scholarly journals Fast cut-off, low I2T and high temperature monolithic on-chip fuse on silicon substrate for new fail-safe embedded power switch

2021 ◽  
pp. 114240
Author(s):  
Amirouche Oumaziz ◽  
Emmanuel Sarraute ◽  
Frédéric Richardeau ◽  
Abdelhakim Bourennane ◽  
Céline Combettes ◽  
...  
2006 ◽  
Vol 527-529 ◽  
pp. 1207-1210 ◽  
Author(s):  
Igor Sankin ◽  
V. Bondarenko ◽  
Robin L. Kelley ◽  
Jeff B. Casady

Wide bandgap semiconductor materials such as SiC or GaN are very attractive for use in high-power, high-temperature, and/or radiation resistant electronics. Monolithic or hybrid integration of a power transistor and control circuitry in a single or multi-chip wide bandgap power semiconductor module is highly desirable for such applications in order to improve the efficiency and reliability. This paper describes a new monolithic SiC JFET IC technology for high-temperature smart power applications that allows for on-chip integration of control circuitry and normally-off power switch. In order to demonstrate the feasibility of this technology, hybrid logic gates with maximum switching frequency > 20 MHz and normally-off 900 V power switch have been fabricated on alumina substrates using discrete enhanced and depletion mode vertical trench JFETs.


2012 ◽  
Vol E95.C (7) ◽  
pp. 1244-1251 ◽  
Author(s):  
Koji TAKEDA ◽  
Tomonari SATO ◽  
Takaaki KAKITSUKA ◽  
Akihiko SHINYA ◽  
Kengo NOZAKI ◽  
...  

2021 ◽  
Author(s):  
Viktoriia Mishukova ◽  
Nicolas Boulanger ◽  
Artem Iakunkov ◽  
Szymon Sollami Delekta ◽  
Xiaodong Zhuang ◽  
...  

Many industry applications require electronic circuits and systems to operate at high temperature over 150 oC. Although planar microsupercapacitors (MSCs) have great potential for miniaturized on-chip integrated energy storage components,...


2010 ◽  
Vol 7 (7-8) ◽  
pp. 1952-1954 ◽  
Author(s):  
Kazuki Nomoto ◽  
Kazuya Hasegawa ◽  
Tohru Nakamura

2019 ◽  
Vol 963 ◽  
pp. 832-836 ◽  
Author(s):  
Shuo Ben Hou ◽  
Per Erik Hellström ◽  
Carl Mikael Zetterling ◽  
Mikael Östling

This paper presents our in-house fabricated 4H-SiC n-p-n phototransistors. The wafer mapping of the phototransistor on two wafers shows a mean maximum forward current gain (βFmax) of 100 at 25 °C. The phototransistor with the highest βFmax of 113 has been characterized from room temperature to 500 °C. βFmax drops to 51 at 400 °C and remains the same at 500 °C. The photocurrent gain of the phototransistor is 3.9 at 25 °C and increases to 14 at 500 °C under the 365 nm UV light with the optical power of 0.31 mW. The processing of the phototransistor is same to our 4H-SiC-based bipolar integrated circuits, so it is a promising candidate for 4H-SiC opto-electronics on-chip integration.


2013 ◽  
Vol 60 (7) ◽  
pp. 2217-2223 ◽  
Author(s):  
Puneet Srivastava ◽  
Jo Das ◽  
Robert P. Mertens ◽  
Gustaaf Borghs

2016 ◽  
Vol 2016 (HiTEC) ◽  
pp. 000046-000050
Author(s):  
R. Bannatyne ◽  
D. Gifford ◽  
K. Klein ◽  
C. Merritt

Abstract VORAGO Technologies has developed a pair of ARM Cortex M0 MCUs designed from the ground up to be high temperature capable. One of these devices is specifically developed for high temperature applications, the other adds capabilities that make it suitable for use in high radiation environments as well. These devices are fabricated using a modified version of commercial bulk 130nm CMOS technology utilizing our HARDSIL® technology, which provides immunity to the increased effects of latchup and EOS encountered at higher application temperatures. In addition to the processor these devices include features more typical of low temperature SoCs including on-chip memory, timers, and communications peripherals. In addition to the ceramic package and die format typically utilized at high temperature, a new lower-cost plastic package is available that has been characterized at higher temperatures. These devices have been characterized at temperatures up to 200C and results showing the latchup behavior and device performance are provided. Some of the tradeoffs involved in creating such devices are discussed, as well as some of the similarities and tradeoffs in creating a radiation hardened devices vs. a high temperature device.


Author(s):  
Hsuan-Yu Chen ◽  
Wei-Tin Lin ◽  
Cheng-Hsiang Liao ◽  
Zong-Yi Lin ◽  
Zhi-Qiang Zhang ◽  
...  
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