Effects of substrate bias voltage and target sputtering power on the structural and tribological properties of carbon nitride coatings

2014 ◽  
Vol 145 (3) ◽  
pp. 434-440 ◽  
Author(s):  
Pengfei Wang ◽  
Takanori Takeno ◽  
Julien Fontaine ◽  
Masami Aono ◽  
Koshi Adachi ◽  
...  
2019 ◽  
Vol 28 ◽  
pp. 096369351987573 ◽  
Author(s):  
Zhiwei Wu ◽  
Sihao Li ◽  
Zhaojun Xu ◽  
Qianzhi Wang ◽  
Fei Zhou

Boron carbonitride (BCN) coatings were prepared using radio frequency (RF) magnetron sputtering via adjusting substrate bias voltage from −50 V to −200 V. The mechanical and tribological properties of the coatings were investigated. The coexistence of B–N, B–C, and N–C bonds was detected in coatings according to X-ray photoelectron spectroscopy analysis, indicating the formation of ternary BCN hybridization. The hardness of BCN coatings increased from 14.4 GPa to 24.3 GPa with an increase of substrate bias voltage, while their adhesion strength on substrate decreased. The friction behavior of BCN coatings sliding against different wood (acerbic, beech, and lauan) balls was examined using a ball-on-disk tribometer. The average friction coefficient fluctuated in a range of 0.74–1.02. The wear track of BCN coating sliding against hardwood (acerbic) presented obvious scratches, which were not noted as sliding against other softwood balls in comparison.


2016 ◽  
Vol 40 (1-2) ◽  
pp. 9-15 ◽  
Author(s):  
Khalil Aouadi ◽  
Corinne Nouveau ◽  
Aurélien Besnard ◽  
Brahim Tlili ◽  
Moez Chafra

Vacuum ◽  
2015 ◽  
Vol 117 ◽  
pp. 27-34 ◽  
Author(s):  
V.D. Ovcharenko ◽  
A.S. Kuprin ◽  
G.N. Tolmachova ◽  
I.V. Kolodiy ◽  
A. Gilewicz ◽  
...  

2012 ◽  
Vol 622-623 ◽  
pp. 716-719
Author(s):  
H. Panitchakan ◽  
Pichet Limsuwan

Al2O3films were deposited onto Al2O3-TiC substrates by RF diode sputtering. The Al2O3films were deposited at various substrate bias voltages from -80 to -180 V, sputtering powers from 4 to 8 kW and operating pressures from 20 to 30 mTorr. The stress induced in Al2O3 films was measured. The results show that the stress induced in all prepared Al2O3films is tensile stress. The stress slightly increased with increasing substrate bias voltage whereas it increased linearly with increasing operating pressure. However, the stress was almost constant as the sputtering was increased from 5 to 8 kW and significantly decreased as the sputtering power was decreased below 5 kW.


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