X-ray diffraction study of phase composition and amorphization in magnetron-sputter-deposited thin films of stainless steel-titanium

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.

Download Full-text

Grazing-incidence x-ray diffraction study of pentacene thin films with the bulk phase structure

Applied Physics Letters ◽

10.1063/1.2349307 ◽

2006 ◽

Vol 89 (10) ◽

pp. 101919 ◽

Cited By ~ 46

Author(s):

Hiroyuki Yoshida ◽

Naoki Sato

Keyword(s):

Thin Films ◽

Diffraction Study ◽

Phase Structure ◽

Grazing Incidence ◽

Bulk Phase ◽

X Ray Diffraction ◽

X Ray

Download Full-text

Comprehensive X-Ray Diffraction Study of YBa$_{\bf 2}$Cu$_{\bf 3}$O$_{{\bf 7}-\ninmb{\delta}}$ Thin Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.6036 ◽

1995 ◽

Vol 34 (Part 1, No. 11) ◽

pp. 6036-6040

Author(s):

A. Z. Moshfegh ◽

A. H. Fatollahi ◽

Y. Q. Wang ◽

Y. Y. Sun ◽

P. H. Hor ◽

...

Keyword(s):

Thin Films ◽

Diffraction Study ◽

X Ray Diffraction ◽

X Ray

Download Full-text

Synthesis of CaWO4:(Eu3+,Tb3+) Thin Films by a Two-Step Method at Room Temperature

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.710.170 ◽

2013 ◽

Vol 710 ◽

pp. 170-173

Author(s):

Lian Ping Chen ◽

Yuan Hong Gao

Keyword(s):

Thin Film ◽

Thin Films ◽

Phase Composition ◽

Room Temperature ◽

Electrochemical Techniques ◽

Luminescent Properties ◽

X Ray Diffraction ◽

Step Method ◽

X Ray ◽

Rare Earth Doped

It is hardly possible to obtain rare earth doped CaWO4thin films directly through electrochemical techniques. A two-step method has been proposed to synthesize CaWO4:(Eu3+,Tb3+) thin films at room temperature. X-ray diffraction, energy dispersive X-ray analysis, spectrophotometer were used to characterize their phase, composition and luminescent properties. Results reveal that (Eu3+,Tb3+)-doped CaWO4films have a tetragonal phase. When the ratio of n (Eu)/n (Tb) in the solution is up to 3:1, CaWO4:(Eu3+,Tb3+) thin film will be enriched with Tb element; on the contrary, when the ratio in the solution is lower than 1:4, CaWO4:(Eu3+,Tb3+) thin film will be enriched with Eu element. Under the excitation of 242 nm, sharp emission peaks at 612, 543, 489 and 589 nm have been observed for CaWO4:(Eu3+,Tb3+) thin films.

Download Full-text

In situ X-ray diffraction study of the controlled oxidation and reduction in the V–O system for the synthesis of VO2 and V2O3 thin films

Journal of Materials Chemistry C ◽

10.1039/c5tc02553b ◽

2015 ◽

Vol 3 (43) ◽

pp. 11357-11365 ◽

Cited By ~ 34

Author(s):

Geert Rampelberg ◽

Bob De Schutter ◽

Wouter Devulder ◽

Koen Martens ◽

Iuliana Radu ◽

...

Keyword(s):

Thin Films ◽

Diffraction Study ◽

Resistance Switching ◽

X Ray Diffraction ◽

X Ray

VO2 and V2O3 thin films were prepared during in situ XRD investigation by oxidation and reduction of V and V2O5. Films show up to 5 orders of magnitude resistance switching.

Download Full-text

X-ray Diffraction Investigation of Stainless Steel—Nitrogen Thin Films Deposited Using Reactive Sputter Deposition

Coatings ◽

10.3390/coatings10100984 ◽

2020 ◽

Vol 10 (10) ◽

pp. 984

Author(s):

Faisal I. Alresheedi ◽

James E. Krzanowski

Keyword(s):

Thin Films ◽

Stainless Steel ◽

Substrate Temperature ◽

Peak Shift ◽

304 Stainless Steel ◽

Tetragonal Structure ◽

X Ray Diffraction ◽

X Ray ◽

Area Detector ◽

Calculated Parameter

An X-ray diffraction investigation was carried out on nitrogen-containing 304 stainless steel thin films deposited by reactive rf magnetron sputtering over a range of substrate temperature and bias levels. The resulting films contained between ~28 and 32 at.% nitrogen. X-ray analysis was carried out using both the standard Bragg-Brentano method as well as area-detector diffractometry analysis. The extent of the diffraction anomaly ((002) peak shift) was determined using a calculated parameter, denoted RB, which is based on the (111) and (002) peak positions. The normal value for RB for FCC-based structures is 0.75 but increases as the (002) peak is anomalously displaced closer to the (111) peak. In this study, the RB values for the deposited films were found to increase with substrate bias but decrease with substrate temperature (but still always >0.75). Using area detector diffractometry, we were able to measure d111/d002 values for similarly oriented grains within the films, and using these values calculate c/a ratios based on a tetragonal-structure model. These results allowed prediction of the (002)/(200) peak split for tetragonal structures. Despite predicting a reasonably accessible split (~0.6°–2.9°–2θ), no peak splitting observed, negating the tetragonal-structure hypothesis. Based on the effects of film bias/temperature on RB values, a defect-based hypothesis is more viable as an explanation for the diffraction anomaly.

Download Full-text