Dually Reactive Multilayer Coatings Enable Orthogonal Manipulation of Underwater Superoleophobicity and Oil Adhesion via Post-Functionalization

2022 ◽  
Author(s):  
Angana Borbora ◽  
Robert L. Dupont ◽  
Yang Xu ◽  
Xiaoguang Wang ◽  
Uttam Manna

Fish scale-inspired underwater superoleophobic coatings with low oil adhesion can be achieved through the creation of hierarchical surface topography on water-compatible materials (including polymeric hydrogels, metal oxides, and electrostatic multilayers)....

2018 ◽  
Vol 6 (45) ◽  
pp. 22465-22471 ◽  
Author(s):  
Arpita Shome ◽  
Adil Majeed Rather ◽  
Uttam Manna

An aloe vera mucilage (AVM) derived highly tolerant and stretchable fish-scale-mimicked coating is introduced by the strategic use of Michael addition reaction. The naturally derived and nature-inspired coating is capable of sustaining various challenging exposures—without compromising the embedded underwater superoleophobicity.


2015 ◽  
Vol 3 (36) ◽  
pp. 18475-18482 ◽  
Author(s):  
Junping Zhang ◽  
Lei Wu ◽  
Yujie Zhang ◽  
Aiqin Wang

Kapok membranes with excellent underwater superoleophobicity, high adsorption properties for water-soluble dyes, and high stability and flexibility are fabricated.


Open Physics ◽  
2011 ◽  
Vol 9 (6) ◽  
Author(s):  
Edyta Kulej ◽  
Barbara Kucharska ◽  
Grzegorz Pyka ◽  
Monika Gwoździk

AbstractThis article describes the results of a study of Cu/Ni multilayer coatings applied on a monocrystalline Si(100) silicon substrate by the deposition magnetron sputtering technique. Composed of 100 bilayers each, the multilayers were differentiated by the Ni sublayer thickness (1.2 to 3 nm), while maintaining the constant Cu sublayer thickness (2 nm). The multilayer coatings were characterized by assessing their surface topography using atomic force microscopy and their mechanical properties with nano-hardness measurements by the Berkovich method. The tests showed that the hardness of multilayers was substantially influenced by the thickness ratio of Cu and Ni sublayers and by surface roughness. The highest hardness and, at the same time, the lowest roughness was exhibited by a multilayer structure with a Cu-to-Ni sublayer thickness ratio of 2:1.5.


Soft Matter ◽  
2020 ◽  
Vol 16 (36) ◽  
pp. 8352-8358
Author(s):  
Ryan S. Preusse ◽  
Elizabeth R. George ◽  
S. Ali Aghvami ◽  
Timothy M. Otchy ◽  
Mohamed Amine Gharbi

Effect of surface topography in the creation of disclinations and the assembly of defects in a smectic A liquid crystal.


2020 ◽  
Vol 43 ◽  
Author(s):  
Stefen Beeler-Duden ◽  
Meltem Yucel ◽  
Amrisha Vaish

Abstract Tomasello offers a compelling account of the emergence of humans’ sense of obligation. We suggest that more needs to be said about the role of affect in the creation of obligations. We also argue that positive emotions such as gratitude evolved to encourage individuals to fulfill cooperative obligations without the negative quality that Tomasello proposes is inherent in obligations.


Author(s):  
C. T. Nightingale ◽  
S. E. Summers ◽  
T. P. Turnbull

The ease of operation of the scanning electron microscope has insured its wide application in medicine and industry. The micrographs are pictorial representations of surface topography obtained directly from the specimen. The need to replicate is eliminated. The great depth of field and the high resolving power provide far more information than light microscopy.


Author(s):  
P.G. Pawar ◽  
P. Duhamel ◽  
G.W. Monk

A beam of ions of mass greater than a few atomic mass units and with sufficient energy can remove atoms from the surface of a solid material at a useful rate. A system used to achieve this purpose under controlled atmospheres is called an ion miliing machine. An ion milling apparatus presently available as IMMI-III with a IMMIAC was used in this investigation. Unless otherwise stated, all the micro milling operations were done with Ar+ at 6kv using a beam current of 100 μA for each of the two guns, with a specimen tilt of 15° from the horizontal plane.It is fairly well established that ion bombardment of the surface of homogeneous materials can produce surface topography which resembles geological erosional features.


Author(s):  
David C. Joy ◽  
Dennis M. Maher

High-resolution images of the surface topography of solid specimens can be obtained using the low-loss technique of Wells. If the specimen is placed inside a lens of the condenser/objective type, then it has been shown that the lens itself can be used to collect and filter the low-loss electrons. Since the probeforming lenses in TEM instruments fitted with scanning attachments are of this type, low-loss imaging should be possible.High-resolution, low-loss images have been obtained in a JEOL JEM 100B fitted with a scanning attachment and a thermal, fieldemission gun. No modifications were made to the instrument, but a wedge-shaped, specimen holder was made to fit the side-entry, goniometer stage. Thus the specimen is oriented initially at a glancing angle of about 30° to the beam direction. The instrument is set up in the conventional manner for STEM operation with all the lenses, including the projector, excited.


Author(s):  
R. Ai ◽  
H.-J. Fan ◽  
L. D. Marks

It has been known for a long time that electron irradiation induces damage in maximal valence transition metal oxides such as TiO2, V2O5, and WO3, of which transition metal ions have an empty d-shell. This type of damage is excited by electronic transition and can be explained by the Knoteck-Feibelman mechanism (K-F mechanism). Although the K-F mechanism predicts that no damage should occur in transition metal oxides of which the transition metal ions have a partially filled d-shell, namely submaximal valence transition metal oxides, our recent study on ReO3 shows that submaximal valence transition metal oxides undergo damage during electron irradiation.ReO3 has a nearly cubic structure and contains a single unit in its cell: a = 3.73 Å, and α = 89°34'. TEM specimens were prepared by depositing dry powders onto a holey carbon film supported on a copper grid. Specimens were examined in Hitachi H-9000 and UHV H-9000 electron microscopes both operated at 300 keV accelerating voltage. The electron beam flux was maintained at about 10 A/cm2 during the observation.


Sign in / Sign up

Export Citation Format

Share Document