For laser-based plasma chemical vapour deposition (CVD) of diamond on hard metal at atmospheric pressure, without a vacuum chamber, the interaction between the deposition temperature and the methane concentration has to be understood to adjust the coating thickness, deposition duration, and medium diamond crystal size. The hypothesis of this study is that a wider range of methane concentrations could be used to deposit microcrystalline diamond coatings due to the increasing etching and deposition rates with rising deposition temperatures. The deposition of the CVD diamond coatings was carried out on K10 hard metal substrates. The process temperature and the methane concentration were varied from 650 to 1100 °C and from 0.15% to 5.0%, respectively. The coatings were analysed by scanning electron and 3D laser-scanning confocal microscopy, energy dispersive X-ray and micro-Raman spectroscopy, as well as cryofracture-based microscopy analysis. The results showed that microcrystalline diamond coatings could be deposited in a wider range of methane concentrations when increasing the process temperature. The coating thickness saturates depending on the process temperature even though the methane concentration constantly increases. The coating thickness increases with an increasing deposition temperature until the cobalt diffusion hinders the deposition at the process temperature of 1100 °C.
Murakami and H2SO4/H2O2 Pretreatment of WC-Co Hard Metal Substrates to Increase the Adhesion of CVD Diamond Coatings