnetron sputtering technique.

Download Full-text