Plasma-enhanced chemical vapor deposition of amorphous carbon molecular sieve membranes for gas separation

RSC Advances ◽  
2016 ◽  
Vol 6 (64) ◽  
pp. 59045-59049 ◽  
Author(s):  
Hiroki Nagasawa ◽  
Masakoto Kanezashi ◽  
Tomohisa Yoshioka ◽  
Toshinori Tsuru

Amorphous carbon membranes were successfully synthesized onto a SiO2–ZrO2/α-Al2O3 nanoporous substrate via plasma-enhanced chemical vapor deposition (PECVD) at room temperature.

2009 ◽  
Vol 113 (17) ◽  
pp. 7316-7321 ◽  
Author(s):  
Malachi Noked ◽  
Eran Avraham ◽  
Yaniv Bohadana ◽  
Abraham Soffer ◽  
Doron Aurbach

2009 ◽  
Vol 23 (09) ◽  
pp. 2159-2165 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
MASAYOSHI UMENO

Nitrogen incorporated hydrogenated amorphous carbon (a-C:N:H) thin films have been deposited by microwave surface-wave plasma chemical vapor deposition on silicon and quartz substrates, using helium, methane and nitrogen ( N 2) as plasma source. The deposited a-C:N:H films were characterized by their optical, structural and electrical properties through UV/VIS/NIR spectroscopy, Raman spectroscopy, atomic force microscope and current-voltage characteristics. The optical band gap decreased gently from 3.0 eV to 2.5 eV with increasing N 2 concentration in the films. The a-C:N:H film shows significantly higher electrical conductivity compared to that of N 2-free a-C:H film.


Author(s):  
Marcelo Lopes Pereira Junior ◽  
Wiliam Ferreira da Cunha ◽  
Douglas Soares Galvão ◽  
Luiz Antonio Ribeiro Junior

Recently, laser-assisted chemical vapor deposition has been used to synthesize a free-standing, continuous, and stable monolayer amorphous carbon (MAC).


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