In situ micro-Raman analysis and X-ray diffraction of nickel silicide thin films on silicon

Micron ◽  
2009 ◽  
Vol 40 (1) ◽  
pp. 89-93 ◽  
Author(s):  
M. Bhaskaran ◽  
S. Sriram ◽  
T.S. Perova ◽  
V. Ermakov ◽  
G.J. Thorogood ◽  
...  
2017 ◽  
Vol 111 (8) ◽  
pp. 082907 ◽  
Author(s):  
Seiji Nakashima ◽  
Osami Sakata ◽  
Hiroshi Funakubo ◽  
Takao Shimizu ◽  
Daichi Ichinose ◽  
...  

2018 ◽  
Vol 6 (24) ◽  
pp. 11496-11506 ◽  
Author(s):  
Paul Pistor ◽  
Thomas Burwig ◽  
Carlo Brzuska ◽  
Björn Weber ◽  
Wolfgang Fränzel

We present the identification of crystalline phases by in situ X-ray diffraction during growth and monitor the phase evolution during subsequent thermal treatment of CH3NH3PbX3 (X = I, Br, Cl) perovskite thin films.


2015 ◽  
Vol 3 (43) ◽  
pp. 11357-11365 ◽  
Author(s):  
Geert Rampelberg ◽  
Bob De Schutter ◽  
Wouter Devulder ◽  
Koen Martens ◽  
Iuliana Radu ◽  
...  

VO2 and V2O3 thin films were prepared during in situ XRD investigation by oxidation and reduction of V and V2O5. Films show up to 5 orders of magnitude resistance switching.


2005 ◽  
Vol 244 (1-4) ◽  
pp. 281-284 ◽  
Author(s):  
Naohiko Kato ◽  
Ichiro Konomi ◽  
Yoshiki Seno ◽  
Tomoyoshi Motohiro

2013 ◽  
Vol 103 (24) ◽  
pp. 242904 ◽  
Author(s):  
J. Sinsheimer ◽  
S. J. Callori ◽  
B. Ziegler ◽  
B. Bein ◽  
P. V. Chinta ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document