Numerical simulation of the liquid phase in SnO2 thin film deposition by sol-gel-dip-coating

2010 ◽  
Vol 55 (3) ◽  
pp. 385-393 ◽  
Author(s):  
Dayene M. Carvalho ◽  
Jorge L. B. Maciel ◽  
Leandro P. Ravaro ◽  
Rogério E. Garcia ◽  
Valdemir G. Ferreira ◽  
...  
Cerâmica ◽  
2007 ◽  
Vol 53 (326) ◽  
pp. 187-191 ◽  
Author(s):  
L. P. Ravaro ◽  
E. A. Morais ◽  
L. V. A. Scalvi ◽  
M. Siu Li

Emission from Er-doped SnO2 thin film deposited via sol-gel by the dip coating technique is obtained in the range 500-700 nm with peak at 530 nm (green). Electron-hole generation in the tin dioxide matrix is used to promote the rare-earth ion excitation. Evaluation of crystallite dimensions through X-ray diffraction results leads to nanoscopic size, what could play a relevant role in the emission spectra. The electron-hole mechanism is also responsible for the excitation of the transition in the 1540 nm range in powders obtained from the same precursor solution of films. The thin film matrix presents a very useful shape for technological application, since it allows integration in optical devices and the application of electric fields to operate electroluminescent devices.


2001 ◽  
Vol 77 (1-2) ◽  
pp. 244-252 ◽  
Author(s):  
G Korotcenkov ◽  
V Brinzari ◽  
J Schwank ◽  
M DiBattista ◽  
A Vasiliev

2001 ◽  
Vol 16 (4) ◽  
pp. 463-473 ◽  
Author(s):  
M. Langlet ◽  
C. Coutier ◽  
J. Fick ◽  
M. Audier ◽  
W. Meffre ◽  
...  

2021 ◽  
Author(s):  
Kashif Tufail Chaudhary

The wet chemical processing opens the way to deposit thin film with the versatility and ease for a variety of materials. Liquid film deposition involves the application of a liquid precursor on a substrate which is then converted to the required coating material in a subsequent post-treatment step. Different non-vacuum solution based deposition techniques have been developed to grow thin films with high efficiency and functionality. Spin coating is one of an effective technique for thin film fabrication due to low cost, uniformity, less hazardous, and capability of easy scaling up. The typical process involves depositing a small amount of a fluid onto the center of a substrate and then spinning the substrate at high speed. Dip coating is another simple, cost effective route with feasibility to scale-up for commercial production. The dip coating process can be divided into three important technical stages, immersion, withdrawal and evaporation. The coating may be subjected to further heat treatment in order to burn out residual compounds and induce crystallization of the functional oxides. Spray coating is a promising technique to grow thin film in research and industry to prepare thin and thick films. It is an easy approach to fabricate thin film with uniform distribution at small scale from a few nanometers to micrometers in thickness. Inkjet printing is the emerging promising technique to develop large-scale, and flexible thin films. The inkjet printing process allow easy customization to grow variety of complex structures.


2016 ◽  
Vol 773 ◽  
pp. 012112 ◽  
Author(s):  
A Li ◽  
J Wang ◽  
W Zhang ◽  
R McNaughton ◽  
S Anderson ◽  
...  

2008 ◽  
Vol 1113 ◽  
Author(s):  
Takeyasu Saito ◽  
Yuichiro Hirota ◽  
Mariko Ooyanagi ◽  
Naoki Okamoto ◽  
Kazuo Kondo ◽  
...  

ABSTRACTCaBi4Ti4O15 growth on different Platinum substrates was carried out through a sol-gel method. Higher crystallization temperature and 20% excess Bi decreased pyrochlore contents in the CaBi4Ti4O15 films. Repetition through coating, calcination and crystallization decreased void formation on the surface. C-axis oriented thin film could be grown on sputtered platinum substrates with low Pt (200) orientation. On electroplated Pt substrates, (119) oriented CaBi4Ti4O15 thin film was grown, suggesting surface roughness of Pt substrates is a crucial factor for orientation control of sol-gel derived CaBi4Ti4O15 thin film.


1994 ◽  
Vol 2 (1-3) ◽  
pp. 477-481 ◽  
Author(s):  
F. Nishida ◽  
B. Dunn ◽  
J. M. Mckiernan ◽  
J. I. Zink ◽  
C. J. Brinker ◽  
...  

2017 ◽  
Vol 8 ◽  
pp. 1049-1055 ◽  
Author(s):  
Sun-Kyu Lee ◽  
Sori Hwang ◽  
Yoon-Kee Kim ◽  
Yong-Jun Oh

We propose a nanofabrication process to generate large-area arrays of noble metal nanoparticles on glass substrates via nanoimprinting and dewetting of metallic thin films. Glass templates were made via pattern transfer from a topographic Si mold to an inorganically cross-linked sol–gel (IGSG) resist on glass using a two-layer polydimethylsiloxane (PDMS) stamp followed by annealing, which turned the imprinted resist into pure silica. The transparent, topographic glass successfully templated the assembly of Au and Ag nanoparticle arrays via thin-film deposition and dewetting at elevated temperatures. The microstructural and mechanical characteristics that developed during the processes were discussed. The results are promising for low-cost mass fabrication of devices for several photonic applications.


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