A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry

In Situ SiO2 Passivation of Epitaxial (100) and (110)InGaAs by Exploiting TaSiOx Atomic Layer Deposition Process

ACS Omega ◽

10.1021/acsomega.8b02314 ◽

2018 ◽

Vol 3 (11) ◽

pp. 14567-14574 ◽

Cited By ~ 2

Author(s):

Mantu K. Hudait ◽

Michael B. Clavel ◽

Jheng-Sin Liu ◽

Shuvodip Bhattacharya

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Process ◽

Atomic Layer Deposition Process ◽

Optical in situ monitoring of plasma-enhanced atomic layer deposition process

Japanese Journal of Applied Physics ◽

10.7567/jjap.57.06jf05 ◽

2018 ◽

Vol 57 (6S2) ◽

pp. 06JF05 ◽

Cited By ~ 2

Author(s):

Muhammad Zeeshan Arshad ◽

Kyung Jae Jo ◽

Hyun Gi Kim ◽

Sang Jeen Hong

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Process ◽

In Situ Monitoring ◽

Atomic Layer Deposition Process ◽

In Situ Reaction Mechanism Studies on Lithium Hexadimethyldisilazide and Ozone Atomic Layer Deposition Process for Lithium Silicate

The Journal of Physical Chemistry C ◽

10.1021/jp312309g ◽

2013 ◽

Vol 117 (27) ◽

pp. 14241-14246 ◽

Cited By ~ 16

Author(s):

Yoann Tomczak ◽

Kjell Knapas ◽

Markku Sundberg ◽

Markku Leskelä ◽

Mikko Ritala

Keyword(s):

Reaction Mechanism ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Process ◽

Lithium Silicate ◽

Atomic Layer Deposition Process ◽

In Situ Reaction ◽

In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of Al2O3Thin Films from Trimethylaluminum and Water

Langmuir ◽

10.1021/la991183+ ◽

2000 ◽

Vol 16 (8) ◽

pp. 4034-4039 ◽

Cited By ~ 64

Author(s):

Marika Juppo ◽

Antti Rahtu ◽

Mikko Ritala ◽

Markku Leskelä

Keyword(s):

Mass Spectrometry ◽

Atomic Layer Deposition ◽

Surface Reactions ◽

Atomic Layer ◽

Layer Deposition ◽

Atomic layer deposition on particles using a fluidized bed reactor with in situ mass spectrometry

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.05.002 ◽

2007 ◽

Vol 201 (22-23) ◽

pp. 9163-9171 ◽

Cited By ~ 125

Author(s):

David M. King ◽

Joseph A. Spencer ◽

Xinhua Liang ◽

Luis F. Hakim ◽

Alan W. Weimer

Keyword(s):

Mass Spectrometry ◽

Atomic Layer Deposition ◽

Fluidized Bed ◽

Atomic Layer ◽

Fluidized Bed Reactor ◽

In Situ Mass Spectrometry Study on Atomic Layer Deposition from Metal (Ti, Ta, and Nb) Ethoxides and Water

Chemistry of Materials ◽

10.1021/cm0011110 ◽

2001 ◽

Vol 13 (3) ◽

pp. 817-823 ◽

Cited By ~ 43

Author(s):

Antti Rahtu ◽

Kaupo Kukli ◽

Mikko Ritala

Keyword(s):

Mass Spectrometry ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of TiN and Ti(Al)N Thin Films

Chemistry of Materials ◽

10.1021/cm011150r ◽

2002 ◽

Vol 14 (1) ◽

pp. 281-287 ◽

Cited By ~ 22

Author(s):

Marika Juppo ◽

Antti Rahtu ◽

Mikko Ritala

Keyword(s):

Mass Spectrometry ◽

Thin Films ◽

Atomic Layer Deposition ◽

Surface Reactions ◽

Atomic Layer ◽

Layer Deposition ◽

Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

The Journal of Physical Chemistry C ◽

10.1021/jp804296a ◽

2008 ◽

Vol 112 (49) ◽

pp. 19530-19539 ◽

Cited By ~ 211

Author(s):

David N. Goldstein ◽

Jarod A. McCormick ◽

Steven M. George

Keyword(s):

Mass Spectrometry ◽

Atomic Layer Deposition ◽

Ftir Spectroscopy ◽

Atomic Layer ◽

Quadrupole Mass ◽

Quadrupole Mass Spectrometry ◽

In Situ Quadrupole Mass Spectrometry Study of Atomic-Layer Deposition of ZrO2Using Cp2Zr(CH3)2and Water

Langmuir ◽

10.1021/la0500732 ◽

2005 ◽

Vol 21 (16) ◽

pp. 7321-7325 ◽

Cited By ~ 36

Author(s):

Jaakko Niinistö ◽

Antti Rahtu ◽

Matti Putkonen ◽

Mikko Ritala ◽

Markku Leskelä ◽

...

Keyword(s):

Mass Spectrometry ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Quadrupole Mass ◽

Quadrupole Mass Spectrometry ◽

Layer Deposition ◽

In Situ Quartz Crystal Microbalance and Quadrupole Mass Spectrometry Studies of Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum and Water

Langmuir ◽

10.1021/la010103a ◽

2001 ◽

Vol 17 (21) ◽

pp. 6506-6509 ◽

Cited By ~ 116

Author(s):

Antti Rahtu ◽

Teemu Alaranta ◽

Mikko Ritala

Keyword(s):

Mass Spectrometry ◽

Atomic Layer Deposition ◽

Aluminum Oxide ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Atomic Layer ◽

Quadrupole Mass ◽

Quadrupole Mass Spectrometry ◽