The dependence of AlN molar fraction of AlGaN in wet etching by using tetramethylammonium hydroxide aqueous solution

2019 ◽  
Vol 58 (SC) ◽  
pp. SCCC30 ◽  
Author(s):  
Shinji Yasue ◽  
Kosuke Sato ◽  
Yuta Kawase ◽  
Junya Ikeda ◽  
Yusuke Sakuragi ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Molar Fraction ◽  
Wet Etching ◽  
Tetramethylammonium Hydroxide

Wet Etching Behavior of Poly-Si in TMAH Solution

2012 ◽  
Vol 195 ◽  
pp. 42-45 ◽  
Author(s):  
Hiroaki Takahashi ◽  
Masayuki Otsuji ◽  
Jim Snow ◽  
Farid Sebaai ◽  
Kenichiro Arai ◽  
...  
Keyword(s):  
Wet Etching ◽  
Tetramethylammonium Hydroxide ◽  
Process Performance ◽  
Etching Behavior ◽  
Dummy Gate ◽  
Tmah Solution

Since Tetramethylammonium Hydroxide (TMAH) became widely used as a silicon etchant, e.g. the dummy gate removal for gate-last approach (RMG) [1, or Si fin formation on FinFET [, some careful preparations and optimizations have required implementation. These adaptations have involved not only chemical-related issues, but also hardware-related in order to satisfy the necessary process performance.

A Novel Photosensitive Polyimide: A Polyimide Containing the Hydroxytriphenylamine Structure with Diazonaphthoquinone

2000 ◽  
Vol 12 (1) ◽  
pp. 177-184 ◽  
Author(s):  
Satoshi Akimoto ◽  
Mitsutoshi Jikei ◽  
Masa-aki Kakimoto
Keyword(s):  
Aqueous Solution ◽  
Phthalic Anhydride ◽  
Ring Opening ◽  
Polyimide Film ◽  
Tetramethylammonium Hydroxide ◽  
Thermal Cyclization

A novel photosensitive polyimide based on a polyimide containing the hydroxytriphenylamine structure (HTA-PI) and 2, 3, 4-tris[1-oxo-2-diazonaphthoquinone-4-sulfonyloxy] benzophenone (D4SB) as a photoreactive compound has been developed. The HTAPI was prepared by the ring-opening polyaddition of 4, 4′-hexafluoroisopropylidenebis(phthalic anhydride) (6FDA) and 4,4′-diamino-4″-hydroxytriphenylamine (DHTA), followed by thermal cyclization in refluxing N-methyl-2-pyrrolidone (NMP). The resulting polyimide film showed excellent transparency to 436 nm light. Photosensitive polyimide containing 30 wt% of D4SB showed a sensitivity of 800 mJ cm−2 and a contrast of 0.8 when it was exposed to 436 nm light followed by development with 5% tetramethylammonium hydroxide (TMAH) aqueous solution at 45°C.

Study of Oxygen Concentration in TMAH Solution for Improvement of Sigma-Shaped Wet Etching Process

2016 ◽  
Vol 255 ◽  
pp. 18-21
Author(s):  
Yong Gen He ◽  
Huan Xin Liu ◽  
Jia Lei Liu ◽  
Jin Gang Wu ◽  
Christian Haigermoser ◽  
...  
Keyword(s):  
Oxygen Concentration ◽  
Wet Etching ◽  
Tetramethylammonium Hydroxide ◽  
Etching Process ◽  
Shape Formation ◽  
Ic Manufacturing ◽  
The Impact ◽  
Tmah Solution

Tetramethylammonium hydroxide (TMAH) is a common etchant for Sigma shape formation in IC manufacturing. The impact of oxygen dissolved in TMAH solution on process was studied in this paper. A novel O2 gas injector was developed to improve the process stabilization by control of the oxygen concentration in TMAH solution

Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution

2021 ◽  
Author(s):  
Yuko Tsutsui Ito ◽  
Takahiro KOZAWA
Keyword(s):  
Aqueous Solution ◽  
Free Energy ◽  
Surface Free Energy ◽  
Water Intake ◽  
Dissolution Kinetics ◽  
Exposure Dose ◽  
Tetramethylammonium Hydroxide ◽  
Polar Components ◽  
Dispersion Component ◽  
Chemically Amplified Resists

Abstract With the sharpening of optical images, the capability of resist materials has become a serious concern in lithography. The dissolution of a resist polymer is key to the realization of ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified. In this study, the relationships of surface free energy with swelling and dissolution kinetics were investigated using poly(4-hydroxystyrene) (PHS) film with triphenylsulfonium-nonaflate (TPS-nf). Developers were water and 2.38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution. PHS and TPS-nf are a typical backbone polymer (a dissolution agent) and a typical acid generator of chemically amplified resists, respectively. The water intake and dissolution of PHS film with TPS-nf became fast with increasing UV exposure dose. It was found that the increase in the polar components (particularly, the hydrogen bonding component) and the decrease in the dispersion component of surface free energy underlie the fast water intake and dissolution.

Catalytic properties of copper–manganese mixed oxides prepared by coprecipitation using tetramethylammonium hydroxide

2014 ◽  
Vol 4 (10) ◽  
pp. 3713-3722 ◽  
Author(s):  
Hisahiro Einaga ◽  
Akihiro Kiya ◽  
Satoru Yoshioka ◽  
Yasutake Teraoka
Keyword(s):  
Aqueous Solution ◽  
Mixed Oxide ◽  
Mixed Oxides ◽  
Catalytic Properties ◽  
Oxide Catalysts ◽  
Tetramethylammonium Hydroxide ◽  
Mixed Oxide Catalysts ◽  
Metal Nitrates ◽  
Copper Manganese ◽  
Coprecipitation Technique

Copper–manganese (Cu–Mn) mixed oxide catalysts were prepared by a coprecipitation technique from metal nitrates in aqueous solution using tetramethylammonium hydroxide (TMAH) as a pH regulator.

scholarly journals Effect of the Precipitating Agent on the Synthesis and Sintering Behavior of 20 mol% Sm-Doped Ceria

2016 ◽  
Vol 2016 ◽  
pp. 1-8 ◽  
Author(s):  
Luca Spiridigliozzi ◽  
Gianfranco Dell’Agli ◽  
Mattia Biesuz ◽  
Vincenzo M. Sglavo ◽  
Michele Pansini
Keyword(s):  
Aqueous Solution ◽  
Crucial Role ◽  
Ammonium Carbonate ◽  
Fluorite Structure ◽  
Tetramethylammonium Hydroxide ◽  
Sintering Behavior ◽  
Doped Ceria ◽  
Coprecipitation Process ◽  
Nanometric Size

Nanocrystalline 20 mol% samaria-doped ceria powders (Ce0.8Sm0.2O1.9) were synthesized by coprecipitation techniques using various precipitating agents in aqueous solution: ammonia, ammonium carbonate, tetramethylammonium hydroxide, and urea. The synthesized powders after calcination at 600°C possess a fluorite structure with nanometric size although they are characterized by a very different morphology and degree of agglomeration. Remarkable differences appear in the sintering behavior, especially because of the presence of hard agglomerates. The precipitating agent has therefore a crucial role in the coprecipitation process, which influences the morphology of the powders and in turn the sintering behavior. The obtained results clearly reveal that ammonium carbonate and urea are the best precipitating agents to obtain final dense products after sintering.

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