Thin-foil based TEM screens with electrophoretic deposition of phosphors

1995 ◽  
Vol 53 ◽  
pp. 30-31
Author(s):  
G.Y. Fan ◽  
Ben Russ ◽  
Jan B. Talbot ◽  
Jeff Price ◽  
Mark H. Ellisman
Keyword(s):  
Electron Microscopy ◽  
Single Crystal ◽  
Digital Imaging ◽  
Thin Foil ◽  
Imaging Systems ◽  
Ccd Imaging ◽  
Digital Imaging Technology ◽  
Detection Quantum Efficiency ◽  
Foil Substrate ◽  
Phosphor Screens

The availability of 2k×2k or larger format CCD chips has made direct digital imaging more practical in electron microscopy. But the suboptimal performance of scintillating screens, particularly their inferior resolution as compared to film, is still an obstacle to a broader adaptation of digital imaging technology to electron microscopy. Thin-foil substrate screens have improved brightness and resolution over the more commonly used glass substrate screens, particularly at higher operating voltages, but further improvements are required for the optimum performance of the CCD imaging systems. Self-supporting single crystal YAG screens, approximately 30 μm in thickness, provide better resolution and detection-quantum-efficiency as compared to the phosphor screens, but their lower brightness, about 4 - 8 times lower, makes them less than ideal at least for low dose applications. Until brighter single crystal scintillators become available, powder phosphor screens may offer performance advantages for applications where radiation damage to the specimen is a concern.

The bright future of digital imaging in scanning electron microscopy

1993 ◽  
Vol 51 ◽  
pp. 768-769
Author(s):  
M. T. Postek ◽  
A. E. Vladar
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Digital Imaging ◽  
High Speed ◽  
High Performance ◽  
Mass Storage ◽  
Analog To Digital ◽  
Central Processing ◽  
Digital Imaging Technology ◽  
Scanning Electron

One of the major advancements applied to scanning electron microscopy (SEM) during the past 10 years has been the development and application of digital imaging technology. Advancements in technology, notably the availability of less expensive, high-density memory chips and the development of high speed analog-to-digital converters, mass storage and high performance central processing units have fostered this revolution. Today, most modern SEM instruments have digital electronics as a standard feature. These instruments, generally have 8 bit or 256 gray levels with, at least, 512 × 512 pixel density operating at TV rate. In addition, current slow-scan commercial frame-grabber cards, directly applicable to the SEM, can have upwards of 12-14 bit lateral resolution permitting image acquisition at 4096 × 4096 resolution or greater. The two major categories of SEM systems to which digital technology have been applied are:In the analog SEM system the scan generator is normally operated in an analog manner and the image is displayed in an analog or "slow scan" mode.

scholarly journals The Bright Future of Digital Imaging in Scanning Electron Microscopy

1994 ◽  
Vol 2 (4) ◽  
pp. 19-20 ◽  
Author(s):  
M.T. Postek ◽  
A.E. Vladar
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Digital Imaging ◽  
High Speed ◽  
High Performance ◽  
Mass Storage ◽  
Analog To Digital ◽  
Central Processing ◽  
Digital Imaging Technology ◽  
Scanning Electron

One of the major advancements applied to scanning electron microscopy (SEM) during the past 10 years has been the development and application of digital imaging technology. Advancements in technology, notably the availability of less expensive, high-density memory chips and the development of high speed analog-to-digital converters, mass storage and high performance central processing units have fostered this revolution. Today, most modern SEM instruments have digital electronics as a standard feature. These instruments, generally have 8 bit or 256 gray levels with, at least, 512 X 512 pixel density operating at TV rate. In addition, current slow-scan commercial frame-grabber cards, directly applicable to the SEM, can have upwards of 12-14 bit lateral resolution permitting image acquisition at 4096 X 4096 resolution or greater.

Microwave and Digital Imaging Technology Reduce Turnaround Times for Diagnostic Electron Microscopy

2003 ◽  
Vol 27 (3) ◽  
pp. 187-196 ◽  
Author(s):  
Richard T. Giberson ◽  
Ronald L. Austin ◽  
Jon Charlesworth ◽  
Grete Adamson ◽  
Guillermo A. Herrera
Keyword(s):  
Electron Microscopy ◽  
Digital Imaging ◽  
Imaging Technology ◽  
Digital Imaging Technology

A Preparation of High Resolution Standards for Electron Microscopy. Part II

1971 ◽  
Vol 29 ◽  
pp. 160-161
Author(s):  
Akira Tanaka ◽  
David F. Harling
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Carbon Black ◽  
Single Crystal ◽  
Dark Field ◽  
Graphitized Carbon Black ◽  
Graphitized Carbon ◽  
Dark Field Imaging ◽  
Crystal Films ◽  
Micro Holes

In the previous paper, the author reported on a technique for preparing vapor-deposited single crystal films as high resolution standards for electron microscopy. The present paper is intended to describe the preparation of several high resolution standards for dark field microscopy and also to mention some results obtained from these studies. Three preparations were used initially: 1.) Graphitized carbon black, 2.) Epitaxially grown particles of different metals prepared by vapor deposition, and 3.) Particles grown epitaxially on the edge of micro-holes formed in a gold single crystal film.The authors successfully obtained dark field micrographs demonstrating the 3.4Å lattice spacing of graphitized carbon black and the Au single crystal (111) lattice of 2.35Å. The latter spacing is especially suitable for dark field imaging because of its preparation, as in 3.), above. After the deposited film of Au (001) orientation is prepared at 400°C the substrate temperature is raised, resulting in the formation of many square micro-holes caused by partial evaporation of the Au film.

Radiation-Induced Precipitation at Thin Foil Surfaces in Ni-Be Alloys

1982 ◽  
Vol 40 ◽  
pp. 598-599
Author(s):  
T. Mukai ◽  
T. E. Mitchell
Keyword(s):  
Electron Microscopy ◽  
High Voltage ◽  
Electron Irradiation ◽  
High Vacuum ◽  
Thin Foil ◽  
Homogeneous Precipitation ◽  
High Voltage Electron Microscopy ◽  
Voltage Electron ◽  
High Voltage Electron ◽  
Radiation Induced

Radiation-induced homogeneous precipitation in Ni-Be alloys was recently observed by high voltage electron microscopy. A coupling of interstitial flux with solute Be atoms is responsible for the precipitation. The present investigation further shows that precipitation is also induced at thin foil surfaces by electron irradiation under a high vacuum.

Electron Microscopy of Shock Loaded Polycrystalline Beryllium

1974 ◽  
Vol 32 ◽  
pp. 506-507 ◽  
Author(s):  
J. M. Galbraith ◽  
L. E. Murr ◽  
A. L. Stevens
Keyword(s):  
Electron Microscopy ◽  
Wave Propagation ◽  
Structural Change ◽  
Single Crystal ◽  
Diffraction Pattern ◽  
Shock Loading ◽  
Slip Systems ◽  
Compression Tests ◽  
X Ray Diffraction ◽  
X Ray

Uniaxial compression tests and hydrostatic tests at pressures up to 27 kbars have been performed to determine operating slip systems in single crystal and polycrystal1ine beryllium. A recent study has been made of wave propagation in single crystal beryllium by shock loading to selectively activate various slip systems, and this has been followed by a study of wave propagation and spallation in textured, polycrystal1ine beryllium. An alteration in the X-ray diffraction pattern has been noted after shock loading, but this alteration has not yet been correlated with any structural change occurring during shock loading of polycrystal1ine beryllium.This study is being conducted in an effort to characterize the effects of shock loading on textured, polycrystal1ine beryllium. Samples were fabricated from a billet of Kawecki-Berylco hot pressed HP-10 beryllium.

Studies of Oxide Formation on Copper Thin Films by Electron Microscopy

1977 ◽  
Vol 35 ◽  
pp. 316-317
Author(s):  
G. G. Hembree ◽  
M. A. Otooni ◽  
J. M. Cowley
Keyword(s):  
Electron Microscopy ◽  
Electron Diffraction ◽  
Single Crystal ◽  
Crystal Surface ◽  
Crystal Defects ◽  
Diffraction Reflection ◽  
Reaction Products ◽  
Intermediate Energies ◽  
Crystal Films ◽  
Reflection Electron Microscopy

The formation of oxide structures on single crystal films of metals has been investigated using the REMEDIE system (for Reflection Electron Microscopy and Electron Diffraction at Intermediate Energies) (1). Using this instrument scanning images can be obtained with a 5 to 15keV incident electron beam by collecting either secondary or diffracted electrons from the crystal surface (2). It is particularly suited to studies of the present sort where the surface reactions are strongly related to surface morphology and crystal defects and the growth of reaction products is inhomogeneous and not adequately described in terms of a single parameter. Observation of the samples has also been made by reflection electron diffraction, reflection electron microscopy and replication techniques in a JEM-100B electron microscope.A thin single crystal film of copper, epitaxially grown on NaCl of (100) orientation, was repositioned on a large copper single crystal of (111) orientation.

Digital imaging: When should one take the plunge?

1996 ◽  
Vol 54 ◽  
pp. 602-603
Author(s):  
John F. Mansfield
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Optical Microscopy ◽  
Digital Imaging ◽  
Storage Devices ◽  
Major Benefit ◽  
Transmission Electron ◽  
New Instrument ◽  
Scanning Electron

The current imaging trend in optical microscopy, scanning electron microscopy (SEM) or transmission electron microscopy (TEM) is to record all data digitally. Most manufacturers currently market digital acquisition systems with their microscope packages. The advantages of digital acquisition include: almost instant viewing of the data as a high-quaity positive image (a major benefit when compared to TEM images recorded onto film, where one must wait until after the microscope session to develop the images); the ability to readily quantify features in the images and measure intensities; and extremely compact storage (removable 5.25” storage devices which now can hold up to several gigabytes of data).The problem for many researchers, however, is that they have perfectly serviceable microscopes that they routinely use that have no digital imaging capabilities with little hope of purchasing a new instrument.

Digital imaging and quantitative image analysis of polymer blends

1996 ◽  
Vol 54 ◽  
pp. 170-171
Author(s):  
Xiao Zhang
Keyword(s):  
Digital Imaging ◽  
Imaging Techniques ◽  
Imaging Systems ◽  
Polymer Science ◽  
Key Factors ◽  
Multiple Imaging ◽  
Quantitative Image ◽  
Digital Imaging Systems ◽  
Multi Phase ◽  
Network Technologies

Polymer microscopy involves multiple imaging techniques. Speed, simplicity, and productivity are key factors in running an industrial polymer microscopy lab. In polymer science, the morphology of a multi-phase blend is often the link between process and properties. The extent to which the researcher can quantify the morphology determines the strength of the link. To aid the polymer microscopist in these tasks, digital imaging systems are becoming more prevalent. Advances in computers, digital imaging hardware and software, and network technologies have made it possible to implement digital imaging systems in industrial microscopy labs.

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