A high-permeance supported carbon molecular sieve membrane fabricated by plasma-enhanced chemical vapor deposition followed by carbonization for CO2 capture

2014 ◽  
Vol 460 ◽  
pp. 1-8 ◽  
Author(s):  
Li-Hua Cheng ◽  
Ywu-Jang Fu ◽  
Kuo-Sung Liao ◽  
Jung-Tsai Chen ◽  
Chien-Chieh Hu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Co2 Capture ◽  
Vapor Deposition ◽  
Molecular Sieve ◽  
Chemical Vapor ◽  
Carbon Molecular Sieve

Plasma-enhanced chemical vapor deposition of amorphous carbon molecular sieve membranes for gas separation

RSC Advances ◽  
2016 ◽  
Vol 6 (64) ◽  
pp. 59045-59049 ◽  
Author(s):  
Hiroki Nagasawa ◽  
Masakoto Kanezashi ◽  
Tomohisa Yoshioka ◽  
Toshinori Tsuru
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Separation ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Molecular Sieve ◽  
Room Temperature ◽  
Chemical Vapor ◽  
Carbon Molecular Sieve ◽  
Carbon Membranes

Amorphous carbon membranes were successfully synthesized onto a SiO2–ZrO2/α-Al2O3 nanoporous substrate via plasma-enhanced chemical vapor deposition (PECVD) at room temperature.

Development of Anion Stereoselective, Activated Carbon Molecular Sieve Electrodes Prepared by Chemical Vapor Deposition

2009 ◽  
Vol 113 (17) ◽  
pp. 7316-7321 ◽  
Author(s):  
Malachi Noked ◽  
Eran Avraham ◽  
Yaniv Bohadana ◽  
Abraham Soffer ◽  
Doron Aurbach
Keyword(s):  
Activated Carbon ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Molecular Sieve ◽  
Chemical Vapor ◽  
Carbon Molecular Sieve

Chemical Vapor Deposition on Chabazite (CHA) Zeolite Membranes for Effective Post-Combustion CO2 Capture

2014 ◽  
Vol 48 (24) ◽  
pp. 14828-14836 ◽  
Author(s):  
Eunjoo Kim ◽  
Taehee Lee ◽  
Hyungmin Kim ◽  
Won-Jin Jung ◽  
Doug-Young Han ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Co2 Capture ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Zeolite Membranes

The modification of pore size in activated carbon fibers by chemical vapor deposition and its effects on molecular sieve selectivity

Carbon ◽  
1998 ◽  
Vol 36 (4) ◽  
pp. 377-382 ◽  
Author(s):  
Yuji Kawabuchi ◽  
Hidetoshi Oka ◽  
Shizuo Kawano ◽  
Isao Mochida ◽  
Noriko Yoshizawa
Keyword(s):  
Activated Carbon ◽  
Chemical Vapor Deposition ◽  
Pore Size ◽  
Carbon Fibers ◽  
Vapor Deposition ◽  
Molecular Sieve ◽  
Chemical Vapor ◽  
Activated Carbon Fibers

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

The relaxation of compressive biaxial strains in SOS via microtwins

1989 ◽  
Vol 47 ◽  
pp. 608-609
Author(s):  
M. E. Twigg ◽  
E. D. Richmond ◽  
J. G. Pellegrino
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Molecular Beam Epitaxy ◽  
Compressive Stress ◽  
Vapor Deposition ◽  
Partial Dislocation ◽  
Molecular Beam ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Silicon Thin Film

For heteroepitaxial systems, such as silicon on sapphire (SOS), microtwins occur in significant numbers and are thought to contribute to strain relief in the silicon thin film. The size of this contribution can be assessed from TEM measurements, of the differential volume fraction of microtwins, dV/dν (the derivative of the microtwin volume V with respect to the film volume ν), for SOS grown by both chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).In a (001) silicon thin film subjected to compressive stress along the [100] axis , this stress can be relieved by four twinning systems: a/6[211]/( lll), a/6(21l]/(l1l), a/6[21l] /( l1l), and a/6(2ll)/(1ll).3 For the a/6[211]/(1ll) system, the glide of a single a/6[2ll] twinning partial dislocation draws the two halves of the crystal, separated by the microtwin, closer together by a/3.

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