Energy dispersive X-ray reflectivity to study phase transitions in thin films

2004 ◽  
Vol 70 (4-5) ◽  
pp. 611-617 ◽  
Author(s):  
M. Bhattacharya ◽  
M.K. Mukhopadhyay ◽  
S. Pal ◽  
M.K. Sanyal
Hyomen Kagaku ◽  
1998 ◽  
Vol 19 (4) ◽  
pp. 259-264
Author(s):  
Kenji ISHIDA ◽  
Toshihisa HORIUCHI ◽  
Kazumi MATSUSHIGE MATSUSHIGE

1981 ◽  
Vol 25 ◽  
pp. 365-371
Author(s):  
Glen A. Stone

This paper presents a new method to measure the thickness of very thin films on a substrate material using energy dispersive x-ray diffractometry. The method can be used for many film-substrate combinations. The specific application to be presented is the measurement of phosphosilicate glass films on single crystal silicon wafers.


1973 ◽  
Vol 27 (2) ◽  
pp. 99-102 ◽  
Author(s):  
H. S. deBen ◽  
Barret Broyde

Quantitative measurements of concentrations are given for the phases present in undoped tantalum thin films by the use of energy-dispersive x-ray detectors. This diffraction method can also yield the extent of preferred orientation.


2011 ◽  
Vol 1 ◽  
pp. 135-139 ◽  
Author(s):  
M. Asghar ◽  
Khalid Mahmood ◽  
Adnan Ali ◽  
M.A. Hasan ◽  
I. Hussain ◽  
...  

Origin of ultraviolet (UV) luminescence from bulk ZnO has been investigated with the help of photoluminescence (PL) measurements. Thin films of ZnO having 52%, 53% and 54% of Zn-contents were prepared by means of molecular beam epitaxy (MBE). We observed a dominant UV line at 3.28 eV and a visible line centered at 2.5 eV in the PL spectrum performed at room temperature. The intensity of UV line has been found to depend upon the Zn percentage in the ZnO layers. Thereby, we correlate the UV line in our samples with the Zn-interstitials-bound exciton (Zni-X) recombination. The results obtained from, x-ray diffraction, the energy dispersive X-ray spectrum (EDAX) and Raman spectroscopy supported the PL results.


2010 ◽  
Vol 81 (11) ◽  
pp. 113706 ◽  
Author(s):  
T. Huthwelker ◽  
V. Zelenay ◽  
M. Birrer ◽  
A. Krepelova ◽  
J. Raabe ◽  
...  

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