Structural and ferroelectric properties of P(VDF-TrFE) thin films depending on the annealing temperature

2019 ◽  
Vol 238 ◽  
pp. 294-297 ◽  
Author(s):  
Jeongdae Seo ◽  
Jong Yeog Son ◽  
Woo-Hee Kim
2011 ◽  
Vol 197-198 ◽  
pp. 1781-1784
Author(s):  
Hua Wang ◽  
Jian Li ◽  
Ji Wen Xu ◽  
Ling Yang ◽  
Shang Ju Zhou

Intergrowth-superlattice-structured SrBi4Ti4O15–Bi4Ti3O12(SBT–BIT) films prepared on p-Si substrates by sol-gel processing. Synthesized SBT–BIT films exhibit good ferroelectric properties. As the annealing temperature increases from 600°C to 700°C, the remanent polarization Prof SBT–BIT films increases, while the coercive electric field Ecdecreases. SBT–BIT films annealed at 700°C have a Prvalue of 18.9µC/cm2which is higher than that of SBT (16.8µC/cm2) and BIT (14.6µC/cm2), and have the lowest Ecof 142 kV/cm which is almost the same as that of SBT and BIT. The C-V curves of Ag/SBT-BIT/p-Si heterostructures show the clockwise hysteresis loops which reveal the memory effect due to the polarization. The memory window in C-V curve of Ag/SBT-BIT/p-Si is larger than that of Ag/SBT/p-Si heterostructure or Ag/BIT/p-Si heterostructure.


2015 ◽  
Vol 1109 ◽  
pp. 461-465 ◽  
Author(s):  
Nurbaya Zainal ◽  
Mohd Hafiz Wahid ◽  
Mohammad Rusop

Performance of lead titanate, (PbTiO3) thin films have been successfully investigated on microstructural properties, I-V characteristic, dielectric properties, and ferroelectric properties. PbTiO3offers variety of application as transducer, ferroelectric random access memory, transistor, high performance capacitor, sensor, and many more due to its ferroelectric behavior. Preparation of the films are often discussed in order to improve the structural properties, like existence of grain boundaries, particle uniformity, presents of microcrack films, porosities, and many more. Yet, researchers still prepare PbTiO3thin films at high crystallization temperature, certainly above than 600 ̊C to obtain single crystal perovskite structure that would be the reason to gain high spontaneous polarization behavior. Although this will results to high dielectric constant value, the chances that leads to high leakage current is a major failure in device performance. Thus, preparation the thin films at low annealing temperature quite an essential study which is more preferable deposited on low-cost soda lime glass. The study focuses on low annealing temperature of PbTiO3thin films through sol-gel spin coating method and undergo for dielectric and I-V measurements.


2010 ◽  
Vol 20 (10) ◽  
pp. 1906-1910 ◽  
Author(s):  
Yue-qiu GONG ◽  
Xue-jun ZHENG ◽  
Lun-jun GONG ◽  
Yin MA ◽  
Da-zhi ZHANG ◽  
...  

2011 ◽  
Vol 239-242 ◽  
pp. 895-898
Author(s):  
Kai Huang Chen ◽  
Jen Hwan Tsai ◽  
Chia Lin Wu ◽  
Jian Yang Lin ◽  
Chien Min Cheng

In this study, we investigated that of Al/ Ba(Zr0.1Ti0.9)O3(BZT)/Pt/Ti/SiO2/Silicon metal-ferroelectric-metal-insulator-semiconductor (MFM) ferroelectric structures and found the memory effect and capacitance of annealed BZT films during the different annealing temperature. Additionally, the capacitance and leakage current density were about 4.3 nF and 1´10-6A/cm2, respectively. From C-V curves, the ferroelectric properties and charges accumulation of annealed BZT films were also found during the annealing temperature of 700°C.


2013 ◽  
Vol 62 (7) ◽  
pp. 1065-1068 ◽  
Author(s):  
Yoshiki Yachi ◽  
Takeshi Yoshimura ◽  
Norifumi Fujimura

2006 ◽  
Vol 16 ◽  
pp. s71-s74 ◽  
Author(s):  
Zhi YE ◽  
Ming-hua TANG ◽  
Chuan-pin CHENG ◽  
Yi-chun ZHOU ◽  
Xue-jun ZHENG ◽  
...  

2014 ◽  
Vol 879 ◽  
pp. 1-6
Author(s):  
Mohamad Hafiz Mohd Wahid ◽  
Rozana Mohd Dahan ◽  
Siti Zaleha Sa'ad ◽  
Adillah Nurashikin Arshad ◽  
Muhamad Naiman Sarip ◽  
...  

The annealing temperature for 250nm PVDF-TrFE (70:30 mol %) spin coated thin films were varied at solvent evaporation (Ts = 79°C), Curies transition (Tc= 113°C) till melting temperature (Tm = 154°C). From the XRD measurement, there was an improvement in the crystallinity of the annealed films, consistent with the increased in the annealing temperatures. Morphological studies of the annealed PVDF-TrFE thin films as observed with Field Emission Scanning Electron Microscope (FESEM) (100k magnification), showed enhanced development of elongated crystallite structures better known as ferroelectric crystal. However, the AN160 thin film showed fibrous-like structure with appearance of nanoscale separations, which suggested to posed high possibility of defects. Ferroelectric characterization indicated an improvement in the remnant polarization of annealed PVDF-TrFE thin films with the exception to AN160 in which leakage of current was inevitable due to the presence of cracks on the film surface.


1997 ◽  
Vol 493 ◽  
Author(s):  
P. C. Joshi ◽  
S. O. Ryu ◽  
S. Tirumala ◽  
S. B. Desu

ABSTRACTThin films of layered-structure solid-solution material, (1−x)SrBi2Ta2O9−xBi3Ti(TayNb1−y)O9, have shown much improved ferroelectric properties compared to SrBi2Ta2O9, a leading candidate material for ferroelectric random access memory applications. The higher Pr, higher Tc, and lower crystallization temperature of the thin films of solid solution material promise to solve many problems with the present materials of interest. The films were fabricated by metalorganic solution deposition technique using room temperature processed alkoxide-carboxylate precursor solution and characterized in terms of structural, dielectric, and ferroelectric properties. It was possible to obtain a pyrochlore free crystalline phase at an annealing temperature of 600 °C. The effects of annealing temperature and excess Bi content on the film microstructure and properties were analyzed. The electrical measurements were conducted on metal-ferroelectric-metal (MFM) capacitors using Pt as the top and bottom electrode. It was possible to obtain good ferroelectric properties on films annealed at 650 °C. For example, thin films with 0.7SrBi2Ta2O9-0.3Bi3TiTaO9 composition, which were annealed at 650 °C, exhibited typical 2Pr and Ec values of 12.4 μC/cm2 and 80 kV/cm, respectively. The films exhibited low leakage current density, good fatigue characteristics under bipolar stressing at least up to 1010 switching cycles, and good memory retention characteristics after about 106 s of memory retention indicating a favorable behavior for memory applications.


2007 ◽  
Vol 14 (03) ◽  
pp. 435-438
Author(s):  
PILONG WANG ◽  
GUANGDA HU ◽  
YANXIA DING ◽  
SUHUA FAN

SrBi 4 Ti 4 O 15 ( SBTi ) thin films were prepared on (100)- and (110)-oriented LaNiO 3( LNO ) electrodes by a metalorgranic decomposition (MOD) technique at an annealing temperature of 650°C. c-axis-oriented SBTi thin film with volume fraction of 0.89 can be formed on a (100)-oriented LNO film due to the epitaxial relationship between c-axis-oriented SBTi and LNO (100). In contrast, SBTi film deposited on LNO (110) shows random orientations with strong (119) and (200) peaks. The remanent polarization (Pr) and coercive field (Ec) of the random oriented SBTi film were 18.1 μC/cm2 and 70 kV/cm, respectively. This suggests that (110)-oriented LNO electrode is a better choice for obtaining SBTi films with higher volume fraction of a(b)-axis-orientated grains.


Sign in / Sign up

Export Citation Format

Share Document