Tuning structural, electrical and mechanical properties of diamond-like carbon films by substrate bias voltage

2021 ◽  
pp. 102501
Author(s):  
Wilfred M. Mbiombi ◽  
Daniel Wamwangi ◽  
Bhekumusa A. Mathe ◽  
R.M. Erasmus ◽  
Arthur G. Every ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Bias Voltage ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Substrate Bias ◽  
Substrate Bias Voltage

scholarly journals Effects of Substrate Bias Voltage on Structure of Diamond-Like Carbon Films on AISI 316L Stainless Steel: A Molecular Dynamics Simulation Study

Materials ◽  
2021 ◽  
Vol 14 (17) ◽  
pp. 4925
Author(s):  
Ngoc-Tu Do ◽  
Van-Hai Dinh ◽  
Le Van Lich ◽  
Hong-Hue Dang-Thi ◽  
Trong-Giang Nguyen
Keyword(s):  
Molecular Dynamics ◽  
Stainless Steel ◽  
Bias Voltage ◽  
Carbon Film ◽  
Carbon Films ◽  
Dynamics Simulation ◽  
Diamond Like Carbon ◽  
Substrate Bias ◽  
Aisi 316L ◽  
Substrate Bias Voltage

With the recent significant advances in micro- and nanoscale fabrication techniques, deposition of diamond-like carbon films on stainless steel substrates has been experimentally achieved. However, the underlying mechanism for the formation of film microstructures has remained elusive. In this study, the growth processes of diamond-like carbon films on AISI 316L substrate are studied via the molecular dynamics method. Effects of substrate bias voltage on the structure properties and sp3 hybridization ratio are investigated. A diamond-like carbon film with a compact structure and smooth surface is obtained at 120 V bias voltage. Looser structures with high surface roughness are observed in films deposited under bias voltages of 0 V or 300 V. In addition, sp3 fraction increases with increasing substrate bias voltage from 0 V to 120 V, while an opposite trend is obtained when the bias voltage is further increased from 120 V to 300 V. The highest magnitude of sp3 fraction was about 48.5% at 120 V bias voltage. The dependence of sp3 fraction in carbon films on the substrate bias voltage achieves a high consistency within the experiment results. The mechanism for the dependence of diamond-like carbon structures on the substrate bias voltage is discussed as well.

Effect of Substrate Bias Voltage on the Mechanical and Tribological Properties of Low Concentration Ti-Containing Diamond Like Carbon Films

2012 ◽  
Vol 182-183 ◽  
pp. 232-236 ◽  
Author(s):  
Jin Feng Cui ◽  
Li Qiang ◽  
Bin Zhang ◽  
Xiao Ling ◽  
Jun Yan Zhang
Keyword(s):  
Bias Voltage ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Substrate Bias ◽  
Low Friction ◽  
Substrate Bias Voltage ◽  
Mechanical And Tribological Properties ◽  
Si Substrates ◽  
Argon Mixture ◽  
Hardness Values

Ti containing hydrogenated diamond like carbon films (Ti-DLC) was deposited on Si substrates at room temperature by magnetron sputtering Ti-twin target in methane and argon mixture atmosphere via changing the substrate bias voltage. The Ti atomic concentration in the film is less than 0.57% and exists mainly in the form of metallic titanium rather than TiC, confirmed by XPS analysis. The internal compressive stress of the film decreases monotonically with the substrate bias voltage increase. However, the hardness values of the film keep at level (12 GPa) without almost any obvious change with the increase of the substrate bias voltage. Furthermore, Ti-containing DLC film prepared at -1600 V substrate bias voltage shows an extremely low wear rate (~10-9mm3/Nm) and low friction coefficient (0.09).

Effect of substrate bias voltage on the composition, microstructure and mechanical properties of W-B-C coatings

2020 ◽  
Vol 528 ◽  
pp. 146966
Author(s):  
S. Mirzaei ◽  
M. Alishahi ◽  
P. Souček ◽  
V. Buršíková ◽  
L. Zábranský ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Microstructure And Mechanical Properties

Properties Oftetrahedralamorphous Carbon Films Deposited By the Filtered Cathodicarc Method

2002 ◽  
Vol 750 ◽  
Author(s):  
Naruhisa Nagata ◽  
Kazuhiro Kusakawa ◽  
Akiyasu Kumagai ◽  
Hideaki Matsuyama
Keyword(s):  
Mechanical Properties ◽  
Amorphous Carbon ◽  
Pyrolytic Graphite ◽  
High Hardness ◽  
Magnetic Film ◽  
Carbon Films ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Tetrahedral Amorphous Carbon ◽  
Bond Ratio

ABSTRACTFirst, we studied the relation between the sp3 bond ratio and the hardness of 100-nm-thick tetrahedral amorphous carbon (ta-C) films deposited by a Filtered Cathodic Arc (FCA) system at different substrate bias voltages. For comparison, sputtered amorphous carbon (a-C) films and Highly Oriented Pyrolytic Graphite (HOPG) were also analyzed. According to the results, ta-C film deposited at a -70 volt substrate bias voltage had high hardness and high sp3 bond ratio of up to 88 GPa and 85%, respectively, whereas those of sputtered a-C were 29 GPa and 28%. Furthermore, we found that the hardness of carbon films, including sputtered a-C and HOPG, increased with increasing sp3 bond ratio. Based on this relation, the chemical bond structures of carbon films are considered to be closely related to their mechanical properties. Secondly, we investigated the relation between sp3 bond ratio and ta-C film thickness, over the range from 1 to 10 nm. The measurements showed that a 2-nm-thick initial layer grown on the surface of CoCrPt magnetic film had low sp3 bond ratios. It is suggested that this reduction in sp3 bond ratio in the initially grown layer seriously degrades the film's performance as a hard disk media overcoat. Further efforts to improve ta-C film processing will be required to improve its mechanical properties.

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