Chemical characterization of atmospheric aerosol samples using ion beam techniques

1988 ◽  
Vol 19 (7) ◽  
pp. 1215-1218 ◽  
Author(s):  
Bengt G. Martinsson ◽  
Hans-Christen Hansson
Keyword(s):  
Atmospheric Aerosol ◽  
Ion Beam ◽  
Chemical Characterization

scholarly journals Electrical and Chemical Characterization of FIB-Deposited Insulators

1997 ◽  
Author(s):  
A. N. Campbell ◽  
D. M. Tanner ◽  
J. M. Soden ◽  
D. K. Stewart ◽  
A. Doyle ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Rutherford Backscattering Spectrometry ◽  
Ion Beam ◽  
Chemical Properties ◽  
Chemical Characterization ◽  
Breakdown Field ◽  
Gate Oxides ◽  
Spectrometry Analysis ◽  
Metal Insulator Metal

Abstract The electrical and chemical properties of insulators produced by codeposition of siloxane compounds or TEOS with oxygen in a focused ion beam (FIB) system were investigated. Metal-insulator-metal capacitor structures were fabricated and tested. Specifically, leakage current and breakdown voltage were measured and used to calculate the effective resistance and breakdown field. Capacitance measurements were performed on a subset of the structures. It was found that the siloxanebased FIB-insulators had superior electrical properties to those based on TEOS. Microbeam Rutherford backscattering spectrometry analysis and Fourier transform infrared spectroscopy were used to characterize the films and to help understand the differences in electrical behavior as a function of gas chemistry and deposition conditions. Finally, a comparison is made between the results presented here, previous results for FIB-deposited insulators, and typical thermally-grown gate oxides and interlevel dielectric Si02 insulators.

Size and chemical characterization of atmospheric aerosol and savanna fire samples in Southern Africa

2000 ◽  
Vol 31 ◽  
pp. 186-187 ◽  
Author(s):  
X.D. Liu ◽  
S.P. Dong ◽  
P. Van Espen ◽  
F. Adams ◽  
J. Cafmeyer ◽  
...  
Keyword(s):  
Southern Africa ◽  
Atmospheric Aerosol ◽  
Chemical Characterization

scholarly journals Microstructural and Chemical Characterization of Nanostructured TiAlSiN Coatings with Nanoscale Resolution

2012 ◽  
Vol 18 (3) ◽  
pp. 568-581 ◽  
Author(s):  
Vanda Godinho ◽  
Teresa C. Rojas ◽  
Susana Trasobares ◽  
Francisco J. Ferrer ◽  
Marie-Paule Delplancke-Ogletree ◽  
...  
Keyword(s):  
Ion Beam ◽  
Chemical Characterization ◽  
Growth Mode ◽  
Face Centered Cubic ◽  
Full Characterization ◽  
Substrate Heating ◽  
Electron Microscopy Analysis ◽  
Face Centered ◽  
Degradation Of Properties

AbstractNanoscale resolution electron microscopy analysis combined with ion beam assisted techniques are presented here, to give answers to full characterization of morphology, growth mode, phase formation, and compositional distribution in nanocomposite TiAlSiN coatings deposited under different energetic conditions. Samples were prepared by magnetron sputtering, and the effects of substrate temperature and bias were investigated. The nanocomposite microstructure was demonstrated by the formation of a face-centered cubic (Ti,Al)N phase, obtained by substitution of Al in the cubic titanium nitride (c-TiN) phase, and an amorphous matrix at the column boundary regions mainly composed of Si, N (and O for the samples with higher oxygen contents). Oxygen impurities, predicted as the principal responsible for the degradation of properties, were identified, particularly in nonbiased samples and confirmed to occupy preferentially nitrogen positions at the column boundaries, being mainly associated to silicon forming oxynitride phases. It has been found that the columnar growth mode is not the most adequate to improve mechanical properties. Only the combination of moderate bias and additional substrate heating was able to reduce the oxygen content and eliminate the columnar microstructure leading to the nanocomposite structure with higher hardness (>30 GPa).

Tribological and chemical characterization of ion beam-deposited CNx films

Vacuum ◽  
1999 ◽  
Vol 52 (1-2) ◽  
pp. 199-202 ◽  
Author(s):  
C Quirós ◽  
R Núñez ◽  
P Prieto ◽  
E Elizalde ◽  
A Fernández ◽  
...  
Keyword(s):  
Ion Beam ◽  
Chemical Characterization ◽  
Cnx Films

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

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