Tetramethylammonium Hydroxide, 1.0 M Aqueous Solution

2017 ◽  
Keyword(s):  
Aqueous Solution ◽  
Tetramethylammonium Hydroxide

A Novel Photosensitive Polyimide: A Polyimide Containing the Hydroxytriphenylamine Structure with Diazonaphthoquinone

2000 ◽  
Vol 12 (1) ◽  
pp. 177-184 ◽  
Author(s):  
Satoshi Akimoto ◽  
Mitsutoshi Jikei ◽  
Masa-aki Kakimoto
Keyword(s):  
Aqueous Solution ◽  
Phthalic Anhydride ◽  
Ring Opening ◽  
Polyimide Film ◽  
Tetramethylammonium Hydroxide ◽  
Thermal Cyclization

A novel photosensitive polyimide based on a polyimide containing the hydroxytriphenylamine structure (HTA-PI) and 2, 3, 4-tris[1-oxo-2-diazonaphthoquinone-4-sulfonyloxy] benzophenone (D4SB) as a photoreactive compound has been developed. The HTAPI was prepared by the ring-opening polyaddition of 4, 4′-hexafluoroisopropylidenebis(phthalic anhydride) (6FDA) and 4,4′-diamino-4″-hydroxytriphenylamine (DHTA), followed by thermal cyclization in refluxing N-methyl-2-pyrrolidone (NMP). The resulting polyimide film showed excellent transparency to 436 nm light. Photosensitive polyimide containing 30 wt% of D4SB showed a sensitivity of 800 mJ cm−2 and a contrast of 0.8 when it was exposed to 436 nm light followed by development with 5% tetramethylammonium hydroxide (TMAH) aqueous solution at 45°C.

The dependence of AlN molar fraction of AlGaN in wet etching by using tetramethylammonium hydroxide aqueous solution

2019 ◽  
Vol 58 (SC) ◽  
pp. SCCC30 ◽  
Author(s):  
Shinji Yasue ◽  
Kosuke Sato ◽  
Yuta Kawase ◽  
Junya Ikeda ◽  
Yusuke Sakuragi ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Molar Fraction ◽  
Wet Etching ◽  
Tetramethylammonium Hydroxide

Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution

2021 ◽  
Author(s):  
Yuko Tsutsui Ito ◽  
Takahiro KOZAWA
Keyword(s):  
Aqueous Solution ◽  
Free Energy ◽  
Surface Free Energy ◽  
Water Intake ◽  
Dissolution Kinetics ◽  
Exposure Dose ◽  
Tetramethylammonium Hydroxide ◽  
Polar Components ◽  
Dispersion Component ◽  
Chemically Amplified Resists

Abstract With the sharpening of optical images, the capability of resist materials has become a serious concern in lithography. The dissolution of a resist polymer is key to the realization of ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified. In this study, the relationships of surface free energy with swelling and dissolution kinetics were investigated using poly(4-hydroxystyrene) (PHS) film with triphenylsulfonium-nonaflate (TPS-nf). Developers were water and 2.38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution. PHS and TPS-nf are a typical backbone polymer (a dissolution agent) and a typical acid generator of chemically amplified resists, respectively. The water intake and dissolution of PHS film with TPS-nf became fast with increasing UV exposure dose. It was found that the increase in the polar components (particularly, the hydrogen bonding component) and the decrease in the dispersion component of surface free energy underlie the fast water intake and dissolution.

Catalytic properties of copper–manganese mixed oxides prepared by coprecipitation using tetramethylammonium hydroxide

2014 ◽  
Vol 4 (10) ◽  
pp. 3713-3722 ◽  
Author(s):  
Hisahiro Einaga ◽  
Akihiro Kiya ◽  
Satoru Yoshioka ◽  
Yasutake Teraoka
Keyword(s):  
Aqueous Solution ◽  
Mixed Oxide ◽  
Mixed Oxides ◽  
Catalytic Properties ◽  
Oxide Catalysts ◽  
Tetramethylammonium Hydroxide ◽  
Mixed Oxide Catalysts ◽  
Metal Nitrates ◽  
Copper Manganese ◽  
Coprecipitation Technique

Copper–manganese (Cu–Mn) mixed oxide catalysts were prepared by a coprecipitation technique from metal nitrates in aqueous solution using tetramethylammonium hydroxide (TMAH) as a pH regulator.

scholarly journals Effect of the Precipitating Agent on the Synthesis and Sintering Behavior of 20 mol% Sm-Doped Ceria

2016 ◽  
Vol 2016 ◽  
pp. 1-8 ◽  
Author(s):  
Luca Spiridigliozzi ◽  
Gianfranco Dell’Agli ◽  
Mattia Biesuz ◽  
Vincenzo M. Sglavo ◽  
Michele Pansini
Keyword(s):  
Aqueous Solution ◽  
Crucial Role ◽  
Ammonium Carbonate ◽  
Fluorite Structure ◽  
Tetramethylammonium Hydroxide ◽  
Sintering Behavior ◽  
Doped Ceria ◽  
Coprecipitation Process ◽  
Nanometric Size

Nanocrystalline 20 mol% samaria-doped ceria powders (Ce0.8Sm0.2O1.9) were synthesized by coprecipitation techniques using various precipitating agents in aqueous solution: ammonia, ammonium carbonate, tetramethylammonium hydroxide, and urea. The synthesized powders after calcination at 600°C possess a fluorite structure with nanometric size although they are characterized by a very different morphology and degree of agglomeration. Remarkable differences appear in the sintering behavior, especially because of the presence of hard agglomerates. The precipitating agent has therefore a crucial role in the coprecipitation process, which influences the morphology of the powders and in turn the sintering behavior. The obtained results clearly reveal that ammonium carbonate and urea are the best precipitating agents to obtain final dense products after sintering.

Micro/Nanofabrication by Spin Dewetting on a Poly(Dimethylsiloxane) Mold

2007 ◽  
Vol 1002 ◽  
Author(s):  
Nicholas Ferrell ◽  
Aimee Bross ◽  
Derek Hansford
Keyword(s):  
Aqueous Solution ◽  
Methyl Methacrylate ◽  
Polymer Solution ◽  
Spin Coating ◽  
Solution Concentration ◽  
Tetramethylammonium Hydroxide ◽  
Pdms Mold ◽  
Feature Size ◽  
Propyl Methacrylate ◽  
Glass Substrates

ABSTRACTThe process of spin dewetting was used to fabricate polymer micro and nanostructures from poly(methyl methacrylate) (PMMA), poly (propyl methacrylate) (PPMA), and polystyrene (PS). Polymer structures were formed on poly(dimethylsiloxane) (PDMS) molds by dewetting of a polymer solution during spin coating. Features were removed from the mold using heat and pressure to transfer the polymer to silicon or glass substrates. By varying the coating conditions, a variety of different polymer feature morphologies were obtained for a given PDMS mold geometry. In this study, the ability to fabrication polymer micro and nanostructures using spin dewetting was demonstrated on a variety of PDMS mold geometries. The effects of polymer solution concentration and mold feature size on the resulting polymer structures were examined. In addition, microfabricated PMMA structures were used as etch masks for anisotropic etching of silicon in an aqueous solution of tetramethylammonium hydroxide (TMAH).

scholarly journals Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt.% TMAX

2021 ◽  
Vol 75 (1) ◽  
pp. 15-24
Author(s):  
Milce Smiljanic ◽  
Branislav Radjenovic ◽  
Zarko Lazic ◽  
Marija Radmilovic-Radjenovic ◽  
Milena Rasljic-Rafajilovic ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Level Set Method ◽  
Level Set ◽  
Cost Effective ◽  
Tetramethylammonium Hydroxide ◽  
Experimental Results ◽  
Etching Technique ◽  
Paper Fabrication ◽  
Analytical Relations ◽  
Good Agreement

In this paper, fabrication of silicon microchannels with integrated obstacles by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at the temperature of 80?C is presented and analysed. We studied basic island patterns, which present union of two symmetrical parallelograms with the sides along predetermined crystallographic directions <n10> (2<n<8) and <100>. Acute angles of the parallelograms were smaller than 45?. We have derived analytical relations for determining dimensions of the integrated obstacles. The developed etching technique provides reduction of the distance between the obstacles. Before the experiments, we performed simulations of pattern etching based on the level set method and presented evolution of the etched basic patterns for the predetermined crystallographic directions <n10>. Combination of basic patterns with sides along the <610> and <100> crystallographic directions is used to fabricate a matrix of two row of silicon obstacles in a microchannel. We obtained a good agreement between the experimental results and simulations. Our results enable simple and cost-effective fabrication of various complex microfluidic silicon platforms with integrated obstacles.

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