Fast focus and astigmatism correction algorithm for critical dimension measurement using electron microscopy

2015 ◽  
Vol 16 (9) ◽  
pp. 1941-1947 ◽  
Author(s):  
Jae Hyung Ahn ◽  
Tai-Wook Kim ◽  
Heui Jae Pahk
Keyword(s):  
Electron Microscopy ◽  
Critical Dimension ◽  
Correction Algorithm ◽  
Astigmatism Correction ◽  
Dimension Measurement

Gum arabic helps prepare better lacey polymer films for specimen support in electron microscopy

1993 ◽  
Vol 51 ◽  
pp. 240-241
Author(s):  
Shailesh R. Sheth ◽  
Jayesh R. Bellare
Keyword(s):  
Electron Microscopy ◽  
Polymer Films ◽  
Gum Arabic ◽  
Complete Removal ◽  
Ammonium Bromide ◽  
Release Agent ◽  
Astigmatism Correction ◽  
Long Time ◽  
Micro Holes ◽  
Cetyl Trimethyl Ammonium

Specimen support and astigmatism correction in Electron Microscopy are at least two areas in which lacey polymer films find extensive applications. Although their preparation has been studied for a very long time, present techniques still suffer from incomplete release of the film from its substrate and presence of a large number of pseudo holes in the film. Our method ensures complete removal of the entire lacey film from the substrate and fewer pseudo holes by pre-treating the substrate with Gum Arabic, which acts as a film release agent.The method is based on the classical condensation technique for preparing lacey films which is essentially deposition of minute water or ice droplets on the substrate and laying the polymer film over it, so that micro holes are formed corresponding to the droplets. A microscope glass slide (the substrate) is immersed in 2.0% (w/v) aq. CTAB (cetyl trimethyl ammonium bromide)-0.22% (w/v) aq.

scholarly journals Critical dimension measurement of transparent film layers by multispectral imaging

2014 ◽  
Vol 22 (14) ◽  
pp. 17370 ◽  
Author(s):  
Soonyang Kwon ◽  
Namyoon Kim ◽  
Taeyong Jo ◽  
Heui Jae Pahk
Keyword(s):  
Multispectral Imaging ◽  
Critical Dimension ◽  
Transparent Film ◽  
Dimension Measurement

Critical-Dimension Measurement using Multi-Angle-Scanning Method in Atomic Force Microscope

2006 ◽  
Vol 45 (7) ◽  
pp. 5928-5932 ◽  
Author(s):  
Ken Murayama ◽  
Satoshi Gonda ◽  
Hajime Koyanagi ◽  
Tsuneo Terasawa ◽  
Sumio Hosaka
Keyword(s):  
Atomic Force Microscope ◽  
Critical Dimension ◽  
Scanning Method ◽  
Atomic Force ◽  
Dimension Measurement

scholarly journals Scanning Transmission Electron Microscopy for Critical Dimension Monitoring in Wafer Manufacturing

2008 ◽  
Vol 16 (1) ◽  
pp. 24-27 ◽  
Author(s):  
Haifeng Wang ◽  
Jason Fang ◽  
Jason Arjavac ◽  
Rudy Kellner
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Data Storage ◽  
Scanning Transmission Electron Microscopy ◽  
Ion Beam ◽  
Critical Dimension ◽  
Ex Situ ◽  
Scanning Transmission Electron ◽  
Transmission Electron ◽  
Scanning Transmission

Automated scanning transmission electron microscopy (STEM) metrology provides critical dimension (CD) measurements an order of magnitude more precise than comparable scanning electron microscopy (SEM) measurements. New developments in automation now also provide throughput and response time sufficient to support high volume microelectronic manufacturing processes. The newly developed methodology includes automated, focused ion beam (FIB) based sample preparation; innovative, ex-situ sample extraction; and automated metrology. Although originally developed to control the production of thin film magnetic heads for data storage, the technique is fully applicable to any wafer-based manufacturing process.

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