Asymmetric carrier transport and weak localization in few layer graphene grown directly on dielectric substrate

Author(s):  
Changgu Lee ◽  
Muhammad Sabbtain Abbas ◽  
Pawan Kumar Srivastava ◽  
Yasir Hassan

Temperature-dependent electrical and magneto-transport measurements have been performed on devices comprised of few layer (4L) graphene grown directly on SiO2/Si substrates using a CVD method. Intrinsic energy band-gap of 4.6...


2020 ◽  
Vol 15 (1) ◽  
Author(s):  
Mingming Yang ◽  
Longlong Wang ◽  
Xiaofen Qiao ◽  
Yi Liu ◽  
Yufan Liu ◽  
...  

Abstract The defects into the hexagonal network of a sp2-hybridized carbon atom have been demonstrated to have a significant influence on intrinsic properties of graphene systems. In this paper, we presented a study of temperature-dependent Raman spectra of G peak and D’ band at low temperatures from 78 to 318 K in defective monolayer to few-layer graphene induced by ion C+ bombardment under the determination of vacancy uniformity. Defects lead to the increase of the negative temperature coefficient of G peak, with a value almost identical to that of D’ band. However, the variation of frequency and linewidth of G peak with layer number is contrary to D’ band. It derives from the related electron-phonon interaction in G and D’ phonon in the disorder-induced Raman scattering process. Our results are helpful to understand the mechanism of temperature-dependent phonons in graphene-based materials and provide valuable information on thermal properties of defects for the application of graphene-based devices.



2011 ◽  
Vol 13 (45) ◽  
pp. 20208 ◽  
Author(s):  
Yanping Liu ◽  
Wen Siang Lew ◽  
Li Sun


Nanomaterials ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 392
Author(s):  
Norifumi Endoh ◽  
Shoji Akiyama ◽  
Keiichiro Tashima ◽  
Kento Suwa ◽  
Takamasa Kamogawa ◽  
...  

Graphene is promising for next-generation devices. However, one of the primary challenges in realizing these devices is the scalable growth of high-quality few-layer graphene (FLG) on device-type wafers; it is difficult to do so while balancing both quality and affordability. High-quality graphene is grown on expensive SiC bulk crystals, while graphene on SiC thin films grown on Si substrates (GOS) exhibits low quality but affordable cost. We propose a new method for the growth of high-quality FLG on a new template named “hybrid SiC”. The hybrid SiC is produced by bonding a SiC bulk crystal with an affordable device-type wafer and subsequently peeling off the SiC bulk crystal to obtain a single-crystalline SiC thin film on the wafer. The quality of FLG on this hybrid SiC is comparable to that of FLG on SiC bulk crystals and much higher than of GOS. FLG on the hybrid SiC exhibited high carrier mobilities, comparable to those on SiC bulk crystals, as anticipated from the linear band dispersions. Transistors using FLG on the hybrid SiC showed the potential to operate in terahertz frequencies. The proposed method is suited for growing high-quality FLG on desired substrates with the aim of realizing graphene-based high-speed devices.



RSC Advances ◽  
2016 ◽  
Vol 6 (103) ◽  
pp. 101347-101352 ◽  
Author(s):  
P. Dharmaraj ◽  
P. Sundara Venkatesh ◽  
Pravin Kumar ◽  
K. Asokan ◽  
K. Jeganathan

A simple method that enables the direct fabrication of few layer graphene on SiO2/Si substrates with precise control of layer thickness by implantation of C ions is explored.



Carbon ◽  
2012 ◽  
Vol 50 (4) ◽  
pp. 1503-1509 ◽  
Author(s):  
Tommi Kaplas ◽  
Deepika Sharma ◽  
Yuri Svirko


Carbon ◽  
2012 ◽  
Vol 50 (14) ◽  
pp. 5242-5246 ◽  
Author(s):  
Wenrong Wang ◽  
Liang Chen ◽  
Zhe Wang ◽  
Yuchen Wang ◽  
Tie Li ◽  
...  


2D Materials ◽  
2017 ◽  
Vol 4 (3) ◽  
pp. 035006 ◽  
Author(s):  
R S Gonnelli ◽  
E Piatti ◽  
A Sola ◽  
M Tortello ◽  
F Dolcini ◽  
...  


2013 ◽  
Vol 165 ◽  
pp. 56-59 ◽  
Author(s):  
Corey A. Hewitt ◽  
Alan B. Kaiser ◽  
Matt Craps ◽  
Richard Czerw ◽  
Siegmar Roth ◽  
...  




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