Electromagnetic modelling and analysis of RF MEMS capacitive shunt switch for 5G applications

2021 ◽  
pp. 105262
Author(s):  
Ch Gopi Chand ◽  
Reshmi Maity ◽  
Srinivasarao K ◽  
N.P. Maity
2009 ◽  
Vol 96 (8) ◽  
pp. 887-893 ◽  
Author(s):  
Kamaljeet Singh ◽  
K. Nagachenchaiah ◽  
Deepak Bhatnagar

2010 ◽  
Vol 130 (6) ◽  
pp. 247-252
Author(s):  
Michihiko Nishigaki ◽  
Toshihiko Nagano ◽  
Hiroshi Ono ◽  
Takashi Kawakubo ◽  
Kazuhiko Itaya
Keyword(s):  
Rf Mems ◽  

PIERS Online ◽  
2008 ◽  
Vol 4 (4) ◽  
pp. 433-436 ◽  
Author(s):  
Yaping Liang ◽  
Calvin W. Domier ◽  
Neville C. Luhmann, Jr.

2020 ◽  
Vol 12 ◽  
Author(s):  
Pampa Debnath ◽  
Ujjwal Mondal ◽  
Arpan Deyasi

Aim:: Computation of loss factors for one-bit RF MEMS switch over Ku, K and Ka-band for two different insulating substrates. Objective:: Numerical investigation of return loss, insertion loss, isolation loss are computed under both actuated and unactuated states for two different insulating substrates of the 1-bit RF MEMS switch, and corresponding up and down-capacitances are obtained. Methods:: The unique characteristics of a 1-bit RF MEMS switch of providing higher return loss under both actuated and unactuated states and also of isolation loss with negligible insertion loss makes it as a prime candidate for phase shifter application. This is presented in this manuscript with a keen focus on improvement capability by changing transmission line width, and also of overlap area; where dielectric constant of the substrate also plays a vital role. Results:: The present work exhibits very low down-capacitance over the spectrum whereas considerable amount of up-capacitance. Also when overall performance in terms of all loss parameters are considered, switch provides very low insertion loss, good return loss under actuated state and standard isolation loss. Conclusion:: Reduction of transmission line width of about 33% improved the performance of the switch by increasing isolation loss. Isolation loss of -40 dB is obtained at actuated condition in higher microwave spectra for SiO 2 at higher overlap area. Down capacitance of ~ 1dB is obtained which is novel as compared with other published literature. Moreover, a better combination of both return loss, isolation loss and insertion loss are reported in this present work compared with all other published data so far.


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