Effect of the deposition conditions on the properties of photocatalytic WO3 thin films prepared by mid-frequency magnetron sputtering

2019 ◽  
Vol 99 ◽  
pp. 99-105 ◽  
Author(s):  
H. Li ◽  
Z.X. Mu ◽  
S.G. Liu ◽  
J.L. Zhang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Wo3 Thin Films ◽  
Deposition Conditions

scholarly journals NO2 Sensing Properties of WO3 Thin Films Deposited by Rf-Magnetron Sputtering

2014 ◽  
Vol 2014 ◽  
pp. 1-5
Author(s):  
Savita Sharma ◽  
Monika Tomar ◽  
Nitin K. Puri ◽  
Vinay Gupta
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Gas Sensing ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Sensing Properties ◽  
Glass Substrates ◽  
Corning Glass ◽  
Interdigital Electrodes ◽  
Wo3 Thin Films

Tungsten trioxide (WO3) thin films were deposited by Rf-magnetron sputtering onto Pt interdigital electrodes fabricated on corning glass substrates. NO2 gas sensing properties of the prepared WO3 thin films were investigated by incorporation of catalysts (Sn, Zn, and Pt) in the form of nanoclusters. The structural and optical properties of the deposited WO3 thin films have been studied by X-ray diffraction (XRD) and UV-Visible spectroscopy, respectively. The gas sensing characteristics of all the prepared sensor structures were studied towards 5 ppm of NO2 gas. The maximum sensing response of about 238 was observed for WO3 film having Sn catalyst at a comparatively lower operating temperature of 200°C. The possible sensing mechanism has been highlighted to support the obtained results.

Sintering of Ti-Doped Tungsten Trioxide Ceramic Targets

2013 ◽  
Vol 668 ◽  
pp. 686-690 ◽  
Author(s):  
Zhong Jian Zhang ◽  
Cun Qi Liu ◽  
Ling Gao ◽  
Chao Xiao ◽  
Hai Tao Yang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Visible Light ◽  
Vickers Hardness ◽  
Tungsten Trioxide ◽  
Bending Strength ◽  
Sintering Temperature ◽  
Light Transmittance ◽  
Ceramic Targets ◽  
Wo3 Thin Films

The Titanium-doped tungsten trioxide (Ti/WO3) targets with high density was prepared by sintering in oxygen atmosphere. The density, bending strength and Vickers hardness were measured. The morphologies and microstructures were characterized by XRD and SEM. The Ti/WO3 targets were used to prepare the film by magnetron sputtering .The film was characterized by Ultraviolet spectrophotometer. The results showed that 1040°C was the best sintering temperature for making Ti/WO3 ceramic targets. The relative density of the target was up to 92.18%. The visible light transmittance of the Ti/WO3 thin films reduced quickly along with the reduction of wavelength. Two absorb peaks at the wavelength of 384 nm and 480 nm were found, which would play an important role in making electro-chromic materials.

scholarly journals Tungsten Oxide Based Hydrogen Gas Sensor Prepared by Advanced Magnetron Sputtering

2021 ◽  
Vol 6 (1) ◽  
pp. 5
Author(s):  
Nirmal Kumar ◽  
Stanislav Haviar ◽  
Jiří Rezek ◽  
Jiří Čapek ◽  
Pavel Baroch
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tungsten Oxide ◽  
Gas Sensor ◽  
Rf Sputtering ◽  
Hydrogen Gas ◽  
Deposition Parameters ◽  
Copper Tungstate ◽  
The Individual ◽  
Wo3 Thin Films

In this study, we demonstrate the advantages of two advanced sputtering techniques for the preparation of a thin-film conductometric gas sensor. We combined tungsten oxide (WO3) thin films with other materials to achieve enhanced sensorial behavior towards hydrogen. Thin films of WO3 were prepared using the DC and HiPIMS technique, which allowed us to tune the phase composition and crystallinity of the oxide by changing the deposition parameters. The second material was then added on-top of these films. We used the copper tungstate CuWO4 in the form of nano-islands deposited by reactive rf sputtering and Pd particles formed during conventional dc sputtering. The specimens were tested for their response to a time-varied hydrogen concentration in synthetic air at various temperatures. The sensitivity and response time were evaluated. The performance of the individual films is presented as well as the details of the synthesis. Advanced magnetron techniques (such as HiPIMS) allowed us to tune the property of the film to improve its sensorial behavior. The method is compatible with the silicon electronics industry and consists of a few steps that do not require any wet technique, and the films can be used in an as-deposited state. Therefore, sensorial nanostructured materials prepared using magnetron sputtering are very suitable for use in miniaturized electronic devices.

scholarly journals Nano-structured WO3 Thin Films Deposited by Glancing Angle Magnetron Sputtering

2018 ◽  
Vol 33 (12) ◽  
pp. 1303 ◽  
Author(s):  
WANG Mei-Han ◽  
WEN Jia-Xing ◽  
CHEN Yun ◽  
LEI Hao
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Glancing Angle ◽  
Wo3 Thin Films

Enhanced photoelectrochemical properties of WO3 thin films fabricated by reactive magnetron sputtering

2011 ◽  
Vol 36 (8) ◽  
pp. 4724-4731 ◽  
Author(s):  
Vinay Shankar Vidyarthi ◽  
Martin Hofmann ◽  
Alan Savan ◽  
Kirill Sliozberg ◽  
Dennis König ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Photoelectrochemical Properties ◽  
Reactive Magnetron ◽  
Wo3 Thin Films

scholarly journals Effect of substrate on the electro chromic properties of tungsten trioxide thin films

2014 ◽  
Vol 3 (2) ◽  
pp. 245 ◽  
Author(s):  
Vidya Prabhakar ◽  
Ashrit P
Keyword(s):  
Thin Films ◽  
Indium Tin Oxide ◽  
Tungsten Trioxide ◽  
Thermal Evaporation ◽  
Peak Efficiency ◽  
Glass Substrates ◽  
Evaporation Technique ◽  
Infrared Wavelengths ◽  
Wo3 Thin Films ◽  
Deposition Conditions

Thin films of tungsten trioxide (WO3) were deposited onto glass and Indium Tin Oxide (ITO) coated glass substrates using thermal evaporation technique under various deposition conditions. In the present work the effect of substrate on the structure and EC performance of WO3 thin films has been examined using a dry lithiation method. The structural and optical changes occurring in these films with lithium insertion have been studied. It is found that the ITO coated substrate promotes the granulation and higher coloration efficiencies of the films. The peak efficiency is observed at higher infrared wavelengths where it is principally the reflectance modulation that brings about optical changes. Keywords: WO3 Thin Films, Electrochromism, Optical and Structural Properties, Effect of ITO Substrate.

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