Application of hydrosilane-free atmospheric pressure chemical vapor deposition of SiOx films in the manufacture of crystalline silicon solar cells

2020 ◽  
Vol 713 ◽  
pp. 138338
Author(s):  
Esmail Issa ◽  
Henning Nagel ◽  
Jonas Bartsch ◽  
Markus Glatthaar ◽  
Edda Rädlein
Keyword(s):  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Silicon Solar Cells ◽  
Crystalline Silicon Solar Cells ◽  
Pressure Chemical

Mist chemical vapor deposition of aluminum oxide thin films for rear surface passivation of crystalline silicon solar cells

2014 ◽  
Vol 7 (2) ◽  
pp. 021303 ◽  
Author(s):  
Takayuki Uchida ◽  
Toshiyuki Kawaharamura ◽  
Kenji Shibayama ◽  
Takahiro Hiramatsu ◽  
Hiroyuki Orita ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Aluminum Oxide ◽  
Vapor Deposition ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Rear Surface ◽  
Chemical Vapor ◽  
Silicon Solar Cells ◽  
Crystalline Silicon Solar Cells
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