Oxidative degradation of industrial wastewater using spray deposited TiO2/Au:Fe2O3 bilayered thin films

2014 ◽  
Vol 141 ◽  
pp. 315-324 ◽  
Author(s):  
M.A. Mahadik ◽  
S.S. Shinde ◽  
H.M. Pathan ◽  
K.Y. Rajpure ◽  
C.H. Bhosale
Keyword(s):  
Thin Films ◽  
Industrial Wastewater ◽  
Oxidative Degradation

Spontaneous oxidative degradation of indigo carmine by thin films of birnessite electrodeposited onto SnO2

2011 ◽  
Vol 107 (1-2) ◽  
pp. 42-51 ◽  
Author(s):  
M. Zaied ◽  
E. Chutet ◽  
S. Peulon ◽  
N. Bellakhal ◽  
B. Desmazières ◽  
...  
Keyword(s):  
Thin Films ◽  
Indigo Carmine ◽  
Oxidative Degradation

scholarly journals Synthesis and characterization of magnetic oxide nanoparticles and corresponding thin films for wastewaters treatment

2020 ◽  
Vol 31 (2) ◽  
pp. 122-131
Author(s):  
Lenuța Crintea Căpăţână ◽  
Viorica Muşat ◽  
Silviu Polosan ◽  
Alina Cantaragiu ◽  
Vasile Başliu ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Nanoparticles ◽  
Industrial Wastewater ◽  
Organic Dyes ◽  
Magnetic Circular Dichroism ◽  
Molar Ratio ◽  
Synthesis And Characterization ◽  
Magnetic Oxide ◽  
Vis Spectroscopy

Abstract Industrial wastewater can be properly treated using nanotechnologies and nanomaterials. This paper presents the synthesis and characterization of three series of magnetic nanoparticles (MNPs) and corresponding thin films, used for the degradation of organic compounds and removal of heavy metals from industrial wastewater. The samples were obtained by co-precipitation from a ferric (Fe3+) and ferrous (Fe2+) ions solution in a molar ratio of 2:1, at temperatures between 80-95 °C. The characterization of the samples was performed by scanning electron microscopy (SEM), and X-ray diffraction (XRD) methods. The magnetic nanoparticles were deposited on glass substrates by the centrifugal coating technique and the optical and magneto-optical activity was investigated by UV-Vis spectroscopy and magnetic circular dichroism technique (MCD). The effect of the investigated samples on the decomposition under UV irradiation of organic dyes was monitored by UV-Vis spectroscopy. Our preliminary results have shown that the magnetite and maghemite MNPs can be effective in UV degradation of methylene blue (MB) dye.

Oxidative Degradation/Mineralization of Dimethyl Phthalate (DMP) from Plastic Industrial Wastewater Using Ferrate (VI)/TiO2 under Ultraviolet Irradiation

2021 ◽  
Author(s):  
Ping Wang ◽  
Yi Ding ◽  
Liting Zhu ◽  
Yunhao Zhang ◽  
Sijie Zhou ◽  
...  
Keyword(s):  
Ultraviolet Irradiation ◽  
Industrial Wastewater ◽  
Photocatalytic Oxidation ◽  
Synergistic Effects ◽  
Oxidative Degradation ◽  
Gas Chromatography Mass Spectrometry ◽  
Dimethyl Phthalate ◽  
X Ray Diffraction ◽  
Ecotoxicity Test ◽  
Practical Field

Abstract A novel ferrate (VI)/titanium dioxide/ultraviolet [Fe(VI)/TiO2/UV] system was successfully established for the photocatalytic oxidation of dimethyl phthalate (DMP). This system demonstrated a higher removel efficiency of DMP (95.2%) than the conventional TiO2/UV and Fe(VI) alone systems (51.8% and 23.5%, respectively), and produced obvious synergistic effects. Response surface methodology (RSM), based on a three level, three independent variables design, was conducted through Design Expert 8.0.6 program, and a second-order polynomial model (R2 = 0.998) was developed to quantitatively describe the photocatalysis of TiO2 combined with Fe(VI) oxidation under ultraviolet irradiation. The fresh TiO2 and photochemical reacted Fe(VI)/TiO2 were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), and element dispersive spectrum (EDS), which indicated that Fe(VI) was imprinted into the TiO2, and the surface adsorbed Fe-O-(organic) materials inhibited DMP degradation. This photocatalytic oxidant showed high activity and stability after nine cycles without loss of its effectiveness (counting from the second cycle). The intermediates/products of DMP were analyzed by gas chromatography–mass spectrometry. The proposed pathway for DMP degradation involved one electron transfer of hydroxyl radical and breaking of the ester bond and benzene ring. The mineralization efficiencies of DMP in actual industrial wastewater and simulated water were 87.1% and 95.2%, respectively, suggesting practical field applications. A ecotoxicity test (17.3% inhibition on bioluminescence) in treating actual industial wastewater containing DMP implied that the proposed Fe(VI)/TiO2/UV has a potential for industrial water treatment.

Oxidative degradation of benzoic acid using spray deposited WO3/TiO2 thin films

2017 ◽  
Vol 28 (23) ◽  
pp. 17976-17984 ◽  
Author(s):  
Y. M. Hunge ◽  
M. A. Mahadik ◽  
R. N. Bulakhe ◽  
S. P. Yadav ◽  
J. J. Shim ◽  
...  
Keyword(s):  
Thin Films ◽  
Benzoic Acid ◽  
Oxidative Degradation ◽  
Tio2 Thin Films

The study of interfacial reactions of nickel thin films on GaAs

1983 ◽  
Vol 41 ◽  
pp. 156-157
Author(s):  
L.J. Chen ◽  
Y.F. Hsieh
Keyword(s):  
Thin Films ◽  
Integrated Circuits ◽  
Interfacial Reactions ◽  
Metal Contacts ◽  
Nickel Thin Films ◽  
Thin Foils ◽  
The Status ◽  
Si Doped ◽  
Electron Microscopes

One measure of the maturity of a device technology is the ease and reliability of applying contact metallurgy. Compared to metal contact of silicon, the status of GaAs metallization is still at its primitive stage. With the advent of GaAs MESFET and integrated circuits, very stringent requirements were placed on their metal contacts. During the past few years, extensive researches have been conducted in the area of Au-Ge-Ni in order to lower contact resistances and improve uniformity. In this paper, we report the results of TEM study of interfacial reactions between Ni and GaAs as part of the attempt to understand the role of nickel in Au-Ge-Ni contact of GaAs.N-type, Si-doped, (001) oriented GaAs wafers, 15 mil in thickness, were grown by gradient-freeze method. Nickel thin films, 300Å in thickness, were e-gun deposited on GaAs wafers. The samples were then annealed in dry N2 in a 3-zone diffusion furnace at temperatures 200°C - 600°C for 5-180 minutes. Thin foils for TEM examinations were prepared by chemical polishing from the GaA.s side. TEM investigations were performed with JE0L- 100B and JE0L-200CX electron microscopes.

Studies on Water in the Hydration Chamber of a Modified Electron Microscope

1970 ◽  
Vol 28 ◽  
pp. 544-545
Author(s):  
R. C. Moretz ◽  
G. G. Hausner ◽  
D. F. Parsons
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electron Microscope ◽  
Steady State ◽  
Room Temperature ◽  
Small Mass ◽  
Equilibrium Pressure ◽  
Biological Objects ◽  
Mechanical Pump ◽  
Differential Pumping

Use of the electron microscope to examine wet objects is possible due to the small mass thickness of the equilibrium pressure of water vapor at room temperature. Previous attempts to examine hydrated biological objects and water itself used a chamber consisting of two small apertures sealed by two thin films. Extensive work in our laboratory showed that such films have an 80% failure rate when wet. Using the principle of differential pumping of the microscope column, we can use open apertures in place of thin film windows.Fig. 1 shows the modified Siemens la specimen chamber with the connections to the water supply and the auxiliary pumping station. A mechanical pump is connected to the vapor supply via a 100μ aperture to maintain steady-state conditions.

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Sign in / Sign up

Export Citation Format

Share Document